SBIR Phase I: Enabling large-scale manufacturing of organic electronic devices using photolithography

SBIR 第一阶段：利用光刻技术实现有机电子器件的大规模制造

• 批准号: 0945700
• 负责人: John DeFranco
• 金额: $ 15万
• 依托单位: Orthogonal, Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-01-01 至 2010-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0945700&HistoricalAwards=false
• 关键词: SBIR; Phase; Enabling; large; scale

This Small Business Innovation Research Phase I project will develop a method ofpatterning chemically sensitive organic electronic materials using photolithography and other standard cleanroom processes. The technology is based on the development of a fluorous based photoresist. The process to be developed will not damage organic semiconductors, which are destroyed by most organic solvents and water.The technology will solve many of the problems that plague the organic electronics industry, particularly related to OLED manufacturing. The technology has the potential to enable large scale manufacturing of OLED displays using existing LCD equipment, dramatically lower the cost and improving yields by using proven techniques.