Bid for new Electron-Beam Lithography Tool

新型电子束光刻工具招标

• 批准号: EP/P030459/1
• 负责人: Muffy Calder
• 金额: $ 254.84万
• 依托单位: University of Glasgow
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2017
• 资助国家: 英国
• 起止时间: 2017 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FP030459%2F1
• 关键词: Bid; new; Electron; Beam; Lithography

The last fifty years have seen spectacular progress in the ability to assemble materials with a precision of nanometers (a few atoms across). This nanofabrication ability is built upon the twin pillars of lithography and pattern transfer. A whole range of tools are used for pattern transfer. Lithography is a photographic process for the production of small structures in which structures are "drawn" in a thin radiation sensitive film. Then comes the pattern transfer step in which the shapes are transferred into a useful material, such as that of an active semiconductor device or a metal wire. Lithography is the key process used to make silicon integrated circuits, such as a microprocessor with eight billion working transistors, or a camera chip which is over two inches across.The manufacture of microprocessors is accomplished in large, dedicated factories which are limited to making one type of device. Also, normal lithography tools require the production of large, perfect and extremely expensive "negatives" so that it is only economical to use this technology to make huge numbers of identical devices.The applications of lithography are far broader than just making silicon chips, however. For example, large areas of small dots of material can be used to make cells grow in particular directions or to become certain cell types for use in regenerative medicine; The definition of an exquisitely precise diffraction grating on a laser allows it to produce the perfectly controlled wavelengths of light needed to make portable atomic clocks or to measure the tiny magnetic fields associated with the functioning of the brain; Lithography enables the direct manipulation of quantum states needed to refine the international standards of time and electrical current and may one day revolutionise computation; By controlling the size and shape of a material we can give it new properties, enabling the replacement of scarce strategic materials such as tellurium in the harvesting of waste thermal energy.This grant will enable the installation of an "electron-beam lithography" system in an advanced general-purpose fabrication laboratory. Electron beam lithography uses an electron beam rather than light to expose the resist and has the same advantages of resolution that an electron microscope has over a light microscope. This system will allow the production of the tiniest structures over large samples but does not need an expensive "negative" to be made. Instead, like a laser printer, the pattern to be written is defined in software, so that there is no cost associated with changing the shape if only one object of a particular shape is to be made. The electron beam lithography system is therefore perfect for making small things for scientific research or for making small numbers of a specialized device for a small company. The tool will be housed in a laboratory which allows the processing of the widest possible range of materials, from precious gem diamonds a few millimetres across to disks of exotic semiconductor the size of dinner plates.The tool will be used by about 200 people from all over the UK and the world. By running continuously the tool will be very inexpensive to use, allowing the power of leading-edge lithography to be used by anyone, from students to small businesses. The tool will be supported and operated by a large dedicated team of extremely experienced staff, so that the learning curve to applying the most advanced incarnation of the most powerful technology of the age will be reduced to a matter of a few weeks.

在过去的五十年里，组装纳米级（几个原子直径）精度的材料的能力取得了惊人的进步。这种纳米加工能力建立在光刻和图案转移的双支柱之上。一系列工具用于图案转移。光刻是一种用于生产小型结构的照相工艺，其中结构被“绘制”在辐射敏感薄膜上。然后是图案转移步骤，其中形状被转移到有用的材料中，例如有源半导体器件或金属线的材料。光刻是制造硅集成电路的关键工艺，例如具有 80 亿个工作晶体管的微处理器，或超过两英寸宽的相机芯片。微处理器的制造是在大型专用工厂完成的，这些工厂仅限于制造一个设备类型。此外，普通的光刻工具需要生产大型、完美且极其昂贵的“底片”，因此使用该技术制造大量相同的器件才是经济的。然而，光刻的应用远比仅仅制造硅芯片更广泛。 。例如，大面积的小点材料可用于使细胞沿特定方向生长或成为再生医学中使用的某些细胞类型；激光器上极其精确的衍射光栅的定义使其能够产生制造便携式原子钟或测量与大脑功能相关的微小磁场所需的完美控制的光波长；光刻技术能够直接操纵量子态，从而完善时间和电流的国际标准，并且有一天可能会彻底改变计算；通过控制材料的尺寸和形状，我们可以赋予它新的特性，从而能够在废热能的收集中替代稀有的战略材料，例如碲。这笔赠款将使得能够在先进的通用制造实验室。电子束光刻使用电子束而不是光来曝光抗蚀剂，并且与电子显微镜相比具有与光学显微镜相同的分辨率优势。该系统将允许在大样本上生产最小的结构，但不需要制作昂贵的“负片”。相反，像激光打印机一样，要写入的图案是在软件中定义的，因此如果只制作一个特定形状的物体，则不存在与改变形状相关的成本。因此，电子束光刻系统非常适合为科学研究制造小型物品或为小公司制造少量专用设备。该工具将安置在一个实验室中，该实验室可以加工尽可能广泛的材料，从几毫米宽的珍贵宝石钻石到餐盘大小的奇异半导体圆盘。该工具将由来自世界各地的约 200 人使用。遍布英国和世界各地。通过持续运行，该工具的使用成本将非常低廉，从而使从学生到小型企业的任何人都可以使用尖端光刻技术的强大功能。该工具将由经验丰富的员工组成的大型敬业团队提供支持和操作，因此应用当今最强大技术的最先进化身的学习曲线将缩短到几周的时间。