Application of Novel High Pressure Synthesis Techniques to Multicomponent Thin Film Systems

新型高压合成技术在多组分薄膜系统中的应用

• 批准号: 9115054
• 负责人: David Paine
• 金额: $ 16.5万
• 依托单位: Brown University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-04-15 至 1996-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9115054&HistoricalAwards=false
• 关键词: Application; Novel; Pressure; Synthesis; Techniques

Fundamental research directed toward understanding both the chemical and micro-structural features of the oxidation of multicomponent materials systems(SiGe and SiC) using high pressure techniques is being carried out. The high pressure technique allows the synthesis of chemically metastable materials that have no natural analogs, and offers the ability to assess the effect of reaction rates under isothermal conditions on the development of interface morphology. %%% This research is expected to provide fundamental understanding of multicomponent materials systems important to the electronics field. The understanding gained will be helpful to semiconductor device design and fabrication. The results will be of importance in a general way to the technology of large scale, high speed integrated electronic circuits.

正在使用高压技术进行多组分材料系统（SIGE和SIC）氧化的化学和微观结构特征的基础研究。 高压技术允许合成没有天然类似物的化学稳定材料，并具有评估等温条件下反应速率对界面形态发展的影响的能力。 %%％这项研究有望提供对对电子领域重要的多组分材料系统的基本理解。 获得的理解将有助于半导体设备的设计和制造。 结果将以大规模高速集成电子电路技术的一般方式至关重要。