GOALI - A University/Industry Partnership to Study Reaction and Transport During Depositions from Supercritical Fluids

GOALI - 大学/工业界合作研究超临界流体沉积过程中的反应和输运

• 批准号: 0245002
• 负责人: James Watkins
• 金额: $ 36.02万
• 依托单位: University of Massachusetts Amherst
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-05-01 至 2007-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0245002&HistoricalAwards=false
• 关键词: GOALI; University; Industry; Partnership; Study

Research: The continuous drive towards smaller and more complex microelectronic devices is placing new demands on the fabrication technologies used for their production. One of the most difficult challenges is the rapid, defect-free deposition of high purity metals within narrow device features with dimensions below 100 nanometers. One prominent example of immediate concern is the fabrication of advanced copper interconnects for integrated circuits. With recent NSF funding, a fundamentally new technique that meets the performance criteria for device metallization, called supercritical fluid deposition (SFD), was developed at the University of Massachusetts. In SFD, soluble organometallic compounds are reduced in supercritical fluids including carbon dioxide to yield high purity deposits at low temperature. A supercritical fluid can be viewed as hybrid medium with properties that lie intermediate to those of gases and liquids. These properties are such that the limitations of current liquid and vapor-phase techniques can be circumvented while preserving the benefits of each. The result for Cu deposition is unprecedented feature fill at sub-100 nm device dimensions, while maintaining other critical film properties.The PI's results to date indicate SFD offers great promise for the fabrication of semiconductor and other devices, but the technique is still in its infancy and fundamental studies are required to further development and broaden its impact. Toward this end, the PI will examine two issues that are essential to understanding SFD and related SCF processes. First, the mechanisms for SFD reactions will be determined and models that capture both deposition kinetics and step coverage will be elucidated. Knowledge of reaction pathways during SFD will have direct implications for device metallization and broader impact for catalytic reactions in supercritical media. Second, computation fluid dynamics (CFD) simulations will be developed to describe heat and mass transfer in multi-component supercritical deposition reactors under highly turbulent flow. These capabilities are not accessible in commercial packages and will be invaluable for a broad range of SCF applications. Experimental data will be used to validate and refine the models. Impact: The research program is a cooperative effort between the University of Massachusetts and Novellus Systems, a leading semiconductor equipment company that has licensed SFD for microelectronic applications. It will facilitate the development of SFD for interconnect technology, which may prove enabling for future generations of integrated circuits, a $100 billion / yr. industry. Success will result in the transfer of academic research to commercial applications while eliciting fundamentals of reaction and transport in SCFs that have broad relevance to a number key industries. The program will also provide a unique opportunity for graduate students to work at the interface of industry and academia.

研究：朝着较小且更复杂的微电子设备驱动的是对用于生产的制造技术提出了新的需求。 最困难的挑战之一是在狭窄的设备特征中，高纯度金属的快速，无缺陷的沉积，尺寸低于100纳米。直接关注的一个突出的例子是为集成电路的高级铜互连制造。随着最近在马萨诸塞大学开发了符合设备金属化性能标准（称为超临界流体沉积（SFD）的绩效标准）的NSF资金，这是一种新的新技术。在SFD中，包括二氧化碳在内的超临界流体中可溶性有机金属化合物减少，以在低温下产生高纯度沉积物。 超临界流体可以看作是具有中间特性的杂种培养基。 这些特性使得当前液体和蒸气相技术的局限性可以在保留每种效果的同时避免。 CU沉积的结果是在100 nm设备尺寸下进行的空前功能填充，同时保持其他关键膜性能。PI迄今为止的结果表明，SFD为制造半导体和其他设备提供了巨大的希望，但是该技术仍在其婴儿期和基础研究中，需要进一步开发并扩大其影响并扩大其影响。为此，PI将研究两个对于理解SFD和相关SCF流程至关重要的问题。 首先，将确定SFD反应的机制，并将阐明捕获沉积动力学和阶跃覆盖率的模型。 SFD期间反应途径的知识将直接影响器械金属化和对超临界介质中催化反应的更广泛影响。其次，将开发计算流体动力学（CFD）模拟，以描述高度湍流下多组分超临界沉积反应器中的热和传质。这些功能在商业包中无法访问，对于广泛的SCF应用程序将是无价的。实验数据将用于验证和完善模型。影响：研究计划是马萨诸塞大学和Novellus Systems（领先的半导体设备公司Novellus Systems之间的合作努力），该公司已获得用于微电子应用的SFD。它将促进用于互连技术的SFD的开发，这可能会证明为子孙后代的综合电路（1000亿美元 /年）。行业。 成功将导致学术研究转移到商业应用，同时引起与许多关键行业相关的SCF中反应和运输的基础。该计划还将为研究生提供独特的机会，可以在行业和学术界的界面上工作。