Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques

通过沉积技术制造软 X 射线光学元件的非球面

基本信息

批准号：
11650049
负责人：
NIIBE Masahito
金额：
$ 2.05万
依托单位：
Himeji Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2001
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650049/
关键词：
Soft X-Rays Optical Element Aspherical Thin Film Multilayer Lithography Point Diffraction Interferometer Wavefront error X線内部応力表面粗さ

项目摘要

1. Fabrication of aspherical surfaces by means of deposition techniquesTo fabricate an aspherical surface by deposition, we have introduced a deposition system with RF-plasma-enhanced magnetron sputtering cathodes. As an example, we have calculated the asphericity of a mirror for EUVL optics and designed a deposition mask. The distribution in the thickness of a laterally graded deposited film was close to the designed value. Thus, we concluded that the deposition method is promising for the formation of an aspherical figure with great accuracy.2. Control of surface roughness and residual stress in deposition filmsWe have found that the surface roughness and residual stress for the Mo/Si multilayers are about one order of magnitude smaller than those for the Mo single layers. Using multilayers for the film to figure the aspherical surface has advantages of reducing surface roughness and residual stress.The internal stress of Mo/B4C MLs for soft X-rays fabricated by an RF-enhanced plasma … More magnetron sputtering system was investigated as a function of sputtering Ar pressure and thickness ratio of the two layers that comprise the ML structure. The internal stress in the MLs with Gamma=0.468 and 0.625 changed from a compressive value of about 1.1 Gpa to a tensile value of about 0.6 Gpa as Ar ressure increased from 1.3 mTorr to 6.0 mTorr. As the Gamma value changed from 0.375 to 0.625, the transition point from compressive to tensile stress shifted to lower Ar pressure. Thus the internal stress of Mo/B4C MLs can be controlled by changing the thickness ratio or the sputtering Ar pressure without any thermal treatment, which can deform precisely, figured substrates.3. Measurement of wavefront errors in X-Ray optics by using at-wavelength point diffraction interferometryExtreme ultraviolet phase-shifting point diffraction interferometer (PS/PDI) was studied for the precise measurement of X-Ray optical system. We carried out the double window and the PDI experiments by using the NewSUBARU long undulator beam line radiation without further reduction of the band width using monochromator. We found that rather good fringe contrast of a Schwarzschild test optics could be obtained throughout the field This is attributed to the effect of the phase matching Initiated by grating diffraction We would think that the EUV band width inside the one associated with the optics multilayer mirror reflection can be used for present PS/PDI technique. Less

1. 通过沉积技术制造非球面为了通过沉积制造非球面，我们引入了带有射频等离子体增强磁控溅射阴极的沉积系统作为示例，我们计算了 EUVL 光学镜面的非球面度。设计了沉积掩模。横向渐变沉积膜的厚度分布接近设计值，因此，我们得出结论，该沉积方法有望形成非球面。 2.沉积薄膜表面粗糙度和残余应力的控制我们发现Mo/Si多层膜的表面粗糙度和残余应力比Mo单层膜的表面粗糙度和残余应力小一个数量级。形成非球面的薄膜具有降低表面粗糙度和残余应力的优点。采用射频增强等离子体磁控溅射系统制备的软 X 射线 Mo/B4C ML 的内应力进行了研究。溅射Ar压力和构成ML结构的两层的厚度比的函数作为Ar压力，Gamma=0.468和0.625的ML中的内应力从约1.1Gpa的压缩值变为约0.6Gpa的拉伸值。随着 Gamma 值从 0.375 变为 0.625，过渡从 1.3 mTorr 增加到 6.0 mTorr。因此，Mo/B4C MLs的内应力可以通过改变厚度比或溅射Ar压力来控制，无需任何热处理，可以精确地变形，形成图形基板。 3．利用波长点衍射干涉法测量 X 射线光学中的波前误差研究了极紫外相移点衍射干涉仪 (PS/PDI)，用于精确测量 X 射线光学中的波前误差。 X射线光学系统。我们使用NewSUBARU长波荡器光束线辐射进行了双窗口和PDI实验，而无需使用单色仪进一步减小带宽，我们发现可以获得相当好的Schwarzschild测试光学器件的条纹对比度。这是由于光栅衍射引发的相位匹配的影响，我们认为与光学多层镜反射相关的EUV带宽可用于当前的PS/PDI技术.更少