In-situ TEM observation of nano-dynamics to point defects in crystals by a ultra high-speed CCD camera

利用超高速 CCD 相机对晶体中的点缺陷进行纳米动力学原位 TEM 观察

• 批准号: 16360310
• 负责人: SHIBAYAMA Tamaki
• 金额: $ 4.42万
• 依托单位: Hokkaido University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2004
• 资助国家: 日本
• 起止时间: 2004 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-16360310/
• 关键词: ultra high speed; TEM; nano sized materials; interface; irradiation effects; joining; point defects; composites; 透過電子顕徴鏡; TEM; 検出器; 高速カメラ; 高分解能; 動的観察; 時間分解能

In 2006, We investigated nano dynamics about irradiation defects and crack propagation of SiC/SiC composite material by a high-speed camera. Furthermore, we summarized results of in-situ TEM observation in the past three years. Accomplishment of our original purpose may be reached up to 70%, but it is thought that I clarified the purpose of this study enough. In addition, development of a pulse electron source of light to be based on a new idea by pulsed laser irradiation to a target in Germany, and to generate the electron which was high strength was done. The new electron microscope which they improved this electronic source and changed for electron gun of a normal electron microscope was developed in U.S.A., and it was reported in an international microscope congress held in Sapporo in September, 2006. Because a study was already made about some topics of materials science, and there were word of mouth and announcement with a poster, positioning of international of this study became clear. In this study, we used a general thermo electron source and a field emission electron source, however, for the American device, a pulsed electron source used. We aimed to record a series of events by a high speed CCD camera, but American team aimed to record an each phenomenon by a pulsed electron source as a strobe image to understand a series of high speed phenomena. However, it was advantage in our method to know the initiation of a certain phenomenon, and future development was expected in the above conference. We explored a new research field in this study and we will continue it in future and should be able to go ahead through a new project as mentioned above. In addition, because new issues were found through this study for the past three years, could reflect for the next project.

2006年，我们利用高速相机研究了SiC/SiC复合材料辐照缺陷和裂纹扩展的纳米动力学。此外，我们还总结了近三年来的原位TEM观测结果。我们最初的目的可能达到70%，但我认为我已经足够明确了这项研究的目的。此外，德国还开发了基于新理念的脉冲电子光源，通过向目标照射脉冲激光来产生高强度的电子。他们改进了这种电子源，将普通电子显微镜的电子枪改为新的电子显微镜，是在美国开发的，并在2006年9月在札幌举行的国际显微镜大会上进行了报道。材料科学的主题，并且有口耳相传和海报公告，这项研究的国际定位变得清晰。在本研究中，我们使用了通用热电子源和场发射电子源，然而，对于美国设备，使用了脉冲电子源。我们的目标是通过高速CCD相机记录一系列事件，而美国团队的目标是通过脉冲电子源将每个现象记录为频闪图像，以了解一系列高速现象。然而，我们的方法有利于了解某种现象的发生，并在上述会议中对未来的发展进行了预期。我们在这项研究中探索了一个新的研究领域，我们将在未来继续下去，并且应该能够继续进行如上所述的新项目。另外，由于过去三年通过这项研究发现了新的问题，可以为下一个项目带来反映。

项目成果

Introduction of the Advanced Nuclear Energy Technology in Fusion, Fuels and Materials

介绍先进核能聚变、燃料和材料技术

• 发表时间: 2005
• 作者: T.Shibayama

Growth structure and growth defects in pulsed laser deposited Cr-CrN_x-CrC_xN multilayer coatings

脉冲激光沉积 Cr-CrN_x-CrC_xN<1-x> 多层涂层的生长结构和生长缺陷

• 发表时间: 2006
• 作者: J.M.Lackner; W.Waldhauser; B.Major; J.Morgiel; L.Major; H.Takahashi; T.Shibayama
• 通讯作者: T.Shibayama

Morphological investigations of disaccharide molecules for growth inhibition of ice crystals

双糖分子抑制冰晶生长的形态学研究

• DOI: 10.1016/j.jcrysgro.2006.10.261
• 发表时间: 2007-02-01
• 期刊: Journal of Crystal Growth
• 影响因子: 1.8
• 作者: T. Uchida;M. Nagayama;T. Shibayama;K. Gohara
• 通讯作者: K. Gohara

A study of the formation of nanometer-scale cavities in helium-implanted 4H-SiC

氦注入 4H-SiC 中纳米级空腔形成的研究

• DOI: 10.1016/j.nimb.2003.12.082
• 发表时间: 2004-06-01
• 期刊: Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms
• 影响因子: 1.3
• 作者: Chonghong Zhang;S. Donnelly;V. Vishnyakov;J. Evans;T. Shibayama;Yuna Sun
• 通讯作者: Yuna Sun

Fabrication of Jingle-Bell-Shaped Core-Shell Nanoparticulate Films and Molecular-Size-Responsive Photoluminescence Quenching of Cadmium Sulfide Cores

钟形核壳纳米颗粒薄膜的制备和硫化镉核的分子尺寸响应光致发光猝灭

• 发表时间: 2006
• 作者: K.Iwasaki; T.Torimoto; T.Shihayama; T.Nishikawa; B.Ohtani
• 通讯作者: B.Ohtani