MRI Acquisition: Compound Semiconductor Reactive Ion Etcher for Functionally Diverse Materials, Structures and Devices

MRI 采集：用于功能多样的材料、结构和器件的化合物半导体反应离子蚀刻机

• 批准号: 1039988
• 负责人: Christopher Hinkle
• 金额: $ 41.5万
• 依托单位: University of Texas at Dallas
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-11-01 至 2012-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1039988&HistoricalAwards=false
• 关键词: MRI; Acquisition; Compound; Semiconductor; Reactive; MRI; Acquisition; Compound; Semiconductor; Reactive

The objective of this research is to enhance fabrication of devices based on compound semiconductors in areas related to energy, nanoelectronics and nanophotonics. The approach is to acquire one inductively coupled plasma (ICP) reactive ion etcher (RIE) for etching compound semiconductors and materials on compound semiconductors to augment the tool set available within the shared-access University of Texas at Dallas (UTD) shared-access Cleanroom Research Laboratory (CRL). Intellectual Merit: The project will close the gap in compound semiconductor applications, unify research and development in materials and devices, and allow teaming among university and industry researchers for a wide variety of application segments including communications, military, medical and energy.Broader Impact: The UTD CRL enables the research of over 160 users throughout UTD as well as academic researchers from other universities. Hands-on experience with state-of-the-art equipment prepares students and post-docs to enter the workforce ready to engage in research, development, and manufacturing. The breadth of functionally diverse materials, structures and devices enabled by this RIE will attract a broader pool of researchers beyond the current user base. The PIs will develop a two lecture sequence for an undergraduate Nanotech Instrumentation course which will focus on facilitization of advanced research equipment using this new RIE as the example. This represents a unique opportunity to directly show undergraduates how numerous disciplines are required to manufacture, install and operate advanced research equipment.

这项研究的目的是增强基于与能量，纳米电子和纳米光子学相关区域的复合半导体制造设备。 该方法是获取一种电感耦合等离子体（ICP）反应离子蚀刻器（RIE），用于蚀刻化合物半导体和复合半导体上的材料，以增强达拉斯（UTD）共享 - ACCESS CESSSESS-ACCESS清洁室研究实验室（CRL）共享的得克萨斯大学（UTAS）共享的工具中可用的工具。 知识分子的优点：该项目将缩小复合半导体应用中的差距，统一材料和设备的研发，并允许大学和行业研究人员之间的组合，以进行各种应用领域的各种应用领域。 与最先进的设备的实践经验为学生和职业生涯做好准备，准备进入准备参与研究，开发和制造的劳动力。 此RIE实现的功能多样的材料，结构和设备的广度将吸引超出当前用户群以外的更广泛的研究人员。 PI将为本科纳米技术仪器课程开发两个讲座序列，该课程将重点介绍以新的RIE为例促进先进的研究设备。 这是一个独特的机会，可以直接展示本科生制造，安装和操作高级研究设备所需的学科。