Laser Interference Lithography based 4D-printing of Nanomaterials

基于激光干涉光刻的纳米材料 4D 打印

• 批准号: EP/X038203/1
• 负责人: Dayou Li
• 金额: $ 15.66万
• 依托单位: University of Bedfordshire
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2023
• 资助国家: 英国
• 起止时间: 2023 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FX038203%2F1
• 关键词: Laser; Interference; Lithography; based; 4D

By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life. The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments

通过应对当前纳米材料的4D打印的局限性，该项目旨在启动新的工艺范式，激光干扰石版画（LIL）4D打印，以迅速，准确地生产真正的3D结构和大体积4D纳米材料。它通过将激光干扰石版画与先进的智能墨水相结合，从而实现这一目标，从而产生4D纳米材料制造的最先进容量。这种新方法有可能大量生产4D纳米材料和纳米材料的市场摄入量。在我们的方法中，应用LIL模式，并将模式缝合以形成真正的3D纳米结构，然后进行智能油墨的浸润。该方法基于一些已建立的原则和在财团内获得的先前艺术，但尚未进一步探索。该项目为LIL和Metalens创建了有关3D图案和纳米量学的新知识，4D纳米材料的生物活性毒性，4D纳米材料和微结构对电池性能/寿命的影响。研究和创新目标旨在整合体积激光卷曲光刻扫描扫描和深度暴露，以快速，准确，真正的3D结构制造，以基于最先进的纳米量表和特性的形式，从纳米材料。新技术将在生物医学和工程应用上开创。这些目标是雄心勃勃的，需要国际水平的合作。该项目通过在财团成员及其他地区之间启动长期协作平台来解决合作。它还通过各种联合研究，创新和培训活动强调员工的发展，特别是精心安排的借调