I-Corps: High-Throughout Manufacturing of Three-Dimensional Nanostructured Materials
I-Corps:三维纳米结构材料的高通量制造
基本信息
- 批准号:2223908
- 负责人:
- 金额:$ 5万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2022
- 资助国家:美国
- 起止时间:2022-07-01 至 2024-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The broader impact/commercial potential of this I-Corps project is the development of a scalable process to manufacture three-dimensional nanostructures with high resolution and throughput. The proposed technology may create nanostructures that have mechanical, optical, and thermal properties that are superior to traditional bulk materials. Three-dimensional nanostructured materials and nanolattices have many applications in industries such as electronics, photonics, and solar energy due to physical properties not observed in traditional macroscale materials. Nanostructured materials can have ultralow density and simultaneously have high stiffness and strength. The high porosity structures also can have air-like properties, such as low refractive index and dielectric constant, which can be used for light trapping and enhance the performance of waveguide and integrated photonics. Nanolattice structures are expected to have extremely low thermal conductivity and can be used as a lightweight thermal insulator for aerospace applications. The combination of mechanical, optical, and thermal properties allows the nanostructured materials to be used as an insulating layer in integrated circuits, multilayer photonic devices, and as thin-film coating on arbitrary surfaces. The material also may be used in multilayer coating as a high efficiency dielectric reflector that has low thermal conductivity, which may be used as a radiation shield or in cooling devices.This I-Corps project is based on the development of a lithographic nanomanufacturing process of ultraporous nanolattice materials. The proposed technology uses colloidal particles that may be harnessed to create volumetric intensity for three-dimensional (3D) patterning. Using both “top-down” lithographic and “bottom-up” self-assembly approaches, the proposed method is enabled using light scattering from self-assembled nanoparticles for volumetric exposure of a photosensitive polymer. This results in a process that is highly versatile and solely based on particle-light interactions that may be designed by controlling the light and particle parameters. In addition, in contrast to traditional techniques, the proposed technology may be low-cost and does not require extensive optical, electrical, or mechanical hardware. The proposed process also is highly scalable, and a roll-to-roll prototype system based on this technology has demonstrated continuous printing of 3D nanostructures on flexible substrate with 180 mm/min throughput. Manufacturing of nanostructures and nanodevices generally is limited by a tradeoff between pattern resolution and throughput. The proposed technology overcomes this challenge by using massively parallel colloidal elements for volumetric patterning.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
