CAREER: Native Oxides on the III-V Nitrides and Chemical Cleaning of the Semiconductor Surfaces

职业：III-V 族氮化物上的天然氧化物和半导体表面的化学清洗

• 批准号: 9624995
• 负责人: Suzanne Mohney
• 金额: $ 40.62万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-05-15 至 2002-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9624995&HistoricalAwards=false
• 关键词: CAREER; Native; Oxides; III; Nitrides

9624995 Mohney This CAREER research project addresses the formation and the chemical etching of native oxides on III-V nitride surfaces. The chemical and structural nature of intentionally and unintentionally formed oxides on the semiconductor surfaces will be studied, and chemical processing steps for the preparation of semiconductor surfaces for further devic e processing will be developed. Complementary techniques including spectroscopic ellipsometry, Auger electron spectroscopy, x-ray photoelectron spectroscopy, and conventional and high resolution transmission electron microscopy will be employed. The nature of the oxide, which is currently unknown, will strongly influence which chemical etchants w ill be most effective for removing it. Appropriate chemical treatments for removing the oxide and producing surfaces with the least residual oxygen and carbon contamination will be developed, given that many processing steps, such as the formation of ohmic contacts and Schottky barriers, are most conveniently accomplished when a brief exposure to air is allowed between chemical preparation and further processing. Comparison of the effectiveness of the chemical surface preparation procedures will be accomplished through the fabrication and characterization of non-reactive ohmic contacts and/or Schottky barriers to GaN. %%% Along with the basic research activity, this project incorporates material on surface preparation of semiconductors into an undergraduate laboratory course on electronic and photonic materials. Other educational initiatives to be undertaken include updating a senior-level laboratory course on metals science and engineering, increasing the use of c omputer modeling and visualization in the undergraduate curriculum, and increasing participation of undergraduates in research. The proposed basic investigations are expected to contribute fundamental materials science knowledge of technological relevance to advanced microelectronic devices and circuits. The knowledge and understanding gained fro m this research project is expected to contribute in a general way to improving the performance of advanced devices and circuits used in computing, information processing, and telecommunications by providing a fundamental understanding and a basis for designing and producing improved materials and processes. *** _

9624995 Mohney这个职业研究项目介绍了III-V氮化物表面上天然氧化物的形成和化学蚀刻。 将研究在半导体表面上有意和无意地形成的氧化物的化学和结构性质，并将开发用于制备半导体表面的化学处理步骤，以进行进一步的偏离处理。 将采用互补技术，包括光谱椭圆法，螺旋钻电子光谱，X射线光电子光谱以及常规和高分辨率透射电子显微镜。目前未知的氧化物的性质将强烈影响哪种化学蚀刻剂对去除它最有效。鉴于许多处理步骤（例如，当短暂的接触空气暴露在空气中，都最方便地完成时，将开发出适当的化学处理，用于去除氧化物和产生最少残留氧和碳污染的表面，例如欧姆接触和schottky屏障的形成最方便在化学准备和进一步加工之间允许。 通过制造和表征非反应性的欧姆接触和/或GAN的Schottky障碍，可以比较化学表面制备程序的有效性。 %%％与基础研究活动一起，将半导体表面制备的材料纳入了有关电子和光子材料的本科实验室课程。要采取的其他教育计划包括更新有关金属科学和工程的高级实验室课程，从而增加了在本科课程中使用C型组件建模和可视化的使用，并增加了本科生在研究中的参与。拟议的基本研究有望为技术相关性提供基本材料科学知识与先进的微型设备和电路。 通过提供基本的理解和设计和生产改进的材料的基础，预计该研究项目的知识和理解有望以一般的方式做出贡献。和流程。 *** _