MRI: Acquisition of a Large-Scale, High-Throughput, Electron Beam Lithography System for Multi-Scale Patterning

MRI：获取用于多尺度图案化的大规模、高通量电子束光刻系统

• 批准号: 1919866
• 负责人: Milan Begliarbekov
• 金额: $ 63万
• 依托单位: Research Foundation CUNY - Advanced Science Research Center
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2019
• 资助国家: 美国
• 起止时间: 2019-09-01 至 2022-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1919866&HistoricalAwards=false
• 关键词: MRI; Acquisition; Large; Scale; Throughput

The NanoFabrication Facility at the Advanced Science Research Center at the City University of New York is an interdisciplinary research space which is home to a diverse community of researchers who conduct work in the fields of nano-electronics, photonics, nano-bio interfaces, and several other fields enabled by nanofabrication. A key challenge, which is addressed by the purchase of a high throughput, large area electron beam lithography system is the ability to quickly and reliably generate patterns across multiple length scales: from tens of nanometers to several centimeters in size. In doing so, the system will accelerate research and enable the researchers to rapidly and cost effectively prototype electronic, photonic, and other devices which will serve as the basis of future technologies. Furthermore, the laboratory is a NYC based hub for mentoring high school, undergraduate, graduate students, and early career researchers. This system will be used to prepare students to tackle the complex problems facing the U.S., the STEM research community, and the world. In the long term, significant societal impact is anticipated in the development of fundamentally new technologies for health technologies, environmental science and energy generation.Electron beam lithography is a direct write / maskless lithographic technique used to rapidly generate patterns with nanometer resolution. In the past decade a large number of new material systems, such as two and three dimensional topological insulators, graphene, and transition metal dichalcogenides and many others emerged with the promise of revolutionizing the fields of photonics, nanoelectronics, and nano-bio interfaces. If successfully implemented, devices made from these materials include high mobility field effect transistors, topological and gate-controlled superconducting circuits, and high efficiency optical and optospintronic architectures, and fault-tolerant quantum computers. During the past decade a lot of fundamental research was done to understand the scientific principles that underpin the operation of these devices. The next challenge that must be overcome in order to realize the potential promise offered by these materials is the ability to build large scale prototype devices to show that these materials systems are viable candidates for 21st century technology. The acquisition of a high throughput electron beam lithography system is a key step in solving these challenges by enabling the rapid prototyping of novel devices.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

纽约市高级科学研究中心的纳米制造设施是一个跨学科研究空间，是一个多元化的研究人员社区的所在地，他们在纳米电子，光子学，纳米生物生物界面和几个领域进行工作，以及几个领域。其他字段通过纳米制造启用。通过购买高吞吐量，大面积电子束光刻系统来解决的一个关键挑战是能够快速可靠地生成多个长度尺度的模式：从数十纳米到几厘米的大小。这样一来，该系统将加速研究，并使研究人员能够快速和成本地原型电子，光子和其他设备，这些设备将作为未来技术的基础。此外，该实验室是一个基于纽约市的枢纽，用于指导高中，本科，研究生和早期职业研究人员。该系统将用于使学生准备解决美国，STEM研究社区和世界面临的复杂问题。从长远来看，预计在为健康技术，环境科学和能源生成的基本新技术开发中会产生重大的社会影响。electron束光刻是一种直接的写入 /无掩模的光刻技术，用于快速生成纳米分辨率的模式。在过去的十年中，许多新的材料系统，例如两个和三维拓扑绝缘子，石墨烯和过渡金属二色源以及许多其他材料，并且有望改变光子学，纳米电子学和纳米生物生物界面的承诺。如果成功实施，这些材料制造的设备包括高移动性场效应晶体管，拓扑和栅极控制的超导电路，以及高效率的光学和光启动体系结构以及容忍故障的量子计算机。在过去的十年中，进行了许多基础研究，以了解支撑这些设备运行的科学原则。为了实现这些材料所提供的潜在承诺，必须克服的下一个挑战是能够构建大型原型设备以表明这些材料系统是21世纪技术的可行候选者。通过实现新型设备的快速原型制作来解决这些挑战的高吞吐量电子束光刻系统是解决这些挑战的关键步骤。该奖项反映了NSF的法定任务，并被认为是值得通过基金会的知识分子和更广泛的影响来评估的支持。审查标准。