MRI: Acquisition of a Hybrid Sputtering/e-beam Thin Film Deposition System for Research and Education

MRI：采购用于研究和教育的混合溅射/电子束薄膜沉积系统

• 批准号: 1229208
• 负责人: Hao Zeng
• 金额: $ 38.27万
• 依托单位: SUNY at Buffalo
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2012
• 资助国家: 美国
• 起止时间: 2012-09-01 至 2013-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1229208&HistoricalAwards=false
• 关键词: MRI; Acquisition; Hybrid; Sputtering; beam

This award to the State University of New York at Buffalo (UB) is for the acquisition of a hybrid sputtering/e-beam thin film deposition system. The instrument will be used by an interdisciplinary group of UB faculty from four different departments: Physics, Chemistry, Chemical & Biological Engineering, and Electrical Engineering. The instrument is capable of depositing multilayer thin films combining metal, semiconductor, and insulator materials, in situ device fabrication and in situ characterization of a broad range of physical properties. It will enable the exploration of novel energy-related materials and devices, spin effects and materials in solid state devices, electronic materials and sensors, and optical materials. These materials and devices will contribute to applications ranging from solar cells and batteries, data storage to biological sensing. The hybrid sputtering/e-beam thin film deposition system will foster cross-disciplinary interactions, and realize previously undiscovered synergies in research. It is an important addition to UB's material research infrastructure and is a key priority for the newly planned Materials Science and Engineering Ph.D. program as it will help to attract new faculty members from various fields strategic to the University. The instrument will be house in the Integrated Nanostructured Systems Instrument Facility where it will be available to the broader UB research community and regional companies and institutions. A large number of post-doctoral scholars, and graduate and undergraduate students will gain hands-on experience in the operation and maintenance of what has become an essential tool in modern materials research. A new course will be developed concentrating on nanoscale materials and devices. The PIs will work closely with Buffalo State College and UB's Cora P. Maloney College to involve underrepresented groups in research using the instrument.

该奖项授予纽约州立大学布法罗分校 (UB)，用于奖励其购买混合溅射/电子束薄膜沉积系统。 该仪器将由来自布法罗大学四个不同系的跨学科团队使用：物理、化学、化学与生物工程以及电气工程。该仪器能够沉积结合金属、半导体和绝缘体材料的多层薄膜、原位器件制造以及各种物理性质的原位表征。 它将促进新型能源相关材料和器件、固态器件中的自旋效应和材料、电子材料和传感器以及光学材料的探索。 这些材料和设备将有助于从太阳能电池和电池、数据存储到生物传感等应用。混合溅射/电子束薄膜沉积系统将促进跨学科互动，并实现以前未发现的研究协同效应。 它是布法罗大学材料研究基础设施的重要补充，也是新规划的材料科学与工程博士项目的重点优先事项。计划，因为它将有助于吸引来自各个战略领域对大学具有战略意义的新教师。 该仪器将安装在集成纳米结构系统仪器设施中，可供更广泛的布法罗研究界以及区域公司和机构使用。 大量博士后学者、研究生和本科生将获得操作和维护该工具的实践经验，该工具已成为现代材料研究的重要工具。 将开发一门新课程，重点关注纳米材料和器件。 PI 将与布法罗州立学院和 UB 的 Cora P. Maloney 学院密切合作，让代表性不足的群体参与使用该工具的研究。