NSF ATE Regional Center for Semiconductor and Nanotechnology Education

NSF ATE 半导体和纳米技术教育区域中心

• 批准号: 1003574
• 负责人: Abraham Michelen
• 金额: $ 299.93万
• 依托单位: Hudson Valley Community College
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-09-01 至 2015-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1003574&HistoricalAwards=false
• 关键词: NSF; ATE; Regional; Center; Semiconductor

The Regional Center for Semiconductor and Nanotechnology Education (RCSNE) fulfills the needs of nanotechnology and semiconductor manufacturing industries in New York State and Western New England through development, demonstration, and utilization of new materials, curricula, and delivery methods by utilizing the resources of academia, industry, and government. The Center represents a collaborative partnership including AMD/GlobalFoundries, IBM, General Electric, SEMATECH, Applied Materials, Tokyo Electron, Hudson Valley Community College, regional Boards of Cooperative Educational Services in New York State, Rensselaer Polytechnic Institute (RPI), Rochester Institute of Technology (RIT), the University at Albany's College of Nanoscale Science and Engineering (CNSE), The State University of New York Institute of Technology (SUNYIT), Excelsior College, Mohawk Valley Community College (CC), Fulton Montgomery CC, Dutchess CC, Adirondack County CC, Schenectady County CC, Ulster County CC, and additional community colleges in NY, VT, MA, and CT.Nanotechnology and semiconductor manufacturing industries are already established in the region and are undergoing an explosive expansion. A prime example of this expansion is the recent groundbreaking of AMD/Global Foundries' $4 billion-plus leading edge semiconductor foundry facility in Saratoga County. When complete, this facility will be one of the most technologically advanced in the world and the most advanced semiconductor foundry in the U.S. Approximately 1,465 permanent manufacturing jobs will be created by the end of 2012 (including 390 engineers and 800 technicians). In addition, IBM has committed to investing $1.5 billion in establishing an advanced Integrated Circuit Packaging Research and Development Center in upstate New York in 2010 and will be recruiting for 475 engineers and 200 technicians. Similar expansion is occurring in the advanced energy sectors such as General Electric's advanced battery manufacturing center slated for construction in Schenectady, New York.In response to these needs, the RCSNE is implementing and enabling (a) expansion of advanced semiconductor and nanotechnology related AAS/AS degree programs among its community college partners, (b) on-the-job co-op and internship-based training, (c) distance learning options, (d) just-in-time training, (e) K-12 pipeline development programs, (f) coordinated student recruitment, and (g) research into emerging workforce trends and training needs.Intellectual Merit: The RCSNE can improve community college student learning in science and engineering by providing a broader range of students access to the educational materials, facilities and faculty of several premier U.S. science and engineering schools. Several of the partners (HVCC, UAlbany, RPI and RIT) have successfully teamed to develop and disseminate existing nano and semiconductor manufacturing programs that have leveraged semiconductor cleanrooms at UAlbany's College of Nanoscale Science and Engineering, RPI, HVCC's TEC-SMART facility, and other community colleges. A RCSNE industrial advisory board and external evaluation processes assures student learning is effectively assessed. HVCC and other partners have indicated commitment to the proposed ATE Center through their existing education programs, articulation agreements and outreach activities.Broader Impacts: The Center's industrial partners such as IBM, AMD/Global Foundries, and General Electric are providing guidelines regarding the technical skills required for highly effective employees. Regular workforce skill assessments are being performed to match the needs of the industry. The Center is adapting educational programs from other ATE Centers and the Center's regional partners and developing material where none already exists. These materials are being disseminated by a network of community colleges to educate the next generation of the technical workforce in the nanotechnology and semiconductor manufacturing industries. The project activities are being presented at technical and educational conferences and published in scientific and educational journals. The Center is educating the public through outreach activities. The Center is conducting active recruiting to increase the number of women and under-represented minorities in nanotechnology and semiconductor manufacturing.

半导体和纳米技术教育区域中心 (RCSNE) 通过利用学术界资源开发、示范和利用新材料、课程和交付方法，满足纽约州和新英格兰西部纳米技术和半导体制造行业的需求、行业和政府。该中心代表的合作伙伴包括 AMD/GlobalFoundries、IBM、通用电气、SEMATECH、应用材料公司、东京电子、哈德逊谷社区学院、纽约州合作教育服务区域委员会、伦斯勒理工学院 (RPI)、罗彻斯特理工学院理工学院 (RIT)、奥尔巴尼大学纳米科学与工程学院 (CNSE)、纽约州立大学理工学院 (SUNYIT)、Excelsior 学院、莫霍克谷社区学院(CC)、富尔顿蒙哥马利 CC、达奇斯 CC、阿迪朗达克县 CC、斯克内克塔迪县 CC、阿尔斯特县 CC 以及纽约州、佛蒙特州、马萨诸塞州和康涅狄格州的其他社区学院。纳米技术和半导体制造行业已在该地区建立，并且正在经历爆炸性扩张。这种扩张的一个典型例子是 AMD/Global Foundries 在萨拉托加县投资超过 40 亿美元的领先半导体代工工厂最近破土动工。竣工后，该工厂将成为世界上技术最先进的工厂之一，也是美国最先进的半导体代工厂。到 2012 年底，将创造大约 1,465 个永久性制造工作岗位（包括 390 名工程师和 800 名技术人员）。此外，IBM还承诺2010年投资15亿美元在纽约州北部建立先进的集成电路封装研发中心，并将招聘475名工程师和200名技术人员。先进能源领域也出现了类似的扩张，例如通用电气计划在纽约斯克内克塔迪建设的先进电池制造中心。为了满足这些需求，RCSNE 正在实施并实现 (a) 先进半导体和纳米技术相关 AAS/ 的扩张社区大学合作伙伴之间的 AS 学位课程，(b) 在职合作和实习培训，(c) 远程学习选择，(d) 即时培训，(e) K-12 管道发展计划， (f) 协调学生招生，以及 (g) 研究新兴劳动力趋势和培训需求。智力优势：RCSNE 可以通过为更广泛的学生提供教育材料、设施和美国几所一流科学与工程学院的教师。几个合作伙伴（HVCC、UAlbany、RPI 和 RIT）已成功合作开发和传播现有的纳米和半导体制造计划，这些计划利用了 UAlbany 纳米科学与工程学院、RPI、HVCC 的 TEC-SMART 设施和其他设施的半导体洁净室。社区学院。 RCSNE 行业顾问委员会和外部评估流程可确保学生的学习得到有效评估。 HVCC 和其他合作伙伴已通过其现有的教育计划、衔接协议和外展活动表明了对拟议 ATE 中心的承诺。更广泛的影响：该中心的工业合作伙伴（例如 IBM、AMD/Global Foundries 和通用电气）正在提供有关技术技能的指南高效员工所需的。我们正在定期进行劳动力技能评估，以满足行业的需求。该中心正在调整其他 ATE 中心和该中心区域合作伙伴的教育计划，并开发尚未存在的材料。这些材料正在由社区大学网络传播，以教育纳米技术和半导体制造行业的下一代技术劳动力。该项目活动正在技术和教育会议上进行介绍，并在科学和教育期刊上发表。该中心正在通过外展活动来教育公众。该中心正在积极招募人员，以增加纳米技术和半导体制造领域的女性和代表性不足的少数群体的数量。