Monitoring and Enhancing Molecular Beam Epitaxy Using Low-Energy Ion Scattering

使用低能离子散射监测和增强分子束外延

• 批准号: 9523553
• 负责人: Scott Barnett
• 金额: $ 32.74万
• 依托单位: Northwestern University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-09-01 至 1999-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9523553&HistoricalAwards=false
• 关键词: Monitoring; Enhancing; Molecular; Beam; Epitaxy

9523553 Barnett This research project investigates the kinetic processes and microstructure which occur as a result of glancing angle low energy ion irradiation during MBE growth. Studies of angle-dependent ion damage generation are used to develop new approaches to surface modification, and the use of in-situ ion scattering spectroscopy as a non-destructive analytic technique. The research also includes efforts to modify surface morphology in island growth, and explores research ideas related to selective epitaxy. Electrical, optical and structural characterization will be used throughout the research to evaluate the films. %%% The primary goal of this research project is to establish greater basic understanding of particular phenomena relevant to thin film synthesis and processing through the study of glancing angle low energy ion irradiation during molecular beam epitaxy, and to relate this understanding to the development of advanced microelectronics devices through modifications in processing methods. Additionally, an important feature of the program is the training of graduate and undergraduate students in a fundamentally and technologically significant area. The knowledge and understanding gained from this research project is expected to contribute generally to improving the performance of advanced devices used in computing, information processing, and telecommunications. ***

9523553 Barnett 该研究项目研究MBE 生长过程中掠射角低能离子辐照导致的动力学过程和微观结构。对角度依赖性离子损伤产生的研究用于开发表面改性的新方法，以及使用原位离子散射光谱作为无损分析技术。 该研究还包括努力改变岛生长的表面形态，并探索与选择性外延相关的研究思路。 在整个研究过程中将使用电学、光学和结构表征来评估薄膜。 %%% 该研究项目的主要目标是通过研究分子束外延过程中掠射角低能离子照射，对与薄膜合成和加工相关的特定现象建立更基本的理解，并将这种理解与薄膜合成和加工的发展联系起来。通过改进加工方法来生产先进的微电子设备。 此外，该计划的一个重要特点是在基础和技术重要领域对研究生和本科生进行培训。 从该研究项目中获得的知识和理解预计将有助于提高计算、信息处理和电信领域使用的先进设备的性能。 ***