Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques

通过沉积技术制造软 X 射线光学元件的非球面

基本信息

批准号：
11650049
负责人：
NIIBE Masahito
金额：
$ 2.05万
依托单位：
Himeji Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2001
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650049/
关键词：
Soft X-Rays Optical Element Aspherical Thin Film Multilayer Lithography Point Diffraction Interferometer Wavefront error X線内部応力表面粗さ

项目摘要

1. Fabrication of aspherical surfaces by means of deposition techniquesTo fabricate an aspherical surface by deposition, we have introduced a deposition system with RF-plasma-enhanced magnetron sputtering cathodes. As an example, we have calculated the asphericity of a mirror for EUVL optics and designed a deposition mask. The distribution in the thickness of a laterally graded deposited film was close to the designed value. Thus, we concluded that the deposition method is promising for the formation of an aspherical figure with great accuracy.2. Control of surface roughness and residual stress in deposition filmsWe have found that the surface roughness and residual stress for the Mo/Si multilayers are about one order of magnitude smaller than those for the Mo single layers. Using multilayers for the film to figure the aspherical surface has advantages of reducing surface roughness and residual stress.The internal stress of Mo/B4C MLs for soft X-rays fabricated by an RF-enhanced plasma … More magnetron sputtering system was investigated as a function of sputtering Ar pressure and thickness ratio of the two layers that comprise the ML structure. The internal stress in the MLs with Gamma=0.468 and 0.625 changed from a compressive value of about 1.1 Gpa to a tensile value of about 0.6 Gpa as Ar ressure increased from 1.3 mTorr to 6.0 mTorr. As the Gamma value changed from 0.375 to 0.625, the transition point from compressive to tensile stress shifted to lower Ar pressure. Thus the internal stress of Mo/B4C MLs can be controlled by changing the thickness ratio or the sputtering Ar pressure without any thermal treatment, which can deform precisely, figured substrates.3. Measurement of wavefront errors in X-Ray optics by using at-wavelength point diffraction interferometryExtreme ultraviolet phase-shifting point diffraction interferometer (PS/PDI) was studied for the precise measurement of X-Ray optical system. We carried out the double window and the PDI experiments by using the NewSUBARU long undulator beam line radiation without further reduction of the band width using monochromator. We found that rather good fringe contrast of a Schwarzschild test optics could be obtained throughout the field This is attributed to the effect of the phase matching Initiated by grating diffraction We would think that the EUV band width inside the one associated with the optics multilayer mirror reflection can be used for present PS/PDI technique. Less

1。通过沉积技术制造非球面的表面，通过沉积制造非球面表面，我们引入了一个带有RF-plasma增强型磁控溅射的沉积系统。例如，我们计算了euvl光学镜像的非球面，并设计了一个沉积掩模。侧向沉积膜的厚度分布接近设计值。这就是我们得出的结论，即使精确地形成非球形图2。控制表面粗糙度和沉积膜中的残留应力的控制发现，MO/SI多层的表面粗糙度和残余应力比MO单层小的数量级大约一个数量级。使用多层胶片来弄清楚非球面具有减少表面粗糙度和残留应力的优点。通过RF增强的等离子制造的MO/B4C MLS的内部应力……研究了更多的磁性溅射系统，该系统被研究为溅射AR压力和组成MOLS结构的两层层的函数。随着AR的恢复从1.3 mTORR增加到6.0 mtorr，MLS的内部应力从约1.1 GPa的压缩值从约1.1 GPA变为0.6 GPa的拉伸值变为0.6 GPa。随着伽马值从0.375变为0.625，从压缩应力到拉伸应力的过渡点转移到较低的AR压力。 MO/B4C MLS的内部应力可以通过改变厚度比或溅射AR压力而无需任何热处理的溅射AR压力来控制，这可以准确变形，3。研究了通过使用在波长衍射的InterferenceExtreme紫外线相位移动点衍射干涉仪（PS/PDI）的测量X射线光学元件中的波前误差的测量。我们通过使用Quantubaru长孔束线辐射进行了双窗口和PDI实验，而无需使用单色单色器进一步降低带宽。我们发现，可以在整个场地中获得Schwarzschild测试光学的相当好的条纹对比度，这归因于通过光栅衍射引发的相位匹配的效果，我们认为与Optics多层镜像相关的EUV频段宽度可以用于当前PS/PDI技术。较少的