Analysis of Two Dimensional Velocity Space Structure of Ions in Simulated Divertor Plasma With High Angular
高角模拟偏滤器等离子体中离子二维速度空间结构分析
基本信息
- 批准号:14580520
- 负责人:
- 金额:$ 1.79万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2002
- 资助国家:日本
- 起止时间:2002 至 2003
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
One of important problems in divertor plasma is to reduce the heating load from internal plasma to divertor plate where the sputtering of the plate is frequently, occurred in nuclear fusion reactor. When the sputtering of the plate is discussed, it is important to clarify two dimensional behavior of energy and temperature of ions incident to the plate. In this work, measurement of two dimensional velocity distributions of ions has been performed in DC discharge plasma. Ion temperature measurement has been done in simulated divertor plasma using inductively coupled plasma. Energy distribution functions of ions incident to substrate biased negatively has also measured in electron cyclotron resonance microwave plasma. In these measurements, grid and directional analyzers were used. The interesting results on ion behaviors were obtained as follows.1.Measurement of ion two-dimensional velocity space structure by means of directional analyzerFor fundamental experiment on ion velocity distrib … More ution, two dimensional velocity distribution functions were measured in do discharge double plasma using directional analyzer which was consisted from capillary plate, retarding grid and ion collector. The analyzer has a high angular resolution of 1.4 degree. The two dimensional ion velocity space maps were estimated from velocity distribution functions obtained at all directions. It was confirmed that the directional analyzer could evaluate the spread on two dimensional ion velocity spaces.2.Development of stimulated divertor plasmaInductively coupled plasma (ICP) source where 3 turns helical antenna was wounded around glass tube with 3 cm, is used as one of the stimulated divertor plasma. ICP with electron 'density of 10^<12> cm^<-3> was obtained for optimum stimulated divertor plasma.3.Ion measurement in ICPIon measurement Ti was done comparing with electron temperature Fe in ICP under a divergent magnetic configuration. The dependency of the magnetic field and gas pressure on both of T_e and T_i was also studied. In the former case, T_i was found to decrease for ion hole-parameter hi【greater than or equal】3, while Te decreased drastically for electron hole-parameter h_e【greater than or equal】200 and saturated for h_e【greater than or equal】10^3. In the latter case, T_e in, a non-magnetized plasma (B=0) provides the same gas pressure tendency as the T_i at magnetic flux density B=575G, while Te at B=575 G decreased, gradually with the pressure.4.Measurement of energy distribution of ions incident to RF biased substrateTime averaged energy distribution functions of ions impacted in the rf-biased substrate have been investigated in ECR microwave plasma from the viewpoint of the ion plasma frequency. It was observed that TIIEDF has a bimodal profile for a wide range of f_<pi>/f_<b-> Here fpi and fb are ion plasma frequency and RF biased frequency, respectively. It was found that even for f_<pi>/f_b<<1, the bimodal profile was observed at high rf-biased voltages. It was revealed that the energy difference in TIIEDFs increased with increasing the rf-biased voltage for f_<pi>/f_b<1, while for f_<pi>/f_b>1, the energy difference decreased with increasing f f_<pi>/f_<b->. Less
重要的等离子体之一是在讨论板的溅射时,将to to to to to to to to to to tly板的转移板,在核融合反应器中发生。在这项工作中,使用偶联等离子体的血浆进行了二维的测量。使用了截肢分析仪,以下是关于离子行为的有趣结果。1。通过方向分析仪对离子速度分析的二维速度空间的测量分析。从各个方向上获得的速度分布函数估算了1.4个Dimesional离子速度空间图。 .2.2.2.2.2。 3>用于刺激的刺激的移动等离子体。3。ICPION测量中的ION测量值在磁场的电子温度终端,并且在前一种情况下也研究了T_I的气压。参数hi Qual] 200,饱和H_E [大于或相等] 10^3。 = 575g t b = 575 g逐渐变下,逐渐使用。4。在此f_ <b->的范围内,FPI和Fb是离子等离子体,并且在RF偏置频率上观察到双峰曲线。对于F_ <pi>/f_b> 1,能量差会随着f_ <pi>/f_ <b->的增加而减小
项目成果
期刊论文数量(34)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
H.Fujita: "Annular Profile of Dust Density near RF-Powered Electrode in a Capacitively Coupled Plasma"Japanese Journal Applied Physics. 41・4. 2195-2198 (2002)
H.Fujita:“电容耦合等离子体中射频供电电极附近的灰尘密度的环形分布”日本应用物理学杂志 41・4(2002 年)。
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H.Fujita: "Observation of an Inductively Coupled RF Discharge with One-Turn Internal Antenna"Japanese Journal Applied Physics. 41・5. 3114-3119 (2002)
H.Fujita:“用一圈内部天线进行感应耦合射频放电的观察”日本应用物理学杂志 41・5 3114-3119(2002 年)。
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藤田寛治(分担): "マイクロ波プラズマの技術(プラズマ調査専門委員会編)"オーム社. 257 (2003)
Hiroharu Fujita(撰稿人):“微波等离子体技术(等离子体研究专家委员会编辑)”Ohmsha 257(2003)。
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Y.Ohtsu, K.Yoshinaga, H.Fujita: "Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasm"Japanese Journal Applied Physics. Vol.42. 7552-7556 (2004)
Y.Ohtsu、K.Yoshinaga、H.Fujita:“电子回旋共振微波等离子体中撞击 RF 偏置基底的离子的时间平均能量分布函数”日本应用物理学杂志。
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Y.Ohtsu: "Time-averaged energy distribution function of ions impacted on an rf biased substrate in ECR microwave plasma by means of a conventional energy analyzer"Japanese Journal Applied Physics. 43・1. 328-331 (2004)
Y.Ohtsu:“通过传统能量分析仪在 ECR 微波等离子体中撞击射频偏压基底的离子的时间平均能量分布函数”,日本应用物理学杂志 43・1(2004 年)。
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FUJITA Hiroharu其他文献
FUJITA Hiroharu的其他文献
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{{ truncateString('FUJITA Hiroharu', 18)}}的其他基金
Development of generation method of microwave plasmas with an annular slot antenna for large diameter wafer etching
大直径晶圆刻蚀用环形缝隙天线微波等离子体产生方法的研制
- 批准号:
06558065 - 财政年份:1994
- 资助金额:
$ 1.79万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B)