该I-Corps项目的更广泛的影响/商业潜力是开发具有高分辨率和吞吐量的三维纳米结构的可扩展过程。所提出的技术可能会创建具有机械,光学和热性能的纳米结构,这些特性优于传统散装材料。三维纳米结构材料和纳米质体在电子,光子学和太阳能等行业中具有许多应用,这是由于在传统宏观材料中未观察到的物理特性。纳米结构的材料可以具有超高密度,并且具有高刚度和强度。高孔隙率结构还可以具有类似空气的特性,例如低折射率和饮食常数,可用于光捕获并增强波导和集成光子学的性能。预计纳米质结构将具有极低的导热率,可用作航空航天应用的轻质热绝缘子。机械,光学和热性能的组合使纳米结构材料可以用作集成电路,多层光子设备以及在任意表面上的薄膜涂层中的绝缘层。该材料还可以用作高效的饮食反射器,该材料可用于较低的热导率,该反射剂可以用作辐射屏蔽或冷却设备。该I-Corps项目基于开发超强纳米质材料的光刻纳米制造过程。所提出的技术使用可能利用的胶体颗粒来产生三维(3D)图案的体积强度。使用“自上而下”的光刻和“自下而上”的自组装方法,使用自组装的纳米颗粒的光散射来实现所提出的方法,以对光敏聚合物进行体积暴露。这导致了一个高度用途的过程,仅基于可以通过控制光和粒子参数设计的粒子相互作用。此外,与传统技术相比,所提出的技术可能是低成本的,并且不需要大量的光学,电气或机械硬件。所提出的过程也是高度可扩展的,基于该技术的卷到滚动原型系统表明,在柔性基材上连续打印3D纳米结构,具有180 mm/min/min的吞吐量。通常,纳米结构和纳米版的制造通常受模式分辨率和吞吐量之间的权衡限制。拟议的技术通过使用大量平行的胶体元素进行体积图案来克服这一挑战。该奖项反映了NSF的法定任务,并被认为是值得通过基金会的知识分子优点和更广泛的影响评估标准通过评估来支持的。
项目成果
期刊论文数量(0)
专著数量(0)
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会议论文数量(0)
专利数量(0)
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Chih-Hao Chang其他文献
Inhalation injury caused by cornstarch dust explosion in intubated patients—A single center experience
- DOI:
10.1016/j.burns.2017.06.011 - 发表时间:
2018-02-01 - 期刊:
- 影响因子:
- 作者:
Han-Chung Hu;Chih-Hao Chang;Hsiang-Hao Hsu;Chia-Ming Chang;Chung-Chi Huang;Shiow-Shuh Chuang;Kuo-Chin Kao - 通讯作者:
Kuo-Chin Kao
Japanese student writers’ perspectives on anonymous peer review
日本学生作家对匿名同行评审的看法
- DOI:
10.1093/elt/ccy061 - 发表时间:
2019 - 期刊:
- 影响因子:2.5
- 作者:
Sugene Kim;Chih-Hao Chang;Sugene Kim;Sugene Kim - 通讯作者:
Sugene Kim
Japanese EFL student writers’ perspectives on anonymous peer review
日本英语学生作家对匿名同行评审的看法
- DOI:
- 发表时间:
2019 - 期刊:
- 影响因子:0
- 作者:
Sugene Kim;Chih-Hao Chang;Sugene Kim - 通讯作者:
Sugene Kim
Diffuser optimization for enhancing light extraction from light-emitting electrochemical cells
- DOI:
10.1016/j.orgel.2023.106957 - 发表时间:
2024-01-01 - 期刊:
- 影响因子:
- 作者:
Min-Chih Hou;Dian Luo;Yu-Ting Huang;Shun-Wei Liu;Chin-Wei Lu;Chih-Hao Chang;Hai-Ching Su - 通讯作者:
Hai-Ching Su
Japanese L2 learners’ translanguaging practice in written peer feedback
日本第二语言学习者在书面同伴反馈中的跨语言实践
- DOI:
10.1080/13670050.2020.1760201 - 发表时间:
2020 - 期刊:
- 影响因子:2.8
- 作者:
Sugene Kim;Chih-Hao Chang - 通讯作者:
Chih-Hao Chang
Chih-Hao Chang的其他文献
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{{ truncateString('Chih-Hao Chang', 18)}}的其他基金
PFI-TT: Advanced Materials for Augmented/Virtual Reality (AR/VR) Applications
PFI-TT:用于增强/虚拟现实 (AR/VR) 应用的先进材料
- 批准号:
2314268 - 财政年份:2023
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Student Travel to International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, 2023
学生前往参加 2023 年电子、离子和光子束技术与纳米制造国际会议
- 批准号:
2322911 - 财政年份:2023
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Support for Student Participation at 65th International Conference on Electron, Ion, and Photon Beam Technology & Nanofabrication; New Orleans, Louisiana; May 31 - June 3, 2022
支持学生参加第 65 届国际电子、离子和光子束技术会议
- 批准号:
2223124 - 财政年份:2022
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
CAREER: Three-Dimensional Nanolithography with Inexpensive Hardware
职业:使用廉价硬件的三维纳米光刻
- 批准号:
2022818 - 财政年份:2020
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Support for Student Participation in the 64th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication; New Orleans, Louisiana; May 26-29, 2020
支持学生参加第 64 届电子、离子和光子束技术与纳米加工国际会议;
- 批准号:
2023337 - 财政年份:2020
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
CAREER: Three-Dimensional Nanolithography with Inexpensive Hardware
职业:使用廉价硬件的三维纳米光刻
- 批准号:
1552424 - 财政年份:2016
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
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