HL-LHC-UK phase 2

HL-LHC-UK 2 期

• 批准号: ST/T001887/1
• 负责人: AMIN ABDOLVAND
• 金额: $ 139.82万
• 依托单位: University of Dundee
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2020
• 资助国家: 英国
• 起止时间: 2020 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=ST%2FT001887%2F1
• 关键词: HL; LHC; UK; phase

Abstracts are not currently available in GtR for all funded research. This is normally because the abstract was not required at the time of proposal submission, but may be because it included sensitive information such as personal details.

目前，GtR 中尚未提供所有资助研究的摘要。这通常是因为在提交提案时不需要摘要，但可能是因为它包含个人详细信息等敏感信息。

项目成果

Surface Structure Modelling for Laser-Assisted Reduction of SEY

激光辅助减少 SEY 的表面结构建模

• DOI: http://dx.10.1109/cleo/europe-eqec57999.2023.10231571
• 发表时间: 2023
• 作者: Din A

Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films

表面纹理化和功能涂层的有效组合，用于极低二次电子产率表面和粗糙的非蒸发吸气膜

• DOI: 10.1002/admi.202201671
• 发表时间: 2022-11-06
• 期刊: Advanced Materials Interfaces
• 影响因子: 5.4
• 作者: M. Himmerlich;D. A. Zanin;M. Taborelli;Angelo Rafael Granadeiro Costa;P. Costa Pinto;L. Lain Amador
• 通讯作者: L. Lain Amador

Picosecond pulsed 532 nm laser system for roughening and secondary electron yield reduction of inner surfaces of up to 15 m long tubes.

皮秒脉冲 532 nm 激光系统可对最长 15 m 的管内表面进行粗糙化和二次电子产率降低。

• DOI: http://dx.10.1063/5.0166156
• 发表时间: 2023
• 期刊: The Review of scientific instruments
• 作者: Bez E

Out of focus ultrafast processing of metals for reduced secondary electron yield

金属失焦超快加工可降低二次电子产率

• DOI: http://dx.10.1364/ome.484235
• 发表时间: 2023
• 期刊: Optical Materials Express
• 影响因子: 2.8
• 作者: Uren R

Optimization of the secondary electron yield of laser-structured copper surfaces at room and cryogenic temperature

室温和低温下激光结构铜表面二次电子产率的优化

• DOI: http://dx.10.1103/physrevaccelbeams.23.033101
• 发表时间: 2020
• 期刊: Physical Review Accelerators and Beams
• 影响因子: 1.7
• 作者: Calatroni S