Resolution and throughput scalability limits of a compact EUV nanopatterning tool - Erkenntnistransfer-Projekt

紧凑型 EUV 纳米图案工具的分辨率和吞吐量可扩展性限制 - 知识转移项目

• 批准号: 401122091
• 负责人: Professor Dr. Carlo Holly, since 7/2021
• 金额: --
• 依托单位: Fraunhofer-Institut für Lasertechnik (ILT)
• 依托单位国家: 德国
• 项目类别: Research Grants (Transfer Project)
• 财政年份: 2018
• 资助国家: 德国
• 起止时间: 2017-12-31 至 2022-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/401122091?language=en
• 关键词: Resolution; throughput; scalability; limits; compact

The planned work is based on the DFG project "Realisation of artificial three-dimensional Ge-quantum dot crystals by extreme ultraviolet interference lithography and molecular-beam epitaxy". Therein developed experimental setup for laboratory-based nanostructuring with EUV radiation serves as the basis for the proposed knowledge transfer project. The setup currently allows patterning of periodic structures with a minimal half-pitch of 28 nm over large areas of several square millimeters. To the best of our knowledge this is the highest density pattern ever achieved with a laboratory interference lithography. This remarkable scientific achievement resulted in an industrial interest in this technology. The knowledge transfer in combination with the joint work program together with the industrial partner will enable further development of the patterning method and high-precision system technology. The aim is to realize minimal feature sizes of 10 nm half-pitch as requested by potential customers in preliminary enquiries. Achieving this goal is only possible by extensive work on the enhancement of the transmission mask technology, the stability and accuracy of the positioning system and the design of a highly effective illumination system.The joint work program will allow to determine the scientific and technical limits of the approach and to identify new application areas. Based on the results of the project the industrial partner will be qualified to fabricate a market-ready EUV nanopatterning tool.

计划的工作基于DFG项目“通过极紫外干涉光刻和分子束外延实现人造三维Ge量子点晶体”。其中开发的基于实验室的 EUV 纳米结构实验装置是拟议的知识转移项目的基础。该装置目前允许在几平方毫米的大面积上以 28 nm 的最小半节距形成周期性结构的图案。据我们所知，这是通过实验室干涉光刻实现的最高密度图案。 这一非凡的科学成就引起了工业界对该技术的兴趣。知识转移与工业合作伙伴的联合工作计划相结合，将有助于图案化方法和高精度系统技术的进一步发展。目的是根据潜在客户在初步询价中的要求，实现 10 nm 半节距的最小特征尺寸。只有通过在增强透射掩模技术、定位系统的稳定性和准确性以及高效照明系统的设计方面进行广泛的工作，才有可能实现这一目标。联合工作计划将有助于确定该技术的科学和技术极限。方法并确定新的应用领域。根据该项目的结果，工业合作伙伴将有资格制造市场就绪的 EUV 纳米图案工具。