MRI: Acquisition of an Inductively Coupled Plasma Dry Etching System for Highly Controlled Etching of Chalcogenides and Related Compounds

MRI：获取感应耦合等离子体干蚀刻系统，用于硫属化物和相关化合物的高度控制蚀刻

• 批准号: 1625683
• 负责人: Wounjhang Park
• 金额: $ 33.3万
• 依托单位: University of Colorado at Boulder
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2016
• 资助国家: 美国
• 起止时间: 2016-10-01 至 2019-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1625683&HistoricalAwards=false
• 关键词: MRI; Acquisition; Inductively; Coupled; Plasma

The objective of this project is to acquire a tool that enables fabrication of high quality electronic and photonic devices. Examples include light sources, high performance sensors, state-of-the-art precision clocks, information processing and communication components, and solar energy harvesting devices. The new tool will provide the critical capability of precisely etching materials in a prescribed geometry, currently not available on our campus and other institutions in the region. This new capability will enable explorations of new research frontiers. A diverse set of fields will be impacted including computing, communications, frequency metrology, sensing, energy, and medicine. The new tool will naturally provide research and training opportunities for undergraduate and graduate students, preparing them for tomorrow?s high tech industry. Furthermore, the new tool will be housed in the Colorado Nanofabrication Laboratory (CNL) serving the local industry as well as the research community. It will also be used in a newly revamped course, the Micro- and Nano-Structures Laboratory, providing hands-on experience to both undergraduate and graduate students. Additionally, the tool will be utilized in outreach activities that include under-represented students. The acquired inductively coupled plasma (ICP) dry etching system can handle a variety of gases, including chlorine-based compounds. The system will provide new etching capability for a variety of materials, including compound semiconductors, oxides and metals. It will also significantly expand the processing capability for silicon. The ability to fabricate high quality electronic and photonic devices has been instrumental in a number of key technology advancements including integrated circuits, solid-state light sources and detectors, energy harvesting, and flexible electronics. In the future, further advancements will lead to miniature optical clocks using chip-scale optical frequency combs, ultra high-speed microprocessors with photonic I/O, high efficiency solar cells with nanopatterned metamaterials, and flexible electronic-photonic devices for biosensing applications. The key capability that the etcher will provide is the ability for dry etching with high anisotropy, precisely controlled etch rate and high quality etch surface. The ICP etcher represents a significant expansion of our capabilities in both material types and etch quality. The etcher will spark a wide array of inorganic, organic and hybrid functional materials and devices research, potentially transforming the materials research on campus as well as impacting many research activities in the region and beyond.

该项目的目的是获取能够制造高质量电子和光子设备的工具。示例包括光源，高性能传感器，最先进的精度时钟，信息处理和通信组件以及太阳能收集设备。新工具将在规定的几何形状中提供精确蚀刻材料的关键能力，目前我们的校园和该地区其他机构尚不可用。这种新的功能将使对新研究前沿的探索。 一套各种领域将受到影响，包括计算，通信，频率计量，传感，能量和药物。 新工具自然会为本科和研究生提供研究和培训机会，并为明天的高科技行业做准备。 此外，新工具将安置在科罗拉多州纳米制造实验室（CNL），为当地工业和研究界服务。它也将用于新修改的课程，即微型和纳米结构实验室，为本科生和研究生提供动手经验。此外，该工具将用于包括代表性不足的学生在内的外展活动。获得的电感耦合等离子体（ICP）干蚀刻系统可以处理各种气体，包括基于氯的化合物。该系统将为各种材料（包括复合半导体，氧化物和金属）提供新的蚀刻能力。它还将显着扩大硅的加工能力。制造高质量电子和光子设备的能力在许多关键技术进步方面发挥了作用，包括集成电路，固态光源和探测器，能量收集和灵活的电子设备。 将来，进一步的进步将使用芯片尺度的光学频率梳子，具有光子I/O的超高速微处理器，具有纳米平淡的变速器的高效率太阳能电池以及用于材料应用应用的柔性电子功能设备的高效率太阳能电池。 蚀刻器将提供的关键能力是具有高各向异性，精确控制的蚀刻速率和高质量蚀刻表面的干蚀刻能力。 ICP蚀刻器代表了我们在材料类型和蚀刻质量中的能力的显着扩展。 蚀刻器将引发一系列无机，有机和混合功能材料和设备研究，可能会改变校园的材料研究，并影响该地区及其他地区的许多研究活动。