MRI-R2: Acquisition of a Versatile Electron Beam Nanolithography Instrument for Patterning on Planar and Curved Surfaces

MRI-R2:购买多功能电子束纳米光刻仪器,用于在平面和曲面上进行图案化

基本信息

  • 批准号:
    0959764
  • 负责人:
  • 金额:
    $ 67.5万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2010
  • 资助国家:
    美国
  • 起止时间:
    2010-03-01 至 2013-02-28
  • 项目状态:
    已结题

项目摘要

0959764MayerPennsylvania State U. University ParkTechnical Summary: This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).This MRI-R2 grant will fund the acquisition of a state-of-the-art Vistec EBPG5200ES electron-beam nanolithography instrument that will be a centerpiece of the Penn State Nanofabrication Laboratory's mission to transform diverse materials, including semiconductors, complex oxides, ferromagnets, superconductors, polymers and molecules, into advanced nano-devices and systems. This flexible and versatile nanolithography system will enable direct patterning of complex features on substrates up to 200 mm in diameter and up to 10 mm thick, with a demonstrated sub-10 nm pattern resolution and sub-15 nm stitching and overlay accuracy. In addition, the instrument will open fundamentally new avenues in nanolithography because it will be equipped with a z-lift stage that allows software-controlled dynamic stage height adjustments for patterning on substrates with extreme topography and curvature. This unique capability will create research and development opportunities in diverse fields such as nano-electronics, nano-biotechnology, and nano-optics. By way of the National Nanotechnology Infrastructure Network, the instrument's new features, flexible interface and remote internet operability will offer a fresh approach to education, training and outreach that is readily accessible to a broad and diverse population of users from academia, industry, and government.Layman Summary: This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).Advances in nanoscience and nanotechnology are creating entirely new research and development opportunities in diverse fields such as electronics, optics, energy, life sciences, and medicine. Nanolithography plays a central role in these advances because it is one of the primary techniques used to create structures with features that are as small as 10 nm. This MRI-R2 grant will fund the acquisition of a state-of-the-art Vistec EBPG5200ES electron-beam lithography instrument that will be a centerpiece of the Penn State Nanofabrication Laboratory. By way of the National Nanotechnology Infrastructure Network, this system will be used to transform diverse functional materials, including semiconductors, ferroelectrics, ferromagnets, superconductors, polymers and molecules, into complex integrated nanodevices and systems. In addition, it will open fundamentally new avenues in lithography because it will be equipped with hardware and software for direct nanopatterning on substrates with extreme topography and curvature. This unique capability will enable groundbreaking research in nanotextured surfaces to prevent coagulation in artificial artery grafts as well as optical metamaterials for perfect optical mirrors, lenses, and cloaking devices. The instrument's new features, ease of use, flexible interface and remote internet operability will offer a fresh approach to education, training and outreach that is readily accessible to a broad and diverse population of users from