LEAPS-MPS: Investigation of topological spin texture and magnetoelectric coupling in non-centrosymmetric orthorhombic oxides

LEAPS-MPS：非中心对称正交氧化物中拓扑自旋织构和磁电耦合的研究

• 批准号: 2213443
• 负责人: Chetan Dhital
• 金额: $ 22.37万
• 依托单位: Kennesaw State University Research and Service Foundation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2022
• 资助国家: 美国
• 起止时间: 2022-08-01 至 2025-07-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2213443&HistoricalAwards=false
• 关键词: LEAPS; MPS; Investigation; topological; spin

AbstractThis award is funded in whole or in part under the American Rescue Plan Act of 2021 (Public Law 117-2).Non-Technical Description:This project directly supports the development of materials that possess topological spin textures, and investigate their formation, control mechanisms and properties. Topological spin textures are nanosized magnets found in certain classes of materials and can be used to produce energy-efficient, fast-paced, and reliable information storage, and transfer devices. Furthermore, the works performed through this project train undergraduate students from a historically underserved community in material synthesis and characterization techniques to prepare the next generation of a scientifically skilled workforce. The undergraduate students will be trained in all aspects of material physics research from conceptualization to publication so that they can serve as role models in their community. This research also supports the development of educational materials with high school science teachers serving majority underrepresented communities in the diverse metro Atlanta area. This project contributes to increasing the enrollment and retention of students from historically underserved communities in STEM education.Technical Description:This LEAPS-MPS project focuses on understanding the role played by crystal symmetries and chemical constituents on the enhancement of the essential magnetic and spin-orbit interactions that lead to topological magnetism and the associated magnetoelectric behavior of non-centrosymmetric oxides. By taking the specific example of chiral MMoTeO6 (M=Mn, Co, Fe, Cu, Ni) and polar RTWO6 (R=Rare earth, T=Fe, Cr, V) oxides, this project investigates the following: (i) How do the topological character, size, and stability of spin textures vary with chemical compositions within the isostructural family of materials? (ii) Can ferroelectric polarization be associated with the spin textures and manipulated using an electric field? (iii) What are the quantitative and qualitative differences in the magnetoelectric behavior of polar and chiral materials? This work provides important insights into interactions responsible for the formation of novel topological spin textures and coupling of such spin structures to internal and external fields.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

摘要这一奖项是根据2021年《美国救援计划法》的全部或部分资助（公共法117-2）。非技术描述：该项目直接支持具有拓扑旋转质地的材料的开发，并研究了其形成，控制机制和财产。拓扑自旋纹理是在某些类别的材料中发现的纳米磁铁，可用于产生节能，快节奏且可靠的信息存储以及传输设备。此外，通过该项目训练来自历史悠久的社区的材料综合和表征技术的培训本科生进行的作品，以准备下一代科学熟练的劳动力。本科生将接受从概念化到出版物的物质研究的各个方面的培训，以便他们可以作为社区的榜样。这项研究还支持在多元化亚特兰大地区为多数人代表性不足的社区服务的高中科学教师开发教育材料。该项目有助于增加茎教育中历史不足社区的学生的入学和保留。技术描述：该飞跃MPS项目的重点是理解晶体对称性和化学成分在增强基本磁性和旋转轨道相互作用的增强，从而导致拓扑磁性和相关的磁性磁性牛群的非centoceosoxoxeox的作用。通过以手性mmoteo6（M = M = MN，CO，Fe，Cu，Ni）和Polar RTWO6（R =稀土，T = Fe，Cr，V）氧化物的特定例子，该项目研究了以下项目：（i）旋转特性，大小和稳定性与化学质地的拓扑特征，大小和稳定性在同类物质家族中与同在的化学材料中的化学作用相差吗？ （ii）铁电偏振能否与自旋纹理相关并使用电场进行操纵？ （iii）极性和手性材料的磁电行为的定量和质量差异是什么？这项工作为负责形成新型拓扑旋转纹理形成的相互作用以及将这种旋转结构与内部和外部领域的耦合的相互作用提供了重要的见解。该奖项反映了NSF的法定任务，并被认为是通过基金会的智力优点和更广泛的影响来通过评估来支持的。

项目成果

Multi- k magnetic structure and large anomalous Hall effect in candidate magnetic Weyl semimetal NdAlGe

• DOI: 10.1103/physrevb.107.224414
• 发表时间: 2023-02
• 期刊: Physical Review B
• 影响因子: 3.7
• 作者: C. Dhital;’† R.L.Dally2;R. Ruvalcaba;R. González-Hernández;J. Guerrero‐Sanchez;H. Cao;Q. Zhang;W. Tian;Y. Wu;M. Frontzek;S. Karna;A. Meads;B. Wilson;R. Chapai;D. Graf;J. Bacsa;R. Jin;J. Ditusa