Fluorination of Ceramic Fiber with Chlorotrifluoromethane, especially <CCl_3F>

用三氟氯甲烷特别是<CCl_3F>氟化陶瓷纤维

基本信息

批准号：
60550562
负责人：
OKAZAKI Susumu
金额：
$ 1.22万
依托单位：
Ibaraki University
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (C)
财政年份：
1985
资助国家：
日本
起止时间：
1985 至 1986
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-60550562/
关键词：
Ceramics Silica Fluorination Plasma Hydrophobic Lipophobic 表面改質

项目摘要

In order to obtain some information regarding the preparation of fluorinated ceramics, <SiO_2> powder calcinated at high temperatures(1000-1500゜C) was treated with gaseous chlorofluoromethanes or <CF_4> at 450-550゜C in a closed circulation system. In addition, <CF_4> -plasma treatment was applied to the same <SiO_2> sample to perform an intensive surface fluorination.The treatments at 550゜C showed the order of the fluorination activity as following, <CCl_3F> (4.2) > <CCl_2F_2> (2.5) > <CClF_3> (0.3) > <CF_4> (0). (Here, the numbers in parentheses designate F content(%) in the surface layer of the treated <SiO_2> sample.) The F content in the surface layer of the <CCl_3F> -treated <SiO_2> increased linearly from 1.5 to 4.2% with an increase in the treatment temperature. Whereas, <SiF_4> -formation became remarkable at temperatures higher than 600゜C. The surface OH groups completely disappeared and Si-F bond appeared after the <CCl_3F> -treatment at 500゜C. The Cl component was not found for all the flon-treated sample.The adsorptive activities of <SiO_2> for water and hexane decreased with the <CCl_3F> -treatment, suggesting that the <SiO_2> surface became more hydro- and lipo-phobic with the treatment.The <CF_4> -plasma treatment was more effective for the more intensive fluorination of <SiO_2> surface. Thus, an atomic ratio of the treated <SiO_2> attained about 0.75 after the <CF_4> (0.5 Torr)-plasma treatment for 10 min.

为了获得有关制备氟化陶瓷的一些信息，<sio_2>在高温下（1000-1500 c）在封闭循环系统中用气态氯氟甲烷或<cf_4>在450-550 c处用气态氯氟甲烷或<cf_4>处理。此外，将<cf_4> - 铂治疗应用于相同的<sio_2>样品以执行密集的表面氟化。550゜C时的处理显示氟化活性的顺序如下，<ccl_3f>（4.2）>（4.2）> <ccl_2f_2>（2.5）>（2.5）>（2.5）>（2.5）>（2.5）> <cclf_3>（0.3> 0.3> 0.3）（0.3）（0.3）> <cff_4> 0（0）。（在这里，括号中的数字指定了处理过的<sio_2>样品表面层中的F含量（％）。）<ccl_3f>处理的<sio_2>的表面层中的F含量从1.5％线性地增加到4.2％，并增加了处理温度。而<sif_4> - 在高于600°C的温度下变得异常显着。表面OH组完全消失，Si -F键在500°C处进行<ccl_3f>处理后出现。对于所有经过FLON处理的样品，找不到Cl成分。<sio_2>的水和己烷的吸附活性随<ccl_3f>处理而降低，表明<sio_2>表面变得更加脑力和脂肪症。这是在<cf_4>（0.5 torr） - 血压处理10分钟后达到约0.75的处理<sio_2>的原子比。