academia, industry, and government. The Penn State Nanofabrication Laboratory, as an NSF National Nanotechnology Infrastructure Node (NNIN) site, is an open access national user facility that helps scientists and engineers from academia and industry to advance the frontiers of nanoscale science and engineering. The laboratory's mission builds on core research strengths at Penn State University to establish strategies for integrating diverse materials - semiconductors, complex oxides, superconductors, ferromagnets, polymers and molecular systems - into micro and nanoscale devices. This project proposes the acquisition of a Vistec EBPG5200ES advanced electron beam nanolithography instrument that will play a central role in this laboratory's mission. The equipment has stateof-the-art performance that will be critical to more than 20 ongoing and future projects in basic science and engineering, primarily funded by NSF. The instrument is capable of direct patterning of features on substrates having a variety of sizes and thicknesses, with demonstrated sub-10 nm pattern resolution and sub-15 nm stitching and overlay accuracy. In addition, the instrument will open qualitatively new avenues in nanopatterning because it will be equipped with a z-lift stage that allows software-controlled dynamic stage height adjustments for patterning on substrates with extreme topography and curvature. This unique instrumental aspect - not currently present at any other national user facility - will enable projects such as nanotextured surface engineering of cylindrical blood conduits to prevent coagulation in blood-contacting medical devices and the design of optical metamaterials by nanoscale patterning on curved precision optical components. The Vistec instrument is modular in form and function and is designed to be readily upgradable as the technology improves or as the need arises over the estimated 15-year lifespan of the system.Intellectual merit: The proposed instrument will be used by investigators from diverse disciplines (electrical, chemical and mechanical engineering, materials science, physics, chemistry, biology and medicine) to tackle problems of imminent concern in their respective fields. These encompass topics in mesoscopic physics (e.g., mesoscopic transport in novel superconductors, graphene and nanowires, magnetization control in single and interacting nanomagnets), nanoelectronics (e.g., deep submicron thin film transistors, semiconductor nanowire electronics), nanophotonics (e.g., coherent spin dynamics in photonic molecule lasers, photonic crystal design of nanophotonic lasers) and nanobiology (e.g., miniaturized implantable renal assist devices). All the senior personnel who will use the instrument have established track records of carrying out high impact research.Broader impact: The instrument's ease of use, flexible interface, and remote (internet) operability will help forge new directions in education, training and outreach in advanced nanofabrication technology at the graduate, baccalaureate, associate, and post-degree professional levels. These efforts will include modular lithography tutorials, remote demonstrations, technical operations and user certification training courses. The Penn State Materials Research Science and Engineering Center and several minority-serving institutions, including the City College of New York, University of Puerto Rico, Texas