Study on the stress generation during gel/ceramic thin film conversion

凝胶/陶瓷薄膜转化过程中应力产生的研究

基本信息

批准号：
12650679
负责人：
KOZUKA Hiromitsu
金额：
$ 2.3万
依托单位：
Kansai University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2000
资助国家：
日本
起止时间：
2000 至 2001
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-12650679/
关键词：
Sol-gel method Ferroelectrices Piezoelectric materials Thin film Barium titanate PZT Stress Film thickness

项目摘要

1 Silica and titania gel films were deposited on silicon wafers by sol-gel method using alkoxide-derived sols as the coating solutions. The gel films were heated at constant rates in an infrared furnace up to 800℃, and in situ observation was made using an optical microscope. The cracking was found to occur during the heating-up stage, and the cracking onset temperature was lower than that of crystallization. The cracking onset temperatures were found to decrease with increasing initial film thickness and with decreasing heating rate.2 BaTiO_3 thin films were deposited on silica glass and MgO single crystal substrates by sol-gel dip-coating using an alkoxide solutions containing polyvinylpyrrolidone (PVP) as the coating solution. SEM observation revealed that the fihns deposited on the silica glass substrates have microcracks propagating along grain boundaries. On the other hand, no microcracks were found on the films deposited on the MgO single crystal substrates, The microcracks obse … More ived are supposed to be formed by tensile stress in films, which is thought to be generated as a result of the thermal expansion coefficient mismatch between the film and the substrates.3 Titania thin fihns were deposited on silica glass substrates by sol-gel method using alkoxide solutions containing diethanolamine, acetylacetone or acetic acid as the chelating agents. The stress in the fired films were measured by measuring the substrate bending, and the effect of the chelating agent on the stress. The stress was tensile, increasing in the order of acetic acid < acetylacetone < diethanolarnine. The effect of the chelating agent on the stress was interpreted in terms of the difference in the degree of film densification.4 BaTiO_3, Fe_2O_3 and PZT thin films were deposited on silica glass substrates using alkoxide or metal salt solutions containing PVP as the coating solutions. The critical thickness, the maximum thickness achievable without cracking via single-step deposition was found to increase by incorporating PVP in solutions, showing maximum around mole ratios of PVP/Ti(OC_3H_7^i)_4 = 0.5, PVP/Fe(N0_3)_3 = O and PVP/ (Ti(OC_3H_7^i)_4 + Zr(OC_3H_7^n)_4) for BaTiO_3, Fe_2O_3 and PZT films, respectively. Less

1二氧化硅和二氧化钛凝胶膜通过溶胶 - 凝胶方法使用烷氧化物衍生的溶胶作为涂料溶液沉积在硅波上。将凝胶膜以恒定的速率加热，在高达800℃的红外炉中，并使用光学显微镜进行原位观察。发现裂纹在加热阶段发生，并且开裂的开始温度低于结晶。发现开裂的开始温度随着初始膜厚度的增加而降低，并降低加热速率。2BATIO_3薄膜通过使用含有聚乙烯基吡咯烷酮（PVP）的烷氧化物溶液作为卵巢溶液，将硅胶玻璃和MGO单晶底物沉积在硅胶和MGO单晶底物上。 SEM观察结果表明，沉积在硅胶基板上的Fihns具有沿晶界传播的微裂纹。 On the other hand, no microcracks were found on the films deposited on the MgO single crystal substrates, The microcracks obse … More ives are supposed to be formed by tensile stress in films, which is thought to be generated as a result of the thermal expansion coefficient mismatch between the film and the substrates.3 Titania thin fihns were deposited on silica glass substrates by sol-gel method using alkoxide solutions含有乙醇胺，乙酰丙酮或乙酸作为螯合剂。通过测量底物弯曲以及螯合剂对应力的影响来测量被解雇膜中的应力。应力是拉伸的，在乙酸<乙酰丙酮<二乙基氨酸的顺序上增加。螯合剂对薄膜致密度的差异的解释。4BATIO_3，FE_2O_3和PZT薄膜使用烷氧化物或金属盐溶液将包含PVP作为涂层溶液作为涂层溶液沉积在硅胶玻璃底物上。发现临界厚度，可通过单步沉积物破裂而无法实现的最大厚度通过增加溶液中的PVP增加，显示出最大的PVP/Ti分子比（OC_3H_7^i）_4 = 0.5，PVP/FE（N0_3）_3 = O和PVP/PVP/（TI（ti） Zr（OC_3H_7^n）_4）分别用于Batio_3，Fe_2O_3和PZT电影。较少的