Photolithographic Feature Fabrication on Acrylic Substrates with Tight Tolerance Height Requirement

具有严格公差高度要求的亚克力基板上的光刻特征制造

• 批准号: 543730-2019
• 负责人: Sameoto, Daniel
• 金额: $ 1.82万
• 依托单位: University of Alberta
• 依托单位国家: 加拿大
• 项目类别: Engage Grants Program
• 财政年份: 2019
• 资助国家: 加拿大
• 起止时间: 2019-01-01 至 2020-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=681038
• 关键词: Photolithographic; Feature; Fabrication; Acrylic; Substrates

This project aims to produce an optical spacer system compatible with a novel lensless microscope system commercialized by Alentic Microscience Inc. The spacers need to be both exceptionally thin and high tolerance (2.5 micrometers with less than 1% deviation from nominal across the imaging area) and produced on an acrylic substrate initially, but ideally compatible with other transparent polymer substrates. This exceptionally tight tolerance must be achieved without any substantial damage or roughness increase of the underlying acrylic substrate to be functional for the target application of lensless microscropy. Two main manufacturing techniques will be applied - direct photolithography of a thin-film epoxy layer onto acrylic substrates via traditional spin-coating, and a two-photon direct write lithography system recently acquired by the University of Alberta. The traditional lithography approach is in theory more scalable, but has not been characterized for the exceptional uniformity required by the imaging application. The two photon lithography approach may be able to produce the uniformity required, but can only pattern over very small areas (~1 cm^2). As such, proof-of-principle tests and replication using soft lithography molding techniques would be attempted in these cases to determine feasibility to up-scale high quality master templates for this production purpose. The result of the project would be a series of process steps that can be adapted by Alentic Microscience Inc. to best approach their production requirements for lensless imaging.

该项目旨在生产与Alentic Microscience Inc.商业化的新型无透镜显微镜系统兼容的光学间隔系统。这些垫片需要具有异常薄和高的耐受性（2.5微米（2.5个微米，与图像区域的标称区域偏差小于1％），并在最初的丙烯酸基础上与其他近距离的偶然物质产生，但在丙烯酸的基础上产生。 必须实现这种异常紧密的公差，而不会在无透镜微晶格的目标应用中实现基础丙烯酸基底物的任何实质性损害或粗糙度增加。 将采用两种主要的制造技术 - 通过传统的自旋涂层将薄膜环氧层直接光刻在丙烯酸底物上，以及艾伯塔大学最近获得的两光子直接写入光刻系统。 从理论上讲，传统的光刻方法更可扩展，但尚未以成像应用所需的特殊统一性为特征。 两个光子光刻方法可能能够产生所需的均匀性，但只能在很小的区域（〜1 cm^2）上进行模式。 因此，在这些情况下，将尝试使用软光刻成型技术进行原告验证测试和复制，以确定以这种生产目的确定高质量高质量主模板的可行性。 该项目的结果将是一系列过程步骤，可以通过Alentic Microsience Inc.进行调整，以最佳地了解其无透镜成像的生产要求。