A&M, have already established mechanisms for enhancing research and training opportunities for women and under-represented minorities through the NSF Research Experience for Undergraduatesprogram. These programs will benefit from exposure to the instrument?s capabilities with introductory tutorials and demonstrations on nanofabrication and mentor-supervised usage. The instrument will also be made available to the Penn State Advanced Technology Education program and partner institutions, which include many minority serving community and technical colleges. Finally, with the assistance of NNIN external liaisons and Vistec, the instrument?s internet-based interface will be used to develop a new "remote hub" model that will assist external users at hubs to design and implement remote projects. This scheme will start with existing partners in academia (e.g., CCNY) and industry, and will then be extended to other venues for far-reaching national impact.
0959764Mayerpennsylvania State U.大学公园技术摘要:该奖项是根据2009年的《美国回收与再投资法》(公共法第111-5号)资助的。此MRI-R2赠款将资助批准最先进的Vistec EBPG5200ES电子电子电子电子电子电子。 - 将成为宾夕法尼亚州纳米制度实验室的核心纳米印刷仪,该仪器是转化各种材料的使命,包括半导体,复杂的氧化物,铁磁,超导体,超导体,聚合物和分子,将其转化为先进的纳米偏差和系统。这种柔性且多功能的纳米光刻系统将使直径高达200毫米的底物上的复杂特征直接模式,并厚10毫米,并显示出低于10 nm的模式分辨率和亚15 nm缝线和覆盖精度。此外,该仪器将在纳米光刻中从根本上开放新的途径,因为它将配备Z-Lift阶段,该阶段允许软件控制的动态阶段高度调整,以在具有极端地形和曲率的基板上进行构图。这种独特的能力将在纳米电子学,纳米生物技术和纳米风格等各个领域创造研发机会。通过国家纳米技术基础设施网络,该乐器的新功能,灵活的界面和远程互联网可操作性将为教育,培训和外展提供新的方法,可以易于从学术,工业和政府的广泛而多样化.layman摘要:该奖项是根据2009年的《美国复苏与再投资法》(公法111-5)资助的。纳米科学和纳米技术的争夺正在创造全新的研究和开发机会,例如电子,选集,能源,能源,生活,生活科学和医学。 纳米光刻在这些进步中起着核心作用,因为它是用于创建具有小至10 nm的结构的主要技术之一。这项MRI-R2赠款将资助获得最先进的Vistec EBPG5200ES电子束光刻工具,该工具将成为宾夕法尼亚州立大学纳米制造实验室的核心。通过国家纳米技术基础设施网络,该系统将用于将各种功能材料转化,包括半导体,铁电,铁磁铁,超导体,聚合物和分子,将其转变为复杂的集成纳米座和系统。 此外,它将从根本上开放新的途径,因为它将配备用于直接纳米图案的硬件和软件,以对具有极端地形和曲率的基板进行直接纳米图案。这种独特的能力将在纳米织物的表面进行突破性研究,以防止人造动脉移植物和光学超材料的凝结,以提供完美的光学镜,镜头和掩盖装置。 该乐器的新功能,易用性,灵活的界面和远程互联网可操作性将提供一种新的教育,培训和宣传方法,可容易获得来自学术界,工业和政府的广泛而多样化的用户。宾夕法尼亚州立纳米制造实验室是NSF国家纳米技术基础设施节点(NNIN)站点,是一个开放式通道国家用户设施,可帮助科学家和工程师从学术界和工业中推进纳米级科学和工程的领域。该实验室的任务建立在宾夕法尼亚州立大学的核心研究优势的基础上,以建立将各种材料(半导体,复杂的氧化物,超导体,铁磁体,聚合物和分子系统)整合到微观和纳米级设备中的策略。该项目提议收购Vistec EBPG5200ES高级电子束纳米光刻工具,该工具将在该实验室的任务中发挥核心作用。该设备具有现状的性能,对于主要由NSF资助的基础科学和工程中的20多个正在进行的和未来的项目至关重要。该仪器能够直接对具有多种尺寸和厚度的底物进行特征,并具有低于10 nm的模式分辨率以及亚15 nm缝线和覆盖精度。此外,该仪器将在纳米图案中开放定性的新途径,因为它将配备Z-Lift阶段,该阶段允许软件控制的动态阶段高度调整,以在具有极端地形和曲率的基板上进行构图。这种独特的工具性方面 - 目前在任何其他国家用户设施中都不存在 - 将使诸如纳米刺激的圆柱血管的表面工程等项目,以防止在血液接触的医疗设备中凝结,并通过纳米级的纳米层面图案设计在弯曲精度的光学上的光学上, 。 Vistec仪器的形式和功能是模块化的,被设计为可以随着技术的改进或需要在系统的估计15年寿命中的需求而易于升级。IntellectualFure:拟议的仪器将由来自各种学科的调查人员使用。 (电气,化学和机械工程,材料科学,物理,化学,生物学和医学),以解决各自领域的即将关注的问题。 These encompass topics in mesoscopic physics (e.g., mesoscopic transport in novel superconductors, graphene and nanowires, magnetization control in single and interacting nanomagnets), nanoelectronics (e.g., deep submicron thin film transistors, semiconductor nanowire electronics), nanophotonics (e.g., coherent spin dynamics在光子分子激光器中,纳米光激光器的光子晶体设计)和纳米生物学(例如,微型植入式肾辅助装置)。所有将使用该工具的高级人员都建立了进行高影响力研究的记录。BRODERIMPACT:该工具的易用性,灵活的界面和远程(互联网)可操作性将有助于在教育,培训和外展方面开展新的方向毕业生,学士学位,助理和后职业专业水平的高级纳米制作技术。这些工作将包括模块化光刻教程,远程演示,技术操作和用户认证培训课程。宾夕法尼亚州立材料研究科学与工程中心以及包括纽约市城市学院,德克萨斯州A&M的几个少数派服务机构,已经建立了为增强妇女的研究和培训机会的机制本科生的NSF研究经验。这些程序将受益于仪器的功能,并提供有关纳米制作和指导者监督使用的介绍性教程和演示。该工具还将提供给宾夕法尼亚州高级技术教育计划和合作伙伴机构,其中包括许多少数服务社区和技术学院。最后,在NNIN外部联络和Vistec的协助下,将使用仪器的基于Internet的接口来开发一种新的“远程集线器”模型,该模型将帮助Hubs的外部用户设计和实施远程项目。该计划将从学术界(例如CCNY)和行业的现有合作伙伴开始,然后将其扩展到其他场所,以实现深远的国家影响力。

