High-throughput Nano-Scale Patterning for Large-area Nanomanufacturing

用于大面积纳米制造的高通量纳米级图案化

• 批准号: 1537440
• 负责人: L. Jay Guo
• 金额: $ 32万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-09-01 至 2019-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1537440&HistoricalAwards=false
• 关键词: throughput; Nano; Scale; Patterning; Large

There is an increasing interest and a strong need for nanomanufacturing technologies that are scalable both in processing area and speed. These technologies are needed to meet the growing markets in a wide range of applications from electronics to energy to biomedical. Examples include nanostructures to improve the brightness and power efficiency of flat panel displays, self-cleaning and anti-reflective surfaces for displays and photovoltaic devices, and patterned surfaces (for example, mimicking patterns on shark fins) to resist bacterial growth. Despite progress at various levels, a versatile nanofabrication technology that can meet the necessary requirements of high resolution, high fabrication speed, cost effectiveness and large area processing is lacking. This award will pave the way for future deployment of high-throughput nanopatterning for such applications for which the deep ultra-violet photolithography, used by the semiconductor industry, is too expensive to apply. This research involves several disciplines of science and engineering including nanomanufacturing, optical design, modeling and simulation, characterization and process development. These disciplines will be integrated into curriculum development and development of mini projects to give hands-on research opportunity for undergraduate and minority students.The resolution of photolithography is limited by the light diffraction limit. To overcome this limit, the new concept of plasmonics-based lithography was introduced as early as 2004 and followed later with the approach of hyperlens by taking advantage of intrinsically small plasmon wavelength. However there have been critical challenges impeding the progress of this field. For example, the design of the appropriate structures for masks is difficult and, due to the near-field nature of the photoresist exposure, the quality of the nanostructures (shallow depth and rough patterns) is very low. The research team aims to close the knowledge gap by developing reliable mask and hyperlens designs and investigate innovative strategies to produce high quality nanoscale patterns. They will explore unique dispersions of the hyperbolic metamaterial to achieve nanoscale features with pitch much reduced from that on the photomask. The proposed techniques, when implemented with a new roller lithography approach, combines some of the best features of photolithography, soft lithography, and continuous roll-to-roll and roll-to-plate patterning technologies toward realizing complex nanostructures for practical applications.

越来越多的兴趣和强大的需求对纳米制造技术在处理领域和速度方面都是可扩展的。需要这些技术来满足从电子到能源再到生物医学的广泛应用中不断增长的市场。例子包括纳米结构，以提高平板显示器的亮度和功率效率，用于显示器和光伏设备的自我清洁和抗反射表面以及图案表面（例如，模仿鲨鱼鳍上的模式）以抵抗细菌生长。尽管取得了不同级别的进展，但缺乏可以满足高分辨率，高制造速度，成本效益和大型面积处理所需要求的多功能纳米制作技术。该奖项将为未来在半导体行业使用的深度超紫罗莱珠光刻的应用中为未来的高通量纳米图案铺平道路。这项研究涉及科学和工程学的几个学科，包括纳米制造，光学设计，建模和模拟，表征和过程开发。这些学科将纳入迷你项目的课程开发和开发，以为本科和少数民族学生提供动手研究机会。光刻的分辨率受光衍射限制的限制。为了克服这一限制，最早在2004年引入了基于等离子体的光刻的新概念，随后通过利用本质上的小等离子体波长，采用了超平滑的方法。然而，存在着困难的挑战，阻碍了这一领域的进步。例如，面罩的适当结构的设计很困难，并且由于光吸鼠的近场性质，纳米结构（浅深度和粗糙图案）的质量非常低。研究小组的目标是通过开发可靠的面具和超重设计来缩小知识差距，并研究创新策略以产生高质量的纳米级模式。 他们将探索双曲线超材料的独特分散体，以实现纳米级特征，从光掩膜上的音高大大降低。当采用新的滚筒光刻方法实施时，提出的技术结合了光刻学，软光刻以及连续的卷到卷到板到板图案技术的一些最佳功能，以实现用于实践应用的复杂纳米结构。