Growth of Mullite Coatings by Chemical Vapor Deposition

化学气相沉积法生长莫来石涂层

• 批准号: 9311966
• 负责人: Vinod Sarin
• 金额: $ 4.94万
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-05-01 至 1994-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9311966&HistoricalAwards=false
• 关键词: Growth; Mullite; Coatings; Chemical; Vapor

Under an SGER award the feasibility of growing thin coatings of mullite (3 Al2O3 . 2 SiO2) on ceramic substrates will be studied. The deposition method will be chemical vapor deposition of ultra- thin layers of the constituent compounds, followed by post- deposition heat treatment to form the mullite by inter diffusion. Process characteristics for development of optimal properties of oxidation resistance, resistance to sodium attack, spall resistance during thermal cycling, and hardness will be developed for substrates of silicon carbide and silicon nitride ceramics. The possibility of depositing functionally graded coatings by this technique on these substrates will also be evaluated.

根据SGER奖，将研究在陶瓷基板上生长薄薄的Mullite（3Al2o3。2SiO2）的可行性。 沉积方法将是成分化合物超薄层的化学蒸气沉积，然后进行沉积后热处理处理，以通过间扩散形成mullite。 开发氧化耐药性，对钠攻击的耐药性，热循环过程中的抗抗抗性以及硬度的过程特征将用于碳化硅和氮化硅陶瓷的底物。 还将评估通过该技术在这些底物上沉积功能分级涂层的可能性。