MRI: Aquisition of Nano-Imprint Lithography System

MRI：获得纳米压印光刻系统

• 批准号: 0521074
• 负责人: Alfred Crosby
• 金额: $ 70.28万
• 依托单位: University of Massachusetts Amherst
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-09-01 至 2006-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0521074&HistoricalAwards=false
• 关键词: MRI; Aquisition; Nano; Imprint; Lithography

The establishment of a Nano-Imprint Lithography (NIL) Laboratory on the campus of the University of Massachusetts Amherst will permit the definition of material patterns from the multi-micron to sub-50nm length scales in an economical and efficient manner. The rapid replication and prototyping provided by this technique will enable the study of devices and structures that would otherwise be difficult or prohibitively expensive to make. NIL involves 1) the physical templating of topographic or chemical structures and 2) subsequent photo- or thermal-initiated materials synthesis. The full implementation of this laboratory requires the purchase of two instruments for which we are requesting funding: a Step-and-Flash NIL instrument from Molecular Imprints, Inc. and a state-of-the-art plasma etching system from Trion, Inc. This laboratory is critical to the success of multiple research activities involving the co-PIs and other members of the NSF MRSEC at UMass including the development of advanced materials for nanostructured devices (e.g. nanoscale patterned surfaces for sensors, single-step processing of ultra-low dielectric constant patterns, and high power density pulsed power capacitors for electric vehicles) and fundamental research into the challenges that are limiting the implementation of NIL on the manufacturing scale. The instruments will be housed in the open access Keck Nanostructures Laboratory and a comprehensive management plan is in place to ensure maintenance and accessibility to a broad user base. Additionally, the NIL Laboratory will be incorporated into existing courses on nanotechnology, and its open-access management plan will encourage use by participants in our REU and RET programs as well as faculty and students in the local five college community that includes two women's colleges: Mt. Holyoke College and Smith College. UMass Amherst is an established leader in nanoscale materials science, and this facility will further secure our leadership in device-level implementation of our discoveries while preparing students with expertise in real-world nano-scale manufacturing.This award at the University of Massachusetts Amherst will allow researchers on campus, as well as researchers in the local community and beyond, to advance and expand their expertise in materials research at sizes smaller than one-billionth of a meter. This grant will fund the purchase of two advanced technology instruments that together will enable the preparation of materials with user-defined patterns that are 1000 times smaller than the diameter of a human hair. This capability will aid in the development of new technologies such as chemical sensors, faster and more stable computer chips, and power management devices for electric vehicles. This facility will be an open-access center for faculty and students at UMass and in the local college community which includes two women's colleges: Mt. Holyoke College and Smith College. A comprehensive management plan will ensure accessibility, maintenance, and the incorporation of these instruments into materials research courses, while encouraging non-traditional researchers involved in the Research Experience for Undergraduates and Research Experience for Teachers outreach programs to use the laboratory. UMass currently has a number of exciting initiatives in nanotechnology, and the establishment of this Laboratory will ensure that we remain at the forefront of cutting edge research.

在马萨诸塞大学阿默斯特大学校园内建立纳米刻板印刷机（NIL）实验室将允许以经济和高效的方式定义从多微米到低于50nm长度的物质模式。该技术提供的快速复制和原型制作将使否则难以制造的设备和结构进行研究。 零涉及1）地形或化学结构的物理模板以及2）随后的照片或热激发材料合成。该实验室的全面实施需要购买我们要求提供资金的两种工具：从分子，Inc。，Inc。和Trion的最先进的血浆蚀刻系统中获得的一项零用乐器，该实验室对于涉及多个研究活动的多个NSF MRSEC的其他成员（包括NSF MRSAL的NOSES）的成功至关重要。传感器的图案表面，超低介电恒定图案的单步处理以及电动汽车的高功率密度脉冲电容器以及针对限制限制制造规模实施的挑战的基础研究。这些仪器将安置在开放式凯克纳米结构实验室中，并制定了全面的管理计划，以确保维护和可访问性。此外，NIL实验室将纳入现有的纳米技术课程中，其开放访问管理计划将鼓励参与者在我们的REU和RET计划中使用，以及当地五个学院社区的教师和学生，其中包括两个女子学院：霍利奥克山和史密斯学院。 Umass Amherst是纳米级材料科学领域的既定领导者，该设施将进一步确保我们在设备级别实施我们的发现方面的领导地位，同时为学生提供了现实世界中纳米级制造的专业知识的准备。马萨诸塞大学阿姆斯特大学的奖项奖将使Amherst大学的研究人员以及校园的研究人员以及一位更较小的研究人员的材料和材料的研究者，并允许一位材料的研究人员，并在材料中扩展了一项专业知识。该赠款将资助购买两种先进的技术仪器，这些工具将共同制备用户定义的图案的材料，比人发直径小1000倍。 这种能力将有助于开发新技术，例如化学传感器，更快，更稳定的计算机芯片以及用于电动汽车的电源管理设备。该设施将是UMASS和当地学院社区的教职员工和学生开放式中心，其中包括两个女大学：霍利奥克山学院和史密斯学院。全面的管理计划将确保可访问性，维护以及将这些工具纳入材料研究课程，同时鼓励参与研究经验的非传统研究人员，以提供本科生和研究经验，以供教师推广计划使用实验室。 UMass目前在纳米技术方面有许多令人兴奋的举措，该实验室的建立将确保我们在尖端研究的最前沿。