Functional extension and upgrade of a reactive ion etching tool

反应离子刻蚀工具的功能扩展和升级

• 批准号: 495043546
• 金额: --
• 依托单位: Georg-August-Universität Göttingen
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2021
• 资助国家: 德国
• 起止时间: 2020-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/495043546?language=en
• 关键词: Functional; extension; upgrade; reactive; ion

With the requested funding, the Reactive Ion Etching System in the cleanroom of the Faculty of Physics will be upgraded with the option of inductively coupled plasma excitation. The inductively coupled plasma technology allows an independent adjustment of the ion and the plasma density. In this way, the etching process can be controlled very precisely, which is indispensable for many current research projects. One of the projects that the upgrade is critical for is the investigation of van-der-Waals heterostructures. For example, it will allow to fabricate samples that allow to investigate the fragile fractional quantum Hall effect in bilayer graphene. Additionally, experiments are planned to investigate the electronic structure of 2D materials with twisted layers. One goal is to gain a better understanding of the superconducting state which has been observed in twisted graphene double layers. In order to reveal the intrinsic properties of such van der-Waals heterostructures, any interaction with the substrate must be prevented. This can be achieved by encapsulating the functional layers in insulating boron nitride. For this process, the inductively coupled plasma mode with a precise control of the etching rate is absolutely essential. Moreover, the inductively coupled plasma mode also allows nanostructure etching with high aspect ratio, high shape fidelity and low edge roughness which is critical for the field of X-ray optics for coherent X-ray imaging in order to investigate the structure of biological systems on multiple scales. At this point, the applied for plasma technology is crucial for the further development of diffractive optics and for the realization of nanostructured X-ray anodes, which can generate a nano-focus at low power. Ultimately, the group plans to demonstrate the new concept "X-ray Optics on a Chip", which is intended to realize novel pump-probe, interferometric, tomographic and X-ray quantum optical experiments. A further use case for the upgraded plasma tool is the investigation ultrafast phenomena in solids and nanostructures where it will be allow the development and application of suitable spectroscopy, microscopy and diffraction techniques. For this purpose, extremely compact electron optics are required. It is planned to fabricate next-generation electron optics using lithographic processes in combination with deep reactive ion etching in the applied for etching mode.

借助要求的资金，将升级物理学院清洁室中的反应性离子蚀刻系统，并可以选择诱导的等离子体激发。电感耦合等离子体技术允许对离子和血浆密度进行独立调整。这样，可以非常精确地控制蚀刻过程，这对于许多当前的研究项目来说是必不可少的。升级至关重要的项目之一是调查Van-Waals异质结构。例如，它将允许制造样品，以研究双层石墨烯中脆弱的分数量子霍尔效应。此外，计划进行实验，以研究具有扭曲层的2D材料的电子结构。一个目标是更好地了解在扭曲的石墨烯双层中观察到的超导状态。为了揭示此类Van der-Waals异质结构的内在特性，必须防止与基板的任何相互作用。这可以通过将功能层封装在绝缘硝酸硼中来实现。在此过程中，具有精确控制蚀刻速率的电感耦合等离子体模式绝对是必不可少的。此外，电感耦合等离子体模式还允许纳米结构以高纵横比，高形状保真度和低边缘粗糙度蚀刻，这对于相干X射线成像的X射线光学领域至关重要，以研究生物系统在生物系统上的结构多个量表。在这一点上，对等离子体技术的应用对于进一步开发衍射光学和实现纳米结构的X射线阳极至关重要，纳米结构X射线阳极可以以低功率生成纳米焦点。最终，该小组计划演示新的概念“芯片上的X射线光学”，该概念旨在实现新颖的泵探针，干涉测量，层析成像和X射线量子光学实验。升级的等离子体工具的另一个用例是研究固体和纳米结构中的超快现象，在该现象将允许开发和应用合适的光谱，显微镜和衍射技术。为此，需要非常紧凑的电子光学器件。计划使用光刻工艺与深层反应离子蚀刻相结合制造下一代电子光学元件。