Low Damage Thin Film Preparation with a Sputtering Method that Employs an Extremely Strong Magnetic Field

采用极强磁场溅射法制备低损伤薄膜

• 批准号: 20360017
• 负责人: IKUTA Hiroshi
• 金额: $ 9.32万
• 依托单位: Nagoya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2008
• 资助国家: 日本
• 起止时间: 2008 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-20360017/
• 关键词: 薄膜; スパッタ成膜法; 強磁場; プラズマ診断; 反応性スパッタ

Magnetron sputtering is one of the most important thin-film preparation methods that is widely used. The sputtering efficiency depends strongly on the magnetic field that is used to confirm the plasma. We have developed a sputtering device that employs a magnetic field about 20 times larger than a conventional one. In this study, the plasma generated by this method was diagnosed, and several deposition experiments were conducted to elucidate the characteristics of this novel technique. Among other things, we found that energetic electrons are trapped in a wide region above the target because of the strong magnetic field, and that this method is advantageous for reacted sputtering. We also studied a face-to-face magnetron device, and have shown that the strong magnetic field can be more effectively utilized by this arrangement.

磁控溅射是广泛使用的最重要的薄膜制备方法之一。溅射效率在很大程度上取决于用于确认血浆的磁场。我们已经开发了一种溅射设备，该磁场的磁场比传统设备大约20倍。在这项研究中，诊断出该方法产生的血浆，并进行了几项沉积实验，以阐明这种新技术的特征。除其他外，我们发现，由于强磁场的强度，能量电子被困在目标上方的宽区域中，并且该方法对于反应溅射是有利的。我们还研究了一个面对面的磁控管设备，并表明可以通过这种布置更有效地利用强磁场。

项目成果

Superheating Effect of REBCO Thin Films and its Application to a Seed Crystal in Melt-textured Growth

REBCO薄膜的过热效应及其在熔体织构生长中籽晶的应用

• 发表时间: 2009
• 作者: X.Yao;Y.Q.Cai;C.Y.Tang;X.Wang;L.Cheng;M.Oda;Y.Yoshida;H.Ikuta
• 通讯作者: H.Ikuta

スパッタ法によるMn_3CuN薄膜の作製と評価

溅射法制备Mn_3CuN薄膜及评价

• 发表时间: 2011
• 作者: 青山真大;竹中康司;生田博志
• 通讯作者: 生田博志

Magnetic Anisotropy of Mn_3CuN Thin Films Deposited by the Ultrahigh-Field Sputtering Method

超高场溅射法沉积Mn_3CuN薄膜的磁各向异性

• 发表时间: 2010
• 作者: M.Aoyama;K.Nakamura;K.Takenaka;H.Ikuta
• 通讯作者: H.Ikuta

Growth of melt-textured (LRE)-Ba-Cu-O by cold seeding using Sm123 thin film as seed crystal

使用 Sm123 薄膜作为晶种通过冷引晶生长熔体织构 (LRE)-Ba-Cu-O

• 发表时间: 2010
• 作者: H.Ikuta;S.Ogino;M.Oda;X.Yao;Y.Yoshida
• 通讯作者: Y.Yoshida

Ultralow pressure sputtering employing ultrahigh magnetic fields

采用超高磁场的超低压溅射

• 发表时间: 2009
• 作者: H.Tsuji;P.Sommani;M.Hattori;T.Yamada;H.Sato;Y.Gotoh;J.Ishikawa;生田博志
• 通讯作者: 生田博志