项目成果

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Theresa Mayer其他文献

The Pals Prevention Program and its Long-Term Impact on Student Intentions to Use Alcohol, Tobacco, and Marijuana
Pals 预防计划及其对学生使用酒精、烟草和大麻意愿的长期影响
  • DOI:
  • 发表时间:
    2012
  • 期刊:
  • 影响因子:
    0.8
  • 作者:
    Judson W. Workman;D. Moore;Mary J. Huber;Josephine F. Wilson;J. Ford;N. Kinzeler;Theresa Mayer
  • 通讯作者:
    Theresa Mayer
Accessible Substance Abuse Prevention for All Children
为所有儿童提供无障碍药物滥用预防服务
  • DOI:
  • 发表时间:
    2012
  • 期刊:
  • 影响因子:
    0
  • 作者:
    J. Ford;Judson W. Workman;Navid Masoudi;Mary J. Huber;Theresa Mayer;Karel Pančocha
  • 通讯作者:
    Karel Pančocha
Evaluating the Prevention through Alternative Learning Styles Program
通过替代学习方式计划评估预防措施
  • DOI:
  • 发表时间:
    2009
  • 期刊:
  • 影响因子:
    0.8
  • 作者:
    Mary J. Huber;Judson W. Workman;J. Ford;D. Moore;Theresa Mayer
  • 通讯作者:
    Theresa Mayer

Theresa Mayer的其他文献

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{{ truncateString('Theresa Mayer', 18)}}的其他基金

Conference: Workshop to Build a Vision and Strategy for Creating a National Network of Academic Cloud and Self-Driving Labs
会议:构建创建全国学术云和自动驾驶实验室网络的愿景和战略的研讨会
  • 批准号:
    2335891
  • 财政年份:
    2023
  • 资助金额:
    $ 67.5万
  • 项目类别:
    Standard Grant
Collaborative Research/GOALI: Engineered Crystallization Behavior of Phase Change Materials to Enable Advanced Optical Functionalities
合作研究/GOALI:相变材料的工程结晶行为以实现先进的光学功能
  • 批准号:
    1308584
  • 财政年份:
    2013
  • 资助金额:
    $ 67.5万
  • 项目类别:
    Standard Grant
2006 Nanostructure Fabrication Gordon Conference on the Chemistry and Physics of Nanostructure. To be Held July 16-21, 2006 at Tilton College in Tilton, NH.
2006 年纳米结构制造戈登纳米结构化学和物理会议。
  • 批准号:
    0621479
  • 财政年份:
    2006
  • 资助金额:
    $ 67.5万
  • 项目类别:
    Standard Grant
IMR: Aquisition of Cryogenic Prober for Nanoscale Materials and Device Characterization
IMR:获取用于纳米级材料和器件表征的低温探针
  • 批准号:
    0414901
  • 财政年份:
    2004
  • 资助金额:
    $ 67.5万
  • 项目类别:
    Standard Grant
CAREER: Fabrication of Two- and Three-Dimensional Photonic Crystals
职业:二维和三维光子晶体的制造
  • 批准号:
    9501820
  • 财政年份:
    1995
  • 资助金额:
    $ 67.5万
  • 项目类别:
    Continuing Grant

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MRI-R2: Acquisition of Mass Spectrometers for Earth Systems Science Research at Stony Brook University
MRI-R2:石溪大学购买用于地球系统科学研究的质谱仪
  • 批准号:
    0959524
  • 财政年份:
    2010
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    $ 67.5万
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MRI-R2: Acquisition of an Inductively Coupled Plasma Mass Spectrometer (ICP/MS)
MRI-R2:购买电感耦合等离子体质谱仪 (ICP/MS)
  • 批准号:
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MRI-R2: Acquisition of Biophysical Instruments for Interdisciplinary Faculty and Student Research
MRI-R2:为跨学科教师和学生研究购买生物物理仪器
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MRI-R2: Acquisition of High Throughput Crystallization and Collection Devices
MRI-R2:获取高通量结晶和收集设备
  • 批准号:
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MRI-R2: Acquisition of Two Infrared Cameras and Supporting Equipment for Performing Energy Audits of Existing Buildings
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  • 批准号:
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