SBIR Phase II: Scalable Linear Ion Beam For Large Area Plasma Processing

SBIR 第二阶段：用于大面积等离子体处理的可扩展线性离子束

• 批准号: 1853254
• 负责人: Robert Weiss
• 金额: $ 75万
• 依托单位: Malachite Technologies
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2019
• 资助国家: 美国
• 起止时间: 2019-04-01 至 2023-11-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1853254&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Scalable; Linear

The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project touches upon everything from shower doors to consumer electronics to window glass. Deposition of high-quality thin films on a large scale with precise energy control can allow, for one example, diamond-like carbon (DLC) on glass. DLC coatings on glass can prevent soapy film build-up on shower doors, can improve the scratch resistance of mobile phone displays, and can reduce the cost of energy-conserving windows. The control of energy during fabrication processes won't just broaden what films can be made; it will allow the use of a greater variety of substrates. In recent years, a number of applications have utilized traditional inorganic coatings like silicon oxide on top of new materials like organic solar cells and organic LEDs. These organic materials show greater sensitivity to degradation during the coating processes. This ion beam source can give industry, as it begins to bring these innovations to market, a tool with the level of energy control that will allow lab results to translate to high yield, low cost manufacturing. The proposed project addresses the challenge of depositing advanced thin films on insulating and/or delicate substrates. Control of the deposition's energy flux has been shown in laboratory demonstrations to be required for many thin films including diamond-like carbon, transparent conductive oxides on silicon and organic solar cells, and ultra-thin silver. A scalable linear ion beam sputter source will establish a high-volume manufacturing tool for thin films limited today to much smaller scale. In Phase 1, the source's functionality was demonstrated. Phase 2 has two major components: hardware development for scale and usability; process development for specific commercial applications. The company will deliver a fully integrated control system and a source, scaled by 2x and designed for manufacture. Process development will consider beam energetics and geometry of beam/target/substrate relative to film and substrate properties. For DLC, this will focus on tribological and optical properties. For silver, they will test for continuity of ultra-thin films. Transparent Conducting Oxide (TCO) efforts will focus on electrical properties and substrate impacts, particularly carrier lifetime in silicon.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

这项小型企业创新研究（SBIR）II期项目的更广泛的影响/商业潜力涉及从淋浴门到消费电子到窗玻璃的所有内容。大规模的高质量薄膜的沉积具有精确的能量控制，例如玻璃上的钻石样碳（DLC）。 玻璃上的DLC涂料可以防止在淋浴门上积聚肥皂膜，可以提高手机显示器的刮擦性，并可以降低能源持续的窗户的成本。制造过程中能源的控制不仅可以扩大可以制作哪些电影。它将允许使用更多的基材。近年来，许多应用在新材料（例如有机太阳能电池和有机LED）之上使用了传统的无机涂层，例如氧化硅。这些有机材料在涂层过程中对降解的敏感性更高。这种离子光束来源可以为行业提供，因为它开始将这些创新推向市场，这是一种具有能源控制水平的工具，可以使实验室结果转化为高收益，低成本制造。拟议的项目应对在绝缘和/或精致的底物上存放高级薄膜的挑战。在实验室演示中，已经显示了对沉积能量通量的控制，这是许多薄膜所需的，包括钻石样碳，硅和有机太阳能电池上的透明导电氧化物以及超薄银。可扩展的线性离子束溅射源将建立一个薄膜的大容量制造工具，该工具今天限制在较小的规模。在阶段1中，证明了源的功能。第2阶段有两个主要组成部分：规模和可用性的硬件开发；特定商业应用程序的过程开发。该公司将提供一个完全集成的控制系统和一个由2倍扩展并为制造而设计的来源。过程开发将考虑相对于膜和底物特性的光束/目标/底物的光束能量和几何形状。对于DLC，这将集中在摩擦学和光学特性上。对于银色，他们将测试超薄电影的连续性。透明的氧化传导（TCO）努力将重点关注电气和底物影响，尤其是硅的载体寿命。该奖项反映了NSF的法定任务，并被认为是值得通过基金会的知识分子的评估来支持的，并具有更广泛的影响。

项目成果

From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films

• DOI: 10.1016/j.surfcoat.2021.127928
• 发表时间: 2021-11
• 期刊: Surface and Coatings Technology
• 影响因子: 5.4
• 作者: C. Hain;David Brown;Alex Welsh;K. Wieczerzak;R. Weiss;J. Michler;A. Hessler-Wyser;T. Nelis

62-1: Large-Area Ion Implantation Source for Production of Anti-Reflection Surfaces in Glass and Sapphire Substrates

62-1：用于玻璃和蓝宝石衬底减反射表面生产的大面积离子注入源

• 发表时间: 2022
• 期刊: Digest of technical papers
• 作者: Alexander Welsh, Robert Weiss