Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing

用于增强半导体制造中光刻性能的精密运动平台

• 批准号: RGPIN-2018-04704
• 负责人: AlJanaideh, Mohammad
• 金额: $ 2.33万
• 依托单位: Memorial University of Newfoundland
• 依托单位国家: 加拿大
• 项目类别: Discovery Grants Program - Individual
• 财政年份: 2022
• 资助国家: 加拿大
• 起止时间: 2022-01-01 至 2023-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=760128
• 关键词: Precision; Motion; Stages; Enhancing; Performance

This research program develops new precision motion systems to enhance the sub-nanometer accuracy of the semiconductor manufacturing. Currently, extreme ultraviolet (EUV) lithography technology is used to produce lighter, smarter, and faster integrated circuits. These circuits are a key part of daily electrical and electronic devices. The EUV lithographic system includes the wafer stage that holds the wafer, reticle stage that governs the pattern, and the projection lens. The light passes through the reticle, then the diffracted light which passes through the projection lens forms an image on the wafer. To achieve nanometer accurate imaging performance, the motion of several millimeters of the wafer stage and the reticle stage should be precisely synchronized. The current resolution of EUV lithography machines is 13 nanometers, which is the minimum structural gap between any two electronic components in the manufactured integrated circuits. It is important to improve the positioning accuracy of EUV lithography technology to develop efficient microprocessors for the autonomous car. The main objective of this research program is to develop multi-axial high-speed nano-precision regulators with piezoceramic stages for the EUV Lithography Process. These regulators will precisely orient the position of the reticle considering the wafer positioning errors. This novel approach would minimize the positioning errors of the imaging and enhance the synchronized motion between the reticle stage and the wafer stage. The proposed nano-precision regulators will be designed with piezoceramic stages and flexure-based positioners. This will lead to new designs for the reticle stage and a "self-regulating smart material-based reticle" for the EUV lithography process. The four objectives of the research program are: (i) development of new multivariable electro-mechanical dynamic model to simulate the synchronization motion of the EUV lithography process, (ii) design of multi-axial high-speed nanopositioning regulators that adopt a nano-resolution mechanism to adjust the reticle stage position based on micro-positioning errors of the wafer stage, (iii) development of a new parametric identification algorithm and a model-based control system to drive the multi-axial high-speed nanopositioning regulators over different operating conditions, and (iv) design of a self-regulating smart material-based reticle. The research group will be diverse and will recruit women and underrepresented groups. This group will include 3 PhD, 2 Master's, and 2 undergraduate students. The research program is anticipated to contribute significantly to semiconductor manufacturing and new innovative applications of piezoceramics materials.

该研究计划开发了新的精确运动系统，以增强半导体制造的次纳米精度。当前，极端紫外线（EUV）光刻技术用于生产更轻，更智能和更快的集成电路。这些电路是每日电气和电子设备的关键部分。 EUV光刻系统包括保存晶圆的晶圆阶段，控制模式的标线阶段以及投影镜头。光穿过标线，然后穿过投影镜片的衍射光在晶圆上形成图像。为了实现纳米精确的成像性能，应精确地同步晶片阶段的几毫米和标线阶段的运动。 EUV光刻计算机的当前分辨率为13纳米，这是制成的集成电路中任意两个电子组件之间的最小结构间隙。重要的是提高EUV光刻技术的定位准确性，以开发自动驾驶汽车的有效微处理器。该研究计划的主要目的是在EUV光刻过程中开发具有压电阶段的多轴高速纳米过度调节器。这些调节剂将准确地定位考虑晶片定位误差的标线位置。这种新颖的方法将最大程度地减少成像的定位误差，并增强标线阶段和晶圆阶段之间的同步运动。拟议的纳米精确调节器将采用压电阶段和基于弯曲的定位器设计。这将导致标线阶段的新设计，并为EUV光刻过程提供“自我调节的基于智能材料的标线”。 The four objectives of the research program are: (i) development of new multivariable electro-mechanical dynamic model to simulate the synchronization motion of the EUV lithography process, (ii) design of multi-axial high-speed nanopositioning regulators that adopt a nano-resolution mechanism to adjust the reticle stage position based on micro-positioning errors of the wafer stage, (iii) development of a new parametric identification algorithm and一种基于模型的控制系统，可在不同的操作条件下驱动多轴高速纳米定位调节器，以及（iv）自我调节的基于智能材料的标线的设计。研究小组将是多元化的，并将招募妇女和代表性不足的群体。该小组将包括3位博士学位，2位硕士和2名本科生。预计该研究计划将为半导体制造和压电陶瓷材料的新创新应用做出重大贡献。