4th Pacific International Conference on Applications of Lasers & Optics (PICALO 2010); Wuhan, China, March 23-25, 2010

第四届太平洋激光应用国际会议

• 批准号: 1008421
• 负责人: Yongfeng Lu
• 金额: $ 2万
• 依托单位: University of Nebraska-Lincoln
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-03-15 至 2011-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1008421&HistoricalAwards=false
• 关键词: 4th; Pacific; International; Conference; Applications

This award provides funding to support 20 graduate students, post-doctorates and non-tenured junior faculty from underrepresented groups and institutions that are traditionally short of funding for such support to attend the 4th Pacific International Conference on Applications of Lasers & Optics (PICALO 2010) to be held in Wuhan, China from March 23 to 25, 2010. PICALO is a biennial conference organized by Laser Institute of America (LIA) focusing on the growth and application of lasers and optics in the Pacific region. The goal of PICALO is to promote the collaboration between academic and industrial communities. The technical topics and research areas to be covered by PICALO 2010 are in line with the areas supported by the Division of Civil, Mechanical and Manufacturing Innovation (CMMI).The opportunity provided by this funding will blend research and educational activities for the graduate students, post-doctorates and non-tenured faculty who attend. By participating in the conference, the graduate students, post-doctorates and non-tenured faculty will be exposed to state-of-the-art research topics and will interact with global academic and industrial leaders.

该奖项为支持20名研究生，在代表性不足的团体和机构提供支持的20名研究生和未透明的初级教师提供资金，传统上，这些奖项缺乏资金，无法参加这类支持，以参加第四届Pacific International会议激光与Optics的申请（Poicalo 2010）（Poicalo 2010）在中国瓦恩（Wuhan）举行，由Liia Issutions a Liia is and andiria is。专注于太平洋地区激光和光学元件的生长和应用。 Picalo的目的是促进学术和工业社区之间的合作。 Picalo 2010涵盖的技术主题和研究领域与民用，机械和制造创新部（CMMI）支持的领域一致。这项资金提供的机会将融合研究生，专业后的研究生，专业后和非培养的教师。 通过参加会议，研究生，专业后和不耐心的教师将接触到最新的研究主题，并将与全球学术和工业领导者互动。