Formation of Ceramic-Coated Materials by RF Sputtering Method and the Materials Evaluation using Molecule dynamics

射频溅射法陶瓷涂层材料的形成及分子动力学材料评价

• 批准号: 06650107
• 负责人: HOSHIDE Toshihiko
• 金额: $ 1.54万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06650107/
• 关键词: Ceramic thin film; Coated materials; Molecular dynamics; RF sputtering; Ultra-micro-hardness; Bending strength; Surface roughness; Coating condition

Sputtering process of ceramics on glass substrate and its evaluation based on molecule dynamics were investigated in this project.Thin films of alumina and silicon carbide were deposited on the substrate of borosilicate in an RF magnetron spattering apparatus. The hardness of the spattered films, as a tribological property, was evaluated by using an ultra-microscopic hardness testing machine. It was found that the hardness decreased with increasing RF output power in both ceramic films. Bending tests of coated materials, as a bulk strength property, was also carried out under 3-point bending. Some coated materials, especially under lower RF output power, showed lower strength than the glass substrate. In this situation, flaws which caused final fracture, were observed around the interface between coating film and substrate.A molecular dynamics approach was tried to estimate the internal stress field in sputtered film. A hard-sphere 3D model was adopted in the molecular dynamics of sputtered particles. Based on empirical information, cluster of sputtered particles was assumed to be larger with increasing RF output power. The experimental result was explained qualitatively by using the proposed analytical method.

在该项目中研究了陶瓷在玻璃基材上的溅射过程及其基于分子动力学的评估。氧化铝和碳化硅的细膜沉积在硼硅酸盐的底物上，在RF Magnetron Spatersing设备中。通过使用超微观硬度测试机评估了飞溅膜的硬度，作为摩擦学特性。发现两种陶瓷膜中的RF输出功率的增加，硬度降低。在3分弯曲下，涂层材料的弯曲测试也作为庞大的强度特性进行。一些涂层的材料，尤其是在较低的RF输出功率下显示的强度低于玻璃基板。在这种情况下，在涂料膜和底物之间的界面周围观察到了导致最终断裂的缺陷。试图估计溅射膜中的内部应力场的分子动力学方法。在溅射颗粒的分子动力学中采用了硬球3D模型。基于经验信息，随着RF输出功率的增加，假定溅射颗粒的簇变大。实验结果是通过使用拟议的分析方法定性解释的。

项目成果

Toshihiko HOSHIDE,Kenji, HAYASHI,Takahiro SAITO,Kazumitsu KATSUKI and Tatsuo INOUE: "Mechanical Properties of Borosilicate Glass Coated with Alumina by Sputtering Process" Materials Science Research International. Vol.2, No.1. 33-38 (1996)

Toshihiko HOSHIDE、Kenji、HAYASHI、Takahiro SAITO、Kazumitsu KATSUKI 和 Tatsuo INOUE：“溅射工艺涂覆氧化铝的硼硅酸盐玻璃的机械性能”材料科学研究国际。

Toshihiko HOSHIDE: "Mechanical Properties of Borosilicate Glass Coated with Alumina by Sputtering Process" Materials Science Research International. 2. 33-38 (1996)

Toshihiko HOSHIDE：“通过溅射工艺涂覆氧化铝的硼硅酸盐玻璃的机械性能”材料科学研究国际。