Fluorination of Ceramic Fiber with Chlorotrifluoromethane, especially <CCl_3F>

用三氟氯甲烷特别是<CCl_3F>氟化陶瓷纤维

• 批准号: 60550562
• 负责人: OKAZAKI Susumu
• 金额: $ 1.22万
• 依托单位: Ibaraki University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1985
• 资助国家: 日本
• 起止时间: 1985 至 1986
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-60550562/
• 关键词: Ceramics; Silica; Fluorination; Plasma; Hydrophobic; Lipophobic; 表面改質

In order to obtain some information regarding the preparation of fluorinated ceramics, <SiO_2> powder calcinated at high temperatures(1000-1500゜C) was treated with gaseous chlorofluoromethanes or <CF_4> at 450-550゜C in a closed circulation system. In addition, <CF_4> -plasma treatment was applied to the same <SiO_2> sample to perform an intensive surface fluorination.The treatments at 550゜C showed the order of the fluorination activity as following, <CCl_3F> (4.2) > <CCl_2F_2> (2.5) > <CClF_3> (0.3) > <CF_4> (0). (Here, the numbers in parentheses designate F content(%) in the surface layer of the treated <SiO_2> sample.) The F content in the surface layer of the <CCl_3F> -treated <SiO_2> increased linearly from 1.5 to 4.2% with an increase in the treatment temperature. Whereas, <SiF_4> -formation became remarkable at temperatures higher than 600゜C. The surface OH groups completely disappeared and Si-F bond appeared after the <CCl_3F> -treatment at 500゜C. The Cl component was not found for all the flon-treated sample.The adsorptive activities of <SiO_2> for water and hexane decreased with the <CCl_3F> -treatment, suggesting that the <SiO_2> surface became more hydro- and lipo-phobic with the treatment.The <CF_4> -plasma treatment was more effective for the more intensive fluorination of <SiO_2> surface. Thus, an atomic ratio of the treated <SiO_2> attained about 0.75 after the <CF_4> (0.5 Torr)-plasma treatment for 10 min.

为了获得有关氟化陶瓷制备的一些信息，在密闭循环系统中用气态氯氟甲烷或<CF_4>在高温(1000-1500℃)下煅烧的<SiO_2>粉末在450-550℃下进行处理。此外，对同一<SiO_2>样品进行<CF_4>-等离子体处理，以进行强表面氟化。 550゜C显示氟化活性的顺序如下：<CCl_3F>(4.2)><CCl_2F_2>(2.5)><CClF_3>(0.3)><CF_4>(0)(这里，括号内的数字表示F。处理过的<SiO_2>样品表层中的F含量(%)。) 处理后的样品表层中的F含量<CCl_3F>处理后的<SiO_2>随着处理温度的升高从1.5%线性增加到4.2%，但<SiF_4>的形成在温度高于600゜C时变得明显，表面OH基团完全消失并且Si-F。在500゜C下<CCl_3F>处理后出现键，所有经氟里昂处理的样品均未发现Cl成分。吸附性。 <SiO_2>对水和己烷的活性随着<CCl_3F>处理而降低，这表明<SiO_2>表面随着处理变得更加疏水和疏油。<CF_4>-等离子体处理对于更多的情况更有效。 <SiO_2>表面的强烈氟化因此，在<CF_4>之后处理的<SiO_2>的原子比达到约0.75(0.5)。 Torr)-等离子体处理10分钟。

项目成果

Susumu OKAZAKI: Centenary of The Discovery of Fluorine,International Synposium.Abstract 【I_3】. 88 (1986)

Susumu OKAZAKI：氟发现一百周年，国际研讨会。摘要[I_3]（1986）。

Susumu OKAZAKI: "Surface Treatment of <SiO_2> with Various Chlorofluoromethanes and <CF_4> " Centenary of The Discovery of Fluorine, International synposium(Paris), Abstract <I_3> . 88 (1986)

Susumu OKAZAKI：“用各种氯氟甲烷和<CF_4>对<SiO_2>进行表面处理”，氟发现百年纪念，国际研讨会（巴黎），摘要<I_3>。

Susumu OKAZAKI: Bulletin of Chemical Soceity of Japan.

Susumu OKAZAKI：日本化学会通报。

Susumu OKAZAKI: "Vapor Phase Fluorination of <SiO_2> Surface with Chlorofluoromethanes and <CF_4> " Bulletin of Chemical Society of Japan.

Susumu OKAZAKI：“用氯氟甲烷和<CF_4>对<SiO_2>表面进行气相氟化”日本化学会会刊。