Optical process control for plasma-assisted deposition of functional nanoelectronic thin films

功能纳米电子薄膜等离子体辅助沉积的光学过程控制

• 批准号: 452311-2013
• 负责人: Ruediger, Andreas
• 金额: $ 2.91万
• 依托单位: Institut national de la recherche scientifique
• 依托单位国家: 加拿大
• 项目类别: Collaborative Research and Development Grants
• 财政年份: 2015
• 资助国家: 加拿大
• 起止时间: 2015-01-01 至 2016-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=575478
• 关键词: Optical; process; control; plasma; assisted

With the goal to establish a technology transfer from research grade deposition tools to industrial scale for the deposition of functional nanoelectronic thin films, we target sputter deposition for a novel multiferroic material, Bi2FeCrO6, which has so far been synthesized by pulsed laser deposition. This transfer has shown to require additional process control regarding the film growth. In order to establish an in-situ control technique that can possibly sell as a complementary toolbox for sputtering devices, we will investigate the potential of optical spectroscopy techniques including second harmonic generation and Raman scattering to monitor the properties of the material during growth in a pulsed sputtering scheme. The two industrial partners are specialized in sputter tools and in the synchronization of optical detection respectively. The research team is composed of specialists in thin film growth, ferroelectrics and optical spectroscopy, which combines all necessary expertise in this three-year project. The intense implication and training of highly qualified personnel is the key to meeting all milestones in due time, we therefore dedicate almost all budget to salaries and training. The proof of concept and a first demonstration of in-situ characterization will not only have our industrial partners benefit immediately but will also create a better understanding of an enabling technology for thin films in electronic industries with a broader impact that reaches beyond the team partners.

为了建立从研究级沉积工具到工业量表的技术转移，以使功能性纳米电子薄膜沉积，我们靶向溅射沉积，用于一种新型的多效材料Bi2Fecro6，迄今为止，该材料已通过脉冲激光沉积合成。该转移已显示需要有关膜增长的额外过程控制。为了建立一种可能作为溅射设备互补工具箱出售的原位控制技术，我们将研究光谱技术的潜力，包括第二次谐波生成和拉曼散射，以监测脉冲溅射方案中材料在生长过程中的特性。这两个工业伙伴分别专门从事溅射工具和光学检测的同步。该研究团队由薄膜增长，铁电和光谱的专家组成，该专家结合了这个三年项目中所有必要的专业知识。高度合格人员的强烈影响和培训是在适当时候达到所有里程碑的关键，因此，我们几乎将所有预算用于薪水和培训。概念验证和原位表征的首次演示不仅将使我们的工业合作伙伴立即受益，而且还将更好地理解具有更广泛影响的电子行业的薄膜技术，从而超出了团队合作伙伴。