Fabrication of magnetic metal-organic nano granular films using metal-organic co-electrodeposition method

金属有机共电沉积法制备磁性金属有机纳米颗粒薄膜

• 批准号: 16560283
• 负责人: FUJITA Naoyuki
• 金额: $ 2.37万
• 依托单位: Nara National Collage of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2004
• 资助国家: 日本
• 起止时间: 2004 至 2005
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-16560283/
• 关键词: metal-organic co-electrodeposition; granular film; magnetic properties

Metal-organic granular films were synthesized by a newly developed electrochemical method called the "metal-organic co-electrodeposition method". i.e.the simultaneous deposition of magnetic metal and organic film. Organic film was deposited The deposition situation of the organic film from a commercial electrodeposition coating solution was monitored by the electrochemical quartz crystal microbalance (EQCM) method. It was clear that the organic deposition were affected of the pH value near the substrate.To obtain metal-organic composite, electrodeposition bath was developed. The solution containing water-soluble resin and CoSO_4 were used. Electrodeposition was conducted potentiostatically using a potentiostat on the ITO substrate without stirring. Metal-organic composite films were fabricated. These films showed ferromagnetic property and high elector resistance.On the other hand, Electrodeposited Co-Pt films with L1_0 structure had a high coercivity value of 880 kA/m after a post-annealing at 973 K.

金属有机颗粒状膜是通过一种新开发的电化学方法合成的，称为“金属有机共同沉积法”。即磁性金属和有机膜的同时沉积。通过电化石英晶体微平衡（EQCM）方法监测有机膜从商业电沉积涂层溶液中沉积有机膜的沉积状况。显然，有机沉积影响了底物附近的pH值。为了获得金属有机复合材料，开发了电沉积浴。使用了含有水溶性树脂和COSO_4的溶液。使用iTO底物上的电位静态静态静脉曲张对电位进行电位，而无需搅拌。制造金属有机复合膜。这些薄膜显示出铁磁特性和高选民的抵抗力。另一方面，具有L1_0结构的电沉积的共同PT膜在973 K处通行后的高压率为880 ka/m。

项目成果

Fabrication of Metal-oxide Nano Composite Films from aqueous Solution by Metal-Oxide Co-electrodeposition

金属-氧化物共电沉积水溶液制备金属-氧化物纳米复合薄膜

• 发表时间: 2006
• 期刊: Journal of magnetism and magnetic materials 300・1
• 作者: N.Fujita;M.Izaki;M.Inoue
• 通讯作者: M.Inoue

電析法を用い作製した高保磁力Co-Pt薄膜

电沉积法制备高矫顽力Co-Pt薄膜

• 发表时间: 2004
• 期刊: 電気学会論文誌A(基礎・材料・共通部門誌) 124-A
• 作者: 中野正基;藤田直幸;高瀬正志;福永博俊
• 通讯作者: 福永博俊

Electrodeposited Co-Pt Thin films with High Coercivity

高矫顽力电沉积 Co-Pt 薄膜

• 发表时间: 2004
• 期刊: IEEJ Transactions on Fundamentals and Materials 124-10
• 作者: M.Nakano;N.Fujita;M.Takase;H.Fukunaga
• 通讯作者: H.Fukunaga

次世代めっき技術

下一代电镀技术

• 发表时间: 2004
• 作者: 中野正基;藤田直幸;高瀬正志;福永博俊;電気鍍金研究会(藤田直幸)
• 通讯作者: 電気鍍金研究会(藤田直幸)

電析法を用いた作製した高保磁力Co-Pt薄膜

电沉积法制备高矫顽力Co-Pt薄膜

• 发表时间: 2004
• 期刊: 電気学会論文誌A(基礎・材料・共通部門誌) 124-A
• 作者: 中野正基;藤田直幸;高瀬正志;福永博俊
• 通讯作者: 福永博俊