Photolithographic Feature Fabrication on Acrylic Substrates with Tight Tolerance Height Requirement

具有严格公差高度要求的亚克力基板上的光刻特征制造

基本信息

批准号：
543730-2019
负责人：
Sameoto, Daniel
金额：
$ 1.82万
依托单位：
University of Alberta
依托单位国家：
加拿大
项目类别：
Engage Grants Program
财政年份：
2019
资助国家：
加拿大
起止时间：
2019-01-01 至 2020-12-31
项目状态：
已结题

来源：
https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=681038
关键词：
Photolithographic Feature Fabrication Acrylic Substrates

项目摘要

This project aims to produce an optical spacer system compatible with a novel lensless microscope system commercialized by Alentic Microscience Inc. The spacers need to be both exceptionally thin and high tolerance (2.5 micrometers with less than 1% deviation from nominal across the imaging area) and produced on an acrylic substrate initially, but ideally compatible with other transparent polymer substrates. This exceptionally tight tolerance must be achieved without any substantial damage or roughness increase of the underlying acrylic substrate to be functional for the target application of lensless microscropy. Two main manufacturing techniques will be applied - direct photolithography of a thin-film epoxy layer onto acrylic substrates via traditional spin-coating, and a two-photon direct write lithography system recently acquired by the University of Alberta. The traditional lithography approach is in theory more scalable, but has not been characterized for the exceptional uniformity required by the imaging application. The two photon lithography approach may be able to produce the uniformity required, but can only pattern over very small areas (~1 cm^2). As such, proof-of-principle tests and replication using soft lithography molding techniques would be attempted in these cases to determine feasibility to up-scale high quality master templates for this production purpose. The result of the project would be a series of process steps that can be adapted by Alentic Microscience Inc. to best approach their production requirements for lensless imaging.

该项目旨在生产一种与 Alentic Microscience Inc 商业化的新型无透镜显微镜系统兼容的光学垫片系统。垫片需要非常薄且具有高公差（2.5 微米，在整个成像区域与标称值的偏差小于 1%），并且最初是在丙烯酸基材上生产的，但与其他透明聚合物基材完美兼容。这种极其严格的公差必须在没有任何实质性损坏或底层丙烯酸基板粗糙度增加的情况下实现，才能用于无透镜显微术的目标应用。将应用两种主要制造技术：通过传统旋涂将薄膜环氧树脂层直接光刻到丙烯酸基板上，以及阿尔伯塔大学最近获得的双光子直写光刻系统。传统的光刻方法理论上更具可扩展性，但尚未达到成像应用所需的卓越均匀性。双光子光刻方法也许能够产生所需的均匀性，但只能在非常小的区域（~1 cm^2）上形成图案。因此，在这些情况下，将尝试使用软光刻成型技术进行原理验证测试和复制，以确定为此生产目的扩大高质量主模板的可行性。该项目的结果将是一系列工艺步骤，Alentic Microscience Inc. 可以对其进行调整，以最好地满足其无透镜成像的生产要求。