Photobleachable Host-Guest Thin for Integrated Optical Devices

用于集成光学器件的光漂白主客体薄层

基本信息

批准号：
9303207
负责人：
Bret Halpern
金额：
$ 30万
依托单位：
Jet Process Corporation
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
1993
资助国家：
美国
起止时间：
1993-09-15 至 1996-02-29
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=9303207&HistoricalAwards=false
关键词：
Photobleachable Host Guest Thin Integrated

项目摘要

Thin film passive waveguide are key elements of integrated optical circuits. If the benefits of optical fiber communication are to widely available, thin film waveguides must be manufactured rapidly, reliably and cheaply. This cannot be done now. In Phase I we used our proprietary, environmentally sound Jet Vapor Deposition (JVD) process to make an unusual starting material: a ceramic host film doped with an organic dye guest; this was then photo- patterned, producing a working thin film waveguide. JVD followed by photo-patterning has the potential for high throughput, inexpensive production. JVD ceramic-organic host-guest films, produced at high rate, in unlimited variety, and at room temperature, have excellent optical, chemical and mechanical properties for integrated optics. Accordingly, the JVD + photo-patterning strategy can i) provide a new class of materials useful for integrated optics and compatible with electronic ICs and ii) open the way to high volume manufacture of integrated optic circuits. In Phase II we will investigate the optical properties of JVD dye- doped ceramic films, fabricate devices from them, e.g., directional couplers and filters, demonstrate JVD linking of an optical fiber to a thin film waveguide, and implement laser photo-patterning . Our Phase II research will provide both fundamental advances in photonic materials and new approaches to integrated optics manufacturing. **

薄膜无源波导是集成光路的关键元件。如果要广泛利用光纤通信的优势，就必须快速、可靠且廉价地制造薄膜波导。现在不能这样做。在第一阶段，我们使用了我们专有的、环保的喷射气相沉积 (JVD) 工艺来制造一种不寻常的起始材料：掺杂有有机染料客体的陶瓷基质膜；然后对其进行光图案化，产生工作薄膜波导。 JVD 随后进行光图案化具有高产量、廉价生产的潜力。 JVD陶瓷有机主客体薄膜在室温下高速生产，品种多样，具有优异的集成光学光学、化学和机械性能。因此，JVD + 光图案化策略可以 i) 提供一种可用于集成光学并与电子 IC 兼容的新型材料，ii) 为大规模制造集成光学电路开辟道路。在第二阶段，我们将研究 JVD 染料掺杂陶瓷薄膜的光学特性，用它们制造器件，例如定向耦合器和滤波器，演示光纤与薄膜波导的 JVD 连接，并实现激光光图案化。我们的第二阶段研究将提供光子材料的基本进展和集成光学制造的新方法。 **