Real Time Polarimetry for Tailored Silicon Thin Films

定制硅薄膜的实时偏振测量

• 批准号: 9820170
• 负责人: Robert Collins
• 金额: $ 25.5万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1999
• 资助国家: 美国
• 起止时间: 1999-02-01 至 2002-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9820170&HistoricalAwards=false
• 关键词: Real; Time; Polarimetry; Tailored; Silicon

9820170CollinsThe proposed research will advance techniques for real time analysis of thin film nucleation and growth. Powerful high-speed optical probes based on polarimetry will be developed to enable full characterization of the polarization state of light reflected from the surfaces of growing films with sub-monolayer resolution. The new methods will yield 1) the Stokes vector of the reflected light beam from 1.5 to 6.5 eV in 32 msec, or 2) the 16 elements of the Mueller matrix of the sample over a similar energy range in approximately 200 msec. With such capabilities, a better understanding of the growth of silicon and boron nitride thin films will be possible, particularly throughout the technologically important deposition regimes in which the morphology or crystalline phase of the films evolves with thickness leading to anisotropy and depolarization effects. These methods will guide the fabrication of new and improved thin film materials for use in future generation of large area electronics and hard coatings. Technology transfer of the process of materials preparation is expected to lead in improvements in silicon thin film voltaics and boron nitride hard coatings technologies. The proposed research will serve to train graduate and undergraduate students with broad skills in condensed matter, materials, and optical physics that are in demand for post-graduate employment in industrial research and development laboratories.%%%In this project the principal investigator will develop new techniques for the preparation of improved thin films during their growth on a variety of substrates. The new methods will be transferable to U.S. industries engaged in the commercial production of thin films for a variety of technological applications. The research will engage graduate and undergraduate students who will be trained in methods and techniques which will be important in U.S. technology in the 21st Century ***

9820170柯林斯提出的研究将推进薄膜成核和生长实时分析技术。将开发基于偏振测量的强大高速光学探针，以实现以亚单层分辨率全面表征从生长薄膜表面反射的光的偏振态。新方法将产生 1) 在 32 毫秒内从 1.5 eV 到 6.5 eV 的反射光束的斯托克斯矢量，或 2) 在大约 200 毫秒内相似能量范围内样品穆勒矩阵的 16 个元素。 有了这样的能力，就可以更好地了解硅和氮化硼薄膜的生长，特别是在整个技术上重要的沉积机制中，薄膜的形态或晶相随着厚度的变化而变化，从而导致各向异性和去极化效应。这些方法将指导新型和改进的薄膜材料的制造，用于下一代大面积电子和硬涂层。 材料制备过程的技术转让预计将导致硅薄膜伏打和氮化硼硬涂层技术的改进。 拟议的研究将有助于培养具有凝聚态、材料和光学物理方面广泛技能的研究生和本科生，这些技能是工业研究和开发实验室研究生就业所需要的。%%%在该项目中，首席研究员将开发在各种基材上生长过程中制备改进薄膜的新技术。 这些新方法将可转移到美国从事各种技术应用薄膜商业生产的行业。 该研究将吸引研究生和本科生，他们将接受方法和技术方面的培训，这对 21 世纪的美国技术至关重要***