Fabrication of Large-Grained Polycrystalline Si Thin Films by Controlling Nucleation Sites on Glass Substrates

通过控制玻璃基底上的成核位点制备大晶粒多晶硅薄膜

基本信息

批准号：
16360070
负责人：
YASUTAKE Kiyoshi
金额：
$ 6.66万
依托单位：
Osaka University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2004
资助国家：
日本
起止时间：
2004 至 2006
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-16360070/
关键词：
polycrystalline Si Si thin film glass substrate large-grain crystal nucleus Ge nano-crystal solid phase crystallization nano-imprint

项目摘要

Large-grained polycrystalline silicon (poly-Si) thin films on glass substrates are of interest for the fabrication of high-performance thin-film transistors (TFT) and cost-effective solar cells. To obtain large-grained poly-Si thin films, it is important to control the formation of nucleation sites for Si crystal growth on a glass surface prior to film deposition. Glass substrates having nucleation sites with tailored properties, such as size and spacing, are particularly desirable for the solid-phase crystallization (SPC) of amorphous silicon (a-Si) thin films. In this work, we have proposed a new process to fabricate crystalline Ge islands with controlled size and density in a tailored range to form nuclei for SPC of a-Si thin films. The process consists of the deposition of a-Ge thin films on glass substrates at room temperature, the subsequent vacuum annealing for SPC of the deposited a-Ge thin films to form self-assembled crystalline Ge islands, and the oxygen etching for controlling the size and density of Ge islands. From the micro beam reflection high-energy electron diffraction observation of the partially crystallized a-Si thin film using Ge nuclei, we have confirmed that Ge islands act as nuclei for Si crystallization. Marked reductions of the crystallization time and temperature are observed in the annealing experiments of a-Si : H thin films deposited on glass substrates with Ge nuclei. Moreover, it is found that the crystal growth rate of a-Si : H deposited by atmospheric pressure plasma CVD is much larger than that of a-Si deposited by E-beam evaporation. For the location control of Ge nuclei on glass substrates, a nano-imprint technique using crystalline Ge tip array has been demonstrated.

玻璃基板上的大颗粒多晶硅（Poly-SI）薄膜对制造高性能薄膜晶体管（TFT）和具有成本效益的太阳能电池感兴趣。为了获得大颗粒的聚-SI薄膜，控制膜沉积之前在玻璃表面上的Si晶体生长的成核位点的形成很重要。具有定制特性的成核位点（例如尺寸和间距）的玻璃基板对于无定形硅（A-SI）薄膜的固相结晶（SPC）尤其需要。在这项工作中，我们提出了一个新的过程，以在量身定制的范围内制造具有控制尺寸和密度的结晶GE岛，以形成A-SI薄膜的SPC核。该过程包括在室温下A-GE薄膜在玻璃底物上的沉积，随后沉积的A-GE薄膜的SPC的真空退火，以形成自组装的结晶GE岛，以及用于控制GE岛大小和密度的氧气蚀刻。通过使用GE核对部分结晶的A-SI薄膜的微束反射高能电子衍射观察，我们已经证实GE岛是Si结晶的核。在沉积在具有GE核的玻璃基板上的A-Si：H薄膜的退火实验中，观察到结晶时间和温度的显着降低。此外，发现通过大气压等离子体CVD沉积的A-SI：H的晶体生长速率比通过电子束蒸发沉积的A-SI大得多。对于GE核在玻璃基材上的位置控制，已经证明了使用Crystalline GE尖端阵列的纳米印刷技术。

项目成果

期刊论文数量（7）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Fabrication of Polycrystalline Silicon Thin Films on Glass Substrates Using Ge Nano-Islands as Nuclei

以Ge纳米岛为核在玻璃衬底上制备多晶硅薄膜

DOI：
发表时间：
2006
期刊：
Ext.Abst. of Int.21st Century COE Symp. on Atomistic Fabrication Technology 19-29
影响因子：
0
作者：
K.Minami;C.Yoshimoto;H.Ohmi;T.Shimura;H.Kakiuchi;H.Watanabe;K.Yasutake
通讯作者：
K.Yasutake

Ge Nuclei for Fabrication of Poly-Si Thin Films on Glass Substrates

用于在玻璃基板上制造多晶硅薄膜的 Ge 核