Digital imaging enhanced by plasmon resonance elements

等离子共振元件增强的数字成像

• 批准号: EP/G008329/1
• 负责人: David Cumming
• 金额: $ 61.47万
• 依托单位: University of Glasgow
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2009
• 资助国家: 英国
• 起止时间: 2009 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FG008329%2F1
• 关键词: Digital; imaging; enhanced; plasmon; resonance

In this project we will combine the CMOS imager design skills at Oxford University and the thin-film technology of Sharp Laboratories Europe with the nanofabrication and nano-optics expertise at Glasgow University to, for the first time, implement plasmon enhanced technologies for use in imaging and displays. The proposed technology can provide both wavelength and polarisation control in a single fabricated layer on the surface of otherwise standard technologies. This is a major step-forward from present day technologies that rely on multiple layers of processing to achieve less powerful effects.Optical resonances occur at the surface of metal films due to the dielectric dispersion relation. This phenomenon leads to surface plasmon resonances (SPR). Surface plasmons are non-radiative electromagnetic surface waves that cause fluctuations in the surface electron density. The simplest exploitation of this phenomenon is in thin films where the dispersion relation is close to resonance, leading to the enhancement of the electric field of a propagating light wave. Surface inhomogeneity, such as a deliberately-created periodic undulation on the metal surface, is used to improve the coupling of the light to the plasmons [1] hence increasing the enhancement. More recent work has shown how nanoparticle structures made by techniques ranging from colloidal suspensions to direct-write lithography can lead to further SPR enhancement in small structures.CMOS integrated circuits are now the dominant technology for optical imaging, including digital cameras, microscopes and a range of optical instruments. Similarly, active display technologies have become dominant, and widespread, in industrial and commercial sectors. These electronic devices combine high performance with low cost and also enable designers to implement signal processing functions on to the same substrate as the imaging sensor to reduce cost, pixel size and power consumption. However, current technologies suffer from a number of drawbacks that are limiting progress in traditional markets. Furthermore, little is being done to enable the core technology to expand its functionality, and hence use, in new and emerging markets. The aim of this project is to use the emerging field of plasmonics to study the potential for using back-end-of-line (BEOL) processing at the silicon foundry to enable both enhancement and diversification of the capabilities of electronic optical detectors, imagers and displays.

在这个项目中，我们将在牛津大学的CMOS成像器设计技能和欧洲锋利实验室的薄膜技术与格拉斯哥大学的纳米型制作和纳米镜专业知识相结合，首次实施等离子体体的技术增强技术，以用于成像和展示。所提出的技术可以在否则标准技术表面的单个制造层中同时提供波长和极化控制。这是从当今技术依赖多层处理以达到功能较低的效果的主要步骤。光谐振发生在金属膜的表面由于介电分散关系。这种现象导致表面等离子体共振（SPR）。表面等离子体是非辐射电磁表面波，引起表面电子密度波动。对这种现象的最简单剥削是在薄膜中，在薄膜中，分散关系接近共振，从而导致繁殖光波的电场增强。表面不均匀性，例如金属表面上有意创建的周期性起伏，用于改善光与等离子的偶联[1]，从而增加增强。最近的工作表明，从胶体悬浮液到直接闪光灯的技术制造的纳米颗粒结构如何导致小型结构的进一步增强。CMOS集成电路现在是光学成像的主要技术，包括数字摄像机，显微镜，显微镜，显微镜和光学仪器范围。同样，在工业和商业领域，主动展示技术已成为主导和广泛的。这些电子设备将高性能与低成本相结合，还使设计人员能够在与成像传感器相同的基板上实施信号处理功能，以降低成本，像素尺寸和功耗。但是，当前的技术遭受了许多缺点，这些缺点限制了传统市场的进步。此外，几乎没有做任何事情来使核心技术能够在新的和新兴市场中扩展其功能，从而扩大其功能。该项目的目的是利用血浆的新兴领域来研究在硅铸造厂使用后端（BEOL）加工的潜力，以使电子光检测器，成像器和显示器能力的增强和多样化。