I-Corps: High-Throughput Manufacturing of Three-Dimensional Nanostructured Materials

I-Corps：三维纳米结构材料的高通量制造

• 批准号: 1806158
• 负责人: Rhonda Shrader
• 金额: $ 5万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2018
• 资助国家: 美国
• 起止时间: 2018-01-01 至 2018-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1806158&HistoricalAwards=false
• 关键词: Corps; Throughput; Manufacturing; Three; Dimensional

The broader impact / commercial potential of this I-Corps project is to better identify the commercial opportunity for three-dimensional nanostructured materials made via high-throughput holographic methods. These materials have a truss-like structure at submicron length scales, giving them better properties like improved strength-to-weight ratio. An analogy would be how we use trusses for bridges instead of solid hunks of steel. This manufacturing method will enable industrial-scale manufacturing of materials useful in multiple US industries. For example, membrane separations are used, for example, in biomedical testing, drug and therapeutic production, scientific research, and water treatment. Optical devices such as cameras, microscopes, and lighting could also be improved by various types of these three-dimensional nanostructured materials.This I-Corps project will identify the particular advantages of CHISEL (coordinated holographic industrial-scale electromagnetic lithography), which has the potential to greatly reduce the cost of three-dimensional nanostructured materials. Conventional photolithography for making integrated circuits is high quality, but slow and costly. Techniques such as imprint lithography are faster and cheaper, but limited to making essentially two-dimensional structures. CHISEL will enable continuous nanoscale manufacturing with high throughput. The method controls the phase of several interfering optical beams to continuously pattern a photosensitive material. A first-generation CHISEL tool (i.e. alpha tool) can have a volume patterning rate several orders of magnitude greater than conventional projection lithography (and with comparable or less capital cost).

该I-Corps项目的更广泛的影响 /商业潜力是更好地确定通过高通量全息方法制造的三维纳米结构材料的商业机会。这些材料在亚微米长度尺度上具有类似桁架的结构，从而使它们具有更好的特性，例如提高强度与重量比。一个类比是我们将桁架用于桥梁而不是钢铁块的方式。这种制造方法将使在美国多个行业有用的材料的工业规模制造。例如，在生物医学测试，药物和治疗生产，科学研究和水处理中使用了膜分离。这些三维纳米结构材料的光学设备（例如相机，显微镜和照明）也可以改善。本I-Corps项目将确定凿子的特殊优势（协调性的工业尺度电磁层造影），这有可能大大降低三二维nanossitions nansontonstrount的材料。用于制作集成电路的常规光刻学是高质量的，但较慢且昂贵。诸如烙印光刻之类的技术更快，更便宜，但仅限于制造二维结构。凿子将使吞吐量高的连续纳米级制造。该方法控制了几个干扰光束的相位，以连续对光敏材料进行图案。第一代凿子工具（即α工具）可以具有比传统投影光刻（以及可比或更少的资本成本）大的数量级的体积模式率。