Refurbishment of a 20-Year Old RIE System

翻新已有 20 年历史的 RIE 系统

• 批准号: RTI-2023-00507
• 负责人: Mansour, Raafat
• 金额: $ 10.72万
• 依托单位: University of Waterloo
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments
• 财政年份: 2022
• 资助国家: 加拿大
• 起止时间: 2022-01-01 至 2023-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=751627
• 关键词: Refurbishment; 20; Year; Old; RIE

The purpose of this Research Tool and Instruments (RTI) application is to request a grant to refurbish a 20- year old Reactive Ion Etching (RIE) System. The system is located in the Center for Integrated RF Engineering (CIRFE) clean room facility at the University of Waterloo, which is dedicated to the fabrication of micro and nano devices. The PECVD system is used for etching of silicon dioxides SiO2 or/and silicon nitride SiNx films. Over the past 20 years, this system has been the workhorse of the CIRFE clean room and has been an essential tool for successfully completing many fabrication processes and developing a wide range of novel devices. After going through few repair cycles over the past 20 years, some of the system hardware components are no longer commercially available. It became clear that the system needs an overall refurbishment to get it to the proper operational state. The system benefits more than 15 faculty members and their graduate students at the University of Waterloo who currently use the fabrication services of the CIRFE clean room. It also benefits other researchers in Canada who access the CIRFE clean room for thin film etching services.

本研究工具和仪器 (RTI) 申请的目的是申请拨款以翻新已有 20 年历史的反应离子蚀刻 (RIE) 系统。该系统位于滑铁卢大学集成射频工程中心 (CIRFE) 洁净室设施中，该设施致力于微型和纳米器件的制造。 PECVD系统用于蚀刻二氧化硅SiO2或/和氮化硅SiNx薄膜。在过去的 20 年里，该系统一直是 CIRFE 洁净室的主力，也是成功完成许多制造工艺和开发各种新颖设备的重要工具。在经历了过去 20 年的几次维修周期之后，一些系统硬件组件不再在商业上可用。很明显，该系统需要进行全面整修才能使其达到正确的运行状态。该系统使滑铁卢大学超过 15 名教职员工及其研究生受益，他们目前正在使用 CIRFE 洁净室的制造服务。它还使加拿大其他进入 CIRFE 洁净室进行薄膜蚀刻服务的研究人员受益。