Development of coherent VUV Light Source for F_2 Laser Lithography

F_2激光光刻相干VUV光源的研制

• 批准号: 13555010
• 负责人: WATANABE Shuntaro
• 金额: $ 8.64万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13555010/
• 关键词: Coherent light source; Narrow bandwidth; VUV; 2 photon resonant 4 wave; Nonlinear crystal; KBBF; F_2 laser; Lithography; チタンサファイアレーザー; 157nm光源

This project aims at the development of an inspection tool for F_2 laser lithography. For this purpose, the narrow bandwidth (<0.01pm), single mode, coherent light source was developed at the F_2 laser wavelength (157.6nm) by two methods, (1) 2-photon resonant, 4-wave mixing in gaseous Xe, (2) Second harmonic generation and sum frequency mixing in a nonlinear crystal KBBF.In the method (1), we developed single mode, Ti : sapphire lasers with the wavelengths of 768 and 681nm respectively.The 157.6-nm light was achieved by the mixing of 681 nm with the third harmonic of the 768-nm light which is in resonance to Xe6p[5/2, 2]. The obtained output power and spectral width were 0.6mW and 0.008pm, cleaning the target of this project. This light source was used to determine the instrumental function of the spectrometer for the characterization of F_2 laser in Gigaphoton inc.In the method (2) the optically contacted, prism-couple device was developed by a KBBF crystal supplied from Prof. Chen in Chinese Academy of Science.The 170-nm light was generated by the 4th harmonic of the above-mentioned Ti : sapphire laser (680nm). This wavelength is the shortest ever obtained by second harmonic generation (SHG). The quasi CW 177-nm light was achieved by SHG of a commercial 355-nm laser and is now being used for ultra high-resolution photoelectron spectroscopy.The 156-nm radiation was generated by the 5th harmonic of the Ti : sapphire laser tuned to 780nm. This wavelength is the shortest ever obtained by nonlinear crystals.The output power at 157.6nm was at a level of μ W.

该项目旨在开发检查工具f_2 lither岩性。 -photon共振，气体XE中的4波混合，（2）第二次和声产生和自由质量混合在Anlinear Crystal速率单模式中，TI：蓝宝石激光器，波长分别为768和681nm。 768 nm光的第三个谐波的NM与XE6P共鸣[5/2，2]。在方法（2）中，F_2激光在方法（2）中，Prism-COUPELE设备是由从上述Ti：Sapphire Laser（680nm）提供的KBBF晶体开发的。通过第二次谐波生成（SHG）获得了177-nm的光，是通过商业离子光电光谱的SHG获得的。156-NM辐射是由Ti：Sapphire激光器的第5个谐波生成的非线性晶体获得的最短事件。157.6nm的输出功率为AT。

项目成果

T.Sekikawa, T.Shimizu, S.Watanabe: "コヒーレント極限紫外光の物性研究への応用"光学. 32・3(掲載予定). (2003)

T.Sekikawa、T.Shimizu、S.Watanabe：“相干极紫外光在物理性质研究中的应用”光学32・3（待出版）。

T.Sekikawa, T.Katsura, S.Watanabe: "Measurement of High Harmonic Pulses"レーザー研究. 30・9. 503-507 (2002)

T.Sekikawa、T.Katsura、S.Watanabe：“高次谐波脉冲的测量”激光研究 30・9 (2002)。

T.Togashi, T.Kanai, T.Sekikawa, S.Watanabe, C.Chen, C.Zhang, Z.XU, J.Wang: "Generation of Vacuum-ultraviolet light by an optically contacted, prism-coupled KBe_2BO_3F_2 crystal"Optics Letters. 28・4. 254-256 (2003)

T.Togashi、T.Kanai、T.Sekikawa、S.Watanabe、C.Chen、C.Zhang、Z.XU、J.Wang：“通过光学接触、棱镜耦合的 KBe_2BO_3F_2 晶体产生真空紫外光”光学快报28・4。

T.Suganuma, H.Kubo, O.Wakabayashi, H.Mizoguchi, K.Nakao, Y.Nabekawa, T.Togashi, S.Watanabe: "157-nm coherent light source as an inspection tool for F_2 laser lithography"Optics Letters. 27・1. 46-48 (2002)

T.Suganuma、H.Kubo、O.Wakabayashi、H.Mizoguchi、K.Nakao、Y.Nabekawa、T.Togashi、S.Watanabe：“157 nm 相干光源作为 F_2 激光光刻的检查工具”Optics Letters .27・1.46-48 (2002)

T.Suganuma, et al.: "157-nm coherent light source as an inspection tool for F_2 laser lithography"Optics Letters. 27・1. 46-48 (2002)

T.Suganuma 等人：“157 nm 相干光源作为 F_2 激光光刻的检查工具”Optics Letters 27・1 (2002)。