MRI: Acquisition of a Nanoimprint Lithography System for Nanomanufacturing and Nano/Micro Fabrication

MRI：购买用于纳米制造和纳米/微米制造的纳米压印光刻系统

• 批准号: 0923403
• 负责人: Hongwei Sun
• 金额: $ 50.8万
• 依托单位: University of Massachusetts Lowell
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-09-01 至 2012-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0923403&HistoricalAwards=false
• 关键词: MRI; Acquisition; Nanoimprint; Lithography; System

"This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)."The objective of this project is to utilize an innovative nanoimprint lithography (NIL) technique for research and training in prototyping and fabrication of micro/nano sensors/actuators, nano devices, nanostructures and nanoscale tooling for nanomanufacturing at UMass-Lowell (UML). The NIL is a micro- and nanoscale replication process, which uses a combination of mechanical pressing and heating or ultraviolet lighting to generate uniform and high resolution features (below 10 nm) on a substrate at a low cost and high throughput. The requested NIL system will significantly enhance nanomanufacturing and nano/micro fabrication capabilities at UMass-Lowell. Current research projects directly benefiting from the requested system include: 1) three-dimensional nanofeatures fabrication for chemical and biological sensing systems; 2) hybrid polymer-metal tooling development for injection molding; 3) nanoscale lithography for nanowire based optical detection systems and nanoelectronics; 4) nanostructure fabrication for photovoltaic energy conversion systems; and 5) nanotemplate fabrication for nanomanufacturing. The NIL system is an essential component of the nanofabrication process chain. The research projects enabled by this nanofabrication capability include many broader-impact applications such as: real time and in situ explosive detection for prevention of loss of human life and damage to infrastructure, biomolecular sensing, high efficiency solar cells for sustainable energy source, lead-free soldering for nanoelectronics packaging, and high-rate, high-volume, and environmentally-safe manufacturing processes. The requested instrumentation will be integrated into education and outreach programs for K-12 teachers and students, undergraduate and graduate students, and industry professionals through the Graduate Certificate in Nanotechnology, capstone and senior projects, course demonstration and laboratory experiments, summer research experience for undergraduates program and ?Nanotech Will Travel? umbrella outreach program. These activities are part of an extensive education and outreach infrastructure organized by the NSF Center for High-rate Nanomanufacturing (CHN) and the state-funded Nanomanufacturing Center of Excellence (NCOE) at UML. This project will also involve students from underrepresented groups in research projects and course work through CHN and NCOE recruiting programs.

“该奖项是根据2009年的《美国回收与再投资法》（公法111-5）资助的。”该项目的目的是利用创新的纳米膜印刷图（NIL）技术来研究和培训微型/Nano sectuers/nano sosterow，Nananos-sosel，Nananosceelt for umosef for umass for for Nanosew for umass for for Nano sever for umosefor for umosef for for Nano septres for in umosef （UML）。零是一个微观和纳米级复制过程，它结合了机械按压和加热或紫外线照明，以低成本和高吞吐量在基板上生成均匀和高分辨率的特征（低于10 nm）。所需的NIL系统将显着增强UMass-Lowell的纳米制造和纳米/微型制造能力。当前从请求的系统中受益的当前研究项目包括：1）化学和生物传感系统的三维纳米制造； 2）注射造型的混合聚合物 - 金属工具开发； 3）用于基于纳米线的光学检测系统和纳米电子的纳米级光刻； 4）光伏能量转换系统的纳米结构制造； 5）用于纳米制造的纳米板制造。零系统是纳米制造过程链的重要组成部分。 The research projects enabled by this nanofabrication capability include many broader-impact applications such as: real time and in situ explosive detection for prevention of loss of human life and damage to infrastructure, biomolecular sensing, high efficiency solar cells for sustainable energy source, lead-free soldering for nanoelectronics packaging, and high-rate, high-volume, and environmentally-safe manufacturing processes.所请求的仪器将通过纳米技术研究生证书，CAPSTONE和高级项目，课程演示和实验室实验，本科生计划的夏季研究经验以及纳米能旅行吗？伞外展计划。这些活动是NSF高速纳米制造中心（CHN）和UML的国家资助的纳米制造中心（NCOE）组织的广泛教育和外展基础设施的一部分。该项目还将通过CHN和NCOE招聘计划参与研究项目和课程工作的学生。