Surface Nanopatterning by Ion Bombardment

通过离子轰击进行表面纳米图案化

• 批准号: 1307979
• 负责人: Karl Ludwig
• 金额: $ 33.83万
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2013
• 资助国家: 美国
• 起止时间: 2013-07-01 至 2017-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1307979&HistoricalAwards=false
• 关键词: Surface; Nanopatterning; Ion; Bombardment

Technical Description: Ion-based processes play a vital role in a wide range of thin-film growth, surface etching and surface modification processes. A major impediment to developing a robust understanding of surface evolution during ion bombardment has been the difficulty of quantitatively examining the kinetics of nanoscale morphology evolution. This project meets the challenge using a unique facility for in-situ x-ray surface studies developed at the National Synchrotron Light Source. In-situ grazing-incidence small-angle x-ray scattering (GISAXS) studies measure the wavenumber-dependent linear response governing the fundamental stability/instability of a surface to ion bombardment. The project pursues an integrated approach to resolve outstanding problems of ion-surface interaction along three directions. First, systematic studies of native semiconductor surface stability/instability to ion bombardment are carried out to test existing theory and provide insights for its further development. Stress development and its relationship to surface morphology evolution is an issue of particular focus. Second, nonlinear surface evolution and dynamics of the final steady-state surface morphology is examined using conventional real-time x-ray scattering and x-ray photon correlation spectroscopy, respectively. The latter technique uses a small x-ray beam, partially coherent across its width, to go beyond traditional kinetics studies. Finally, the effects of seeding are systematically examined to resolve the relative importance of stress and phase separation in driving nanostructure development.Non-technical Description: A fundamental understanding of surface evolution during ion bombardment is an "enabling focus" because hyperthermal bombardment is so ubiquitous in surface and thin-film growth processes. Results from this research project could thus potentially impact a wide range of deposition and surface modification techniques. Moreover, the development of coherent GISAXS studies to investigate surface dynamics envisioned in this project would be a powerful tool with a broad range of potential applications in the surface growth/modification community. Graduate, undergraduate and high-school students participating in this research project have an opportunity to work in an area that bridges basic research and application. In addition to experiencing, and contributing to, an important topic in current materials research, they learn to use a wide range of characterization tools. Students interact with a growing materials research community at Boston University and the graduate student also have an excellent opportunity to participate in the multi-disciplinary synchrotron research environment.

技术描述：离子工艺在各种薄膜生长、表面蚀刻和表面改性工艺中发挥着至关重要的作用。对离子轰击过程中表面演化的深入了解的一个主要障碍是难以定量研究纳米级形态演化的动力学。该项目利用国家同步加速器光源开发的用于原位 X 射线表面研究的独特设施来应对挑战。原位掠入射小角度 X 射线散射 (GISAXS) 研究测量波数相关的线性响应，控制表面离子轰击的基本稳定性/不稳定性。该项目寻求一种综合方法来解决沿三个方向的离子表面相互作用的突出问题。首先，对离子轰击下的本征半导体表面稳定性/不稳定性进行了系统研究，以测试现有理论并为其进一步发展提供见解。应力发展及其与表面形态演化的关系是一个特别关注的问题。其次，分别使用传统的实时 X 射线散射和 X 射线光子相关光谱检查非线性表面演化和最终稳态表面形态的动力学。后一种技术使用小型 X 射线束，在其宽度上部分相干，超越了传统的动力学研究。最后，系统地检查了晶种的影响，以解决应力和相分离在驱动纳米结构发展中的相对重要性。非技术描述：对离子轰击过程中表面演化的基本理解是一个“启用焦点”，因为高温轰击是如此普遍在表面和薄膜生长过程中。因此，该研究项目的结果可能会影响广泛的沉积和表面改性技术。此外，开发连贯的 GISAXS 研究来研究本项目中设想的表面动力学将是一个强大的工具，在表面生长/改性领域具有广泛的潜在应用。参与该研究项目的研究生、本科生和高中生有机会在基础研究和应用之间的桥梁领域工作。除了体验当前材料研究中的一个重要主题并为其做出贡献之外，他们还学习使用各种表征工具。学生与波士顿大学不断发展的材料研究社区互动，研究生也有绝佳的机会参与多学科同步加速器研究环境。