DEVELOPMENT OF OPTICAL FIBERS FOR DEEP UV LIGHT

深紫外光光纤的开发

• 批准号: 13555240
• 负责人: HOSONO Hideo
• 金额: $ 8.45万
• 依托单位: TOKYO INSTITUTE OF TECHNOLOGY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13555240/
• 关键词: glass fibers; optical materials; silica glass; UV-fibers; 深紫外ファイバー; モディファイドシリカ; 点欠陥; エキシマーレーザー; 光導波路; ガラス

The purpose of this research to develop optical fibers for deep ultraviolet radiation using modified SiO2 class developed for vacuum UV lithography by the present author in 1999. The results obtained are summarized as follows.(1) The fibers composed of 200ppm F-doped SiO2 core and 5000ppm F-doped SiO2 clad exhibited a high transmission (〜60%/m)by tuning the drawing conditions. The refractive index was 0.7%.(2) The resulting fibers treated in pressured H2 gas for 2 days exhibited excellent toughness for F2 laser irradiation, i.e., almost no degradation was seen after 105 pulses of ArF laser pulse(〜50 mJ/cm2) was noted, while the as-drawn fibers were significantly degraded.(3) Excellent leaching ability was found for the fabricated fibers. Sharpening of an edge was automatically achieved just by placing the edge in HF-acid solution. Application to probe for UV-SNOM is expected.(4) Fundamental information on interaction of SiO2 glass with F2 excimer laser was obtained, i.e., defect formation, photo-induced structural change, and effects of H2-laeading.

这项研究的目的是使用本作者在1999年为真空紫外线图谱开发的经过改进的SIO2类开发用于深紫外线的光纤。（1）所获得的结果如下所示。（1）由200PPM F-poped SiO2核心组成的纤维由200 pppm f-Dppm F-Doped Sio2 clad clad clad claste tagry a thrapept tagrated a thrape a thrawing a thrawing a thrawing a thrawing a thrawing a 60％//highter（〜60％）〜60％/〜（〜60％）。折射率为0.7％。（2）在压力H2气体中处理的纤维2天暴露了F2激光照射的极好的韧性，即，在105次ARF激光脉冲（〜50 MJ/CM2）脉冲后几乎看不到降解（〜50 MJ/CM2），同时又是脱落的。纤维。仅通过将边缘放入HF酸溶液中，可以自动实现边缘的锐化。 （4）获得有关SIO2玻璃与F2准分子激光器相互作用的基本信息，即缺陷形成，光诱导的结构变化以及H2-Laeading的效果。

项目成果

Oto, et al.: "Optical fiber for deep ultraviolet light"IEEE Photonics Technology Letters. 13. 978-981 (2001)

Oto 等人：“用于深紫外光的光纤”IEEE 光子技术快报。

K.Kajihara, L.Skuja, M.Hirano, and H.Hosono: "Formation and decay of non-bridging oxygen hole centers in SiO_2 glasses induced by F2 laser irradiation : in-situ observation using a pump and probe techniques"Applied Physics Letters. 79. 1757 (2001)

K.Kajihara、L.Skuja、M.Hirano 和 H.Hosono：“F2 激光照射诱导的 SiO_2 玻璃中非桥接氧空穴中心的形成和衰变：使用泵浦和探针技术进行原位观察”应用物理学

K.Kajihara: "Diffusion and reaction of hydrogen in F_2-laser irradiated SiO_2 glass"Physical Review Letters. 89. 135507 1-135507 4 (2002)

K.Kajihara：“氢在F_2激光照射的SiO_2玻璃中的扩散和反应”物理评论快报。

H.Hosono, K.Kajihara, M.Hirano, and M.Oto: "Photochemistry in phosphorus-doped silica glass by ArF excimer laser irradiation : critical effect of H_2 loading"Journal of Applied Physics. 91. 4121 (2002)

H.Hosono、K.Kajihara、M.Hirano 和 M.Oto：“ArF 准分子激光照射下磷掺杂石英玻璃中的光化学：H_2 负载的临界效应”应用物理学杂志。

Y.Ikuta et al.: "Effect of H_2-impregnation on excimer-laser-induced ODC formation in synthetic SiO_2 glass"Applied Physics Lett.. 80. 3916-3918 (2002)

Y.Ikuta 等人：“H_2-浸渍对合成 SiO_2 玻璃中准分子激光诱导的 ODC 形成的影响”应用物理快报.. 80. 3916-3918 (2002)