Preparation of High-quality Bi-2223 Single Crystal Thin Film for Intrinsic Josephson Junctions used in THz Emission

太赫兹发射用本征约瑟夫森结高质量 Bi-2223 单晶薄膜的制备

• 批准号: 21560339
• 负责人: ENDO Kazuhiro
• 金额: $ 3万
• 依托单位: Kanazawa Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2009
• 资助国家: 日本
• 起止时间: 2009 至 2011
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-21560339/
• 关键词: ビスマス系超伝導酸化物; Bi-2223; 薄膜; MOCVD; テラヘルツ素子; 固有ジョセフソン接合; 先端機能デバイス; 超電導材料・素子; テラヘルツ/赤外材料・素子; ビスマス系酸化物超伝導体; テラヘルツ発振素子

Terahertz electromagnetic waves are expected to be applied for "safety and security" devices such as detectors of cancer cells and non-destructive inspection tools instead of X-rays. The theory on terahertz coherent emission from intrinsic Josephson junctions has been proposed and recently demonstrated for bulk crystals of Bi-2212 superconducting materials. However, the intensity of emission is weak for practical use. In order to solve the "low intensity problem" new device structures using thin films are proposed. To approach and demonstrate this idea, high-quality non c-axis oriented Bi-2223 thin films are prepared by metalorganic chemical vapor deposition.

太赫兹电磁波预计将取代X射线应用于癌细胞探测器和无损检测工具等“安全保障”设备。已经提出了本征约瑟夫森结的太赫兹相干发射理论，并且最近针对 Bi-2212 超导材料的块状晶体进行了论证。然而，发射强度对于实际应用而言较弱。为了解决“低强度问题”，提出了使用薄膜的新器件结构。为了实现并证明这一想法，通过金属有机化学气相沉积制备了高质量的非 c 轴取向 Bi-2223 薄膜。

项目成果

Emission of Terahertz Electromagnetic Waves from Intrinsic Josephson Junction Arrays Embedded in Resonance LCR Circuits

谐振 LCR 电路中嵌入的本征约瑟夫森结阵列发射太赫兹电磁波

• DOI: 10.1103/physrevb.83.014508
• 发表时间: 2011
• 作者: M.Tachiki

Peculiar Electrical and Magnetic Properties of La(Ba)MnO3 Thin Films

La(Ba)MnO3 薄膜的特殊电学和磁学性质

• 发表时间: 2010
• 作者: K.Endo

Advanced Growth Method of High-quality Oxide Films with Perovskite-related Structure for Future Electronics

用于未来电子产品的具有钙钛矿相关结构的高质量氧化膜的先进生长方法

• 发表时间: 2010
• 作者: K.Endo

Model of Coherent Emission from Disordered Arrays of Driven Josephson Vortices

驱动约瑟夫森涡旋无序阵列的相干发射模型

• 发表时间: 2010
• 影响因子: 3.7
• 作者: M.Tachiki

Thin Films of the Insulating(001)CaCuO_2 Infinite-Layer with Low Roughness and Highly Uniform Morphology

低粗糙度、形貌高度均匀的绝缘(001)CaCuO_2无限层薄膜

• 发表时间: 2010
• 作者: K.Endo