Development of New Magnetron Plasma Source with Particle Energy Control

新型粒子能量控制磁控等离子体源的研制

基本信息

批准号：
18540489
负责人：
TOYODA Hirotaka
金额：
$ 2.12万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2006
资助国家：
日本
起止时间：
2006 至 2007
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-18540489/
关键词：
magnetron sputter high energy particle mass spectrometry multilaver film flat surface film damage-free film

项目摘要

Magnetron plasmas are widely used for deposition of mutilayer films such as optical coating, magnetic recording media, semiconductor fabrication, and so on. Recent progress of fidelity in film deposition processes, it is required to deposit film with very high smoothness and high interface quality in nano-scale. In the case of magnetic multilayer films (Pt/Co etc.) those exhibit magnetic anisotropy, it is known that smoothness and suppression of atom mixing at the interface drastically influence the magnetic property of the film. So far, however, such precise interface control of the multilayer films are considered to be very difficult by the sputter deposition process, and understanding of the mechanism and suppression of such phenomena is one of important issues.For the control of the multilayer interface property, we focus on high energy rare gas species in magnetron plasmas. In this project, we established the diagnostic technique of such high energy rare gas atoms by mass spectrom … More etry, and studied on the new technology to control such high energy atoms.At first, we evaluated energy distribution of Ar atom in conventional planer DC magnetron plasma by using a mass spectrometer with an energy analyzer. The obtained results are compared with an originally-developed simulation code and feasibility of the measurement technique was confirmed. Next, we proposed two magnetron sputter techniques, i.e., VHF-DC superimposed magnetron sputter plasma and cylindrical magnetron sputter plasma. From the AM- energy distribution measurement, it was confirmed that both VHF-DC and cylindrical magnetron plasmas can suppress high energy Ar atoms. Finally, VHF-DC magnetron plasma source was applied to the deposition of magnetic multilayer films. In the case of VHF-DC magnetron sputter deposition, magnetic multilayer film with very good magnetic property was observed with very thin layer thickness in order of a few nm. Such good film property suggest that the atom mixing at the film interface was suppressed by suppression of high energy Ar atom flux. Less

磁控等离子体广泛用于光学镀膜、磁记录介质、半导体制造等多层薄膜的沉积，近年来薄膜沉积工艺保真度的进步，要求沉积薄膜具有非常高的光滑度和高界面质量。然而，就表现出磁各向异性的磁性多层膜（Pt/Co等）而言，界面处的光滑度和原子混合的抑制会极大地影响膜的磁性。如此精确溅射沉积过程中多层薄膜的界面控制被认为是非常困难的，了解这种现象的机理和抑制是重要的问题之一。对于多层薄膜界面性质的控制，我们重点关注高能稀有气体在这个项目中，我们建立了这种高能稀有气体原子的质谱诊断技术，并研究了控制这种高能原子的新技术。首先，我们评估了Ar的能量分布。传统平面直流磁控管等离子体中的原子通过使用带有能量分析仪的质谱仪，将获得的结果与最初开发的模拟代码进行比较，并确认了测量技术的可行性，即VHF-DC叠加磁控溅射等离子体和从AM-能量分布测量中，证实了VHF-DC和圆柱形磁控等离子体都可以抑制高能Ar原子。将其应用于磁性多层薄膜的沉积中，在VHF-DC磁控溅射沉积的情况下，观察到具有非常好的磁性能的磁性多层薄膜，其层厚非常薄，仅为几纳米。通过抑制高能Ar原子通量来抑制薄膜界面处的原子混合。

项目成果

期刊论文数量（0）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Dependence of GMR in Co/Cu Multilayers on Sputtering Conditions

Co/Cu 多层膜中 GMR 对溅射条件的依赖性

DOI：
发表时间：
2006
期刊：
影响因子：
0
作者：
C. C. Chen;Y. Sakashita;Y. Suzuki;T. Kato;S. Iwata;S. Tsunashima;H. Toyoda;K. Sasaki;H. Sugai
通讯作者：
H. Sugai

Suppression of Super High-Energy Species by VHF-DC Superimposed Magnetron Sputter Plasma

VHF-DC 叠加磁控溅射等离子体抑制超高能物质

DOI：
发表时间：
2006
期刊：
Trans. Mat. Res. Soc. Jpn vol.32
影响因子：
0
作者：
Y. Sakashita;Y. Takagi;T. Kato;H. Toyoda;S. Iwata;S. Tsunashima;H. Sugai
通讯作者：
H. Sugai

Numberical Simulation of Energetic Species in a VHF-DC Magnetron Plasma and Comparison with Experiments

VHF-DC 磁控管等离子体中高能粒子的数值模拟及与实验的比较

DOI：
发表时间：
2006
期刊：
Abstract of 6th International Conference on Reactive Plasmas, Matsushima, Japan
影响因子：
0
作者：
H.Toyoda;Y.Sakashita;Y.Takagi;H.Sugai
通讯作者：
H.Sugai

Energy Control of Backscattered Rare Gas Atoms by VHF-DC Superimposed Magnetron Sputtering (Invited)

VHF-DC叠加磁控溅射背散射稀有气体原子的能量控制（特邀）