Strain-induced scarring & its effects on microelectrodes

应变引起的疤痕

• 批准号: 6838715
• 负责人: Ravi V. Bellamkonda
• 金额: $ 34万
• 依托单位: GEORGIA INSTITUTE OF TECHNOLOGY
• 依托单位国家: 美国
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-12-15 至 2008-05-31
• 项目状态: 已结题
• 来源: https://reporter.nih.gov/project-details/6838715
• 关键词: antiinflammatory agents; astrocytes; bioengineering /biomedical engineering; biomaterial development /preparation; biomaterial interface interaction; hippocampus; infant animal; laboratory rat; mechanical stress; microelectrodes; nerve injury; nervous system prosthesis; shear stress; silicon; slow release drug; surface coating; tissue /cell culture

DESCRIPTION (provided by applicant): Silicon microelectrode array technology holds considerable promise in advancing the goal of developing stable, electrode-brain interfaces. Chronic unit recordings from multiple neurons in the brain would significantly enhance our understanding of normal physiology and provide a valuable control signal for use in neuro-prosthetic devices. However, the current generation of silicon microelectrodes does not allow stable long-term recordings. The precise mechanisms that cause failure of silicon microelectrode mediated recordings are not known. We hypothesize that the million-fold stiffness mismatch between silicon and neural tissues generates shearing forces at the interface resulting in an astro-glial scar formation that progressively excludes neurons from the vicinity of the recording electrodes. To test our hypothesis, we propose novel and innovative methods to a) determine the strain-sensitivity of primary astrocytes in terms of their adopting a scarring phenotype; b) determine if strain-induced scar formation around Si-microelectrodes degrades their recording capabilities in organotypic hippocampal slice cultures; and c) design coatings for Si-microelectrodes that allow the sustained local release of anti-inflammatory agents to decrease scarring and increase recording stability. The above aims represent a highly inter-disciplinary investigation of an important problem in the design and development of stable neuro-prosthetic devices. Successful completion of our research goals is likely to impact the mechanical and biochemical aspects of the design of the next generation of silicon microelectrode arrays, and subsequently significantly impact the quality of life of persons with disabilities.

描述（由申请人提供）：硅微电极阵列技术在促进稳定的电极 - 脑接口的目标方面具有巨大的希望。来自大脑多个神经元的慢性单位记录将显着增强我们对正常生理学的理解，并为在神经螺旋装置中使用有价值的控制信号。但是，当前的硅微电极不允许稳定的长期记录。导致硅微电极介导的记录失败的确切机制尚不清楚。我们假设硅和神经组织之间的百万倍刚度不匹配会在界面上产生剪切力，从而导致天体粘膜形成，从而逐渐排除了从记录电极附近的神经元排除神经元。为了检验我们的假设，我们提出了新颖和创新的方法来a）确定原代星形胶质细胞的应变敏感性，以采用疤痕表型； b）确定应变诱导的Si-Microelectrodes周围的疤痕形成是否会降解其在器官海马切片培养物中的记录能力； c）设计用于Si-Microelectrodes的涂层，使抗炎药的局部释放可以减少疤痕并增加记录稳定性。上述目的代表了对稳定神经螺旋装置设计和开发中一个重要问题的高度跨学科研究。成功完成我们的研究目标很可能会影响下一代硅微电极阵列设计的机械和生化方面，随后会显着影响残疾人的生活质量。