Study on the three-dimensional structures in silica glass induced by micro- and nano-scale irradiation effects using focused ion beam

聚焦离子束微纳尺度辐照效应诱导石英玻璃三维结构研究

• 批准号: 15510112
• 负责人: NISHIKAWA Hiroyuki
• 金额: $ 1.92万
• 依托单位: Shibaura Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2003
• 资助国家: 日本
• 起止时间: 2003 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-15510112/
• 关键词: Silica glass; microbeam; photoluminescence; Raman scattering; atomic force microscope; refractive index change; optical elements; 集束イオン線; マイクロ; ナノ; 屈折率変化; 形状変化; 誘起構造; 光学素子

We studied three dimensional structures in silica glass induced by micro- and nano-scale irradiation effects by means of ion microbeam irradiation. Spatial distribution of irradiation effects by ion microbeam on silica glass was investigated by micro-PL/Raman spectroscopy and atomic force microscopy(AFM). High-purity silica glass was irradiated by 1.7-MeV H^+, 15-MeV O^<4+>, or 18-MeV Si^<5+> up to fluences of 1.0×10^<17> ions/cm^2 using microbeam lines at the facility of TIARA(JAERI Takasaki, Japan). The irradiation effects include defect formation, structural changes, and compaction, whose spatial distribution can be mapped out by micro-Raman/PL and AFM. We observed the formation of small ring structures associated with densification and dangling bond defects along with the tracks of ions in silica glass. Surface deformation observed by AFM suggests the internal densification of silica glass by 0.4 %. The H^+ microbeam irradiation shows radiation effects up to depth of 30 μm in the form of refractive index change. On the other hand, the heavy ion irradiations such as O^<4+> and Si^<5+> induce radiation effects limited to the depth of less than 10 μm from the surface with relatively homogeneous distribution. Evaluation of the refractive index change using a microscopic two-beam interferometer shows the change as high as 6×10^<-3> for H^+ microbeam irradiation to the fluence of 1×10^<17> ions/cm^2. We also discuss technological implications of these results on the applications of microbeam irradiation effects to the fabrication of optical elements.

我们通过离子微束辐照研究了微米和纳米尺度辐照效应引起的石英玻璃的三维结构，通过微PL/拉曼光谱和原子力显微镜研究了离子微束辐照效应在石英玻璃上的空间分布。 AFM）。高纯石英玻璃经 1.7-MeV H^+、15-MeV 辐照。 O^<4+>，或18-MeV Si^<5+>，使用TIARA（JAERI Takasaki，日本）设施的微束线，能量密度高达1.0×10^<17>离子/cm^2。影响包括缺陷形成、结构变化和压实，其空间分布可以通过显微拉曼/PL和AFM观察到与致密化相关的小环结构的形成。 AFM 观察到的悬键缺陷以及离子轨迹表明二氧化硅玻璃的内部致密化了 0.4%。H^+ 微束照射以折射形式显示了高达 30 μm 深度的辐射效应。另一方面，诸如O ^ 4+ 和Si ^ 5+ 之类的重离子辐照引起的辐射效应仅限于小于0.5的深度。使用显微双光束干涉仪对距表面10μm处的折射率变化进行评估，结果表明，H^+微束照射至1×10注量时，折射率变化高达6×10^<-3>。 ^<17> ions/cm^2。我们还讨论了这些结果对微束辐照效应在光学元件制造中的应用的技术影响。

项目成果

M.Hattori, Y.Ohki, M.Eujimaki, T.Souno, H.Nishikawa, E.Watanabe, M.Oikawa, T.Kamiya, K.Arakawa: "Characterization of refractive index changes of silica glass induced by ion microbeam"Nuclear Instruments and Methods in Physics Research. B 210. 272-276 (200

M.Hattori、Y.Ohki、M.Eujimaki、T.Souno、H.Nishikawa、E.Watanabe、M.Oikawa、T.Kamiya、K.Arakawa：“离子微束引起的石英玻璃折射率变化的表征”

Proton Microbeam Irradiation Effects on Silica Glass

质子微束辐照对石英玻璃的影响

• 发表时间: 2004
• 期刊: Proceedings of the 1st International Workshop on Proton Beam Writing
• 作者: H.Nishikawa;K.Fukagawa;T.Yanagi;Y.Ohki;E.Watanabe;M.Oikawa;T.Kamiya;K.Arakawa
• 通讯作者: K.Arakawa

シリカガラスへのイオンマイクロビーム照射効果と光学素子作製

离子微束辐照对石英玻璃及光学元件制造的影响

• 发表时间: 2004
• 期刊: 第35回電気電子絶縁材料システムシンポジウム、I-6、2004年11月
• 作者: 深川一成;西川宏之;中村知晴;大木義路;及川将一;佐藤隆博;荒川和夫
• 通讯作者: 荒川和夫

Fabrication and Evaluation of Micrometer-scale Optical Elements using Three-dimensional Irradiation Effects Localized in Micro and Nano-scale Regions

利用微米级和纳米级区域的三维辐照效应制造和评估微米级光学元件

• 发表时间: 2004
• 期刊: TIARA Annual Report 2003 JAERI-Review 2004-025
• 作者: H.Nishikawa;K.Fukagawa;T.Yanagi;T.Nakamura;Y.Ohki;E.Watanabe;M.Oikawa;K.Arakawa;T.Kamiya
• 通讯作者: T.Kamiya

Characterization of refractive index changes of silica glass induced by ion microbeam

离子微束诱导石英玻璃折射率变化的表征

• 发表时间: 2003
• 期刊: Nuclear Instruments and Methods in Physics Research B210
• 作者: M.Hattori;Y.Ohki;M.Fujimaki;T.Souno;H.Nishikawa;E.Watanahe;M.Oikawa;T.Kamiya;K.Arakawa
• 通讯作者: K.Arakawa