Prerequisites and Specifications for Sub Ångström Low-Voltage Transmission Electron Microscopy (SALVE) operation for investigating nano-scale properties of beam-sensitive objects

用于研究光束敏感物体的纳米级特性的亚埃级低压透射电子显微镜 (SALVE) 操作的先决条件和规范

基本信息

批准号：
270370833
负责人：
Professorin Dr. Ute Kaiser
金额：
--
依托单位：
Zentrale Einrichtung Elektronenmikroskopie
依托单位国家：
德国
项目类别：
Research Grants
财政年份：
2014
资助国家：
德国
起止时间：
2013-12-31 至 2020-12-31
项目状态：
已结题

来源：
https://gepris.dfg.de/gepris/projekt/270370833?language=en
关键词：
Prerequisites Specifications Sub ngstr Low

项目摘要

This project is dedicated to research on high-resolution low-voltage transmission electron micros-copy and spectroscopy to understand further the interaction of low-energy electrons with matter in order to elucidate the benefits of imaging at low voltages radiation-sensitive objects which cannot be imaged at voltages appreciably higher than about 80 kV. To specify the application of low-voltages, we must find optimum strategies and develop techniques in four main fields: 1. HRTEM imaging of electron-beam-sensitive materials at low voltages: Towards understand-ing radiation damage mechanism at low voltages Application of the concept "sandwich-method" and"carbon nanotube as host" to a variety of beam-sensitive objects and to image and to understand their dynamics at different accelerating voltages. 2. Spectroscopy at low voltages Development of w-q spectroscopy mode for the post-column energy filter and application to experiments on beam-sensitive objects. 3. Image calculations for low voltages Improvement of our calculation algorithm for low-voltage TEM and implementation into standard software for image calculation and analysis, including elastic, inelastic and dose-dependent calculations. Further develop the understanding of contrast with the CC-corrector and defining optimum contrast conditions for low-voltage high-resolution TEM. 4. In-Situ Microscopy and sample preparation at low voltages In-situ measurements on the relationship between defects in a two-dimensional material and its electrical properties in dependence of the accelerating voltage. Methodological developments on preparation and cleanness of low-noise substrates.

该项目致力于研究高分辨率的低压传输电子微拷贝和光谱，以进一步了解低能电子与物质的相互作用，以阐明在低电压辐射敏感的物体下的成像益处，这些辐射敏感物体无法在电压上以高于大约80 kV的高度摄影。要指定低压的应用，我们必须在四个主要领域中找到最佳策略并开发技术：1。低电压下电子光束敏感材料的HRTEM成像：在低电压下，在低压下应用概念的辐射损伤机制“ sandwich-method”和“碳纳米管”的动态和对象的动态效果，并构成了各种各样的对象，并构成了对象和效果敏感的对象，并构成了对象敏感的对象，并构成了图像敏感的对象，并构成了图像敏感的对象，并构成了对象的图像敏感的对象，并且是型号的镜头，并且是型号的镜头，并且是型号的象征，以及象征的对象，并构成了图像敏感的对象和托管。电压。 2。在低电压开发W-Q光谱模式下的光谱法，用于柱后能量滤波器，并应用于梁敏感物体上的实验。 3。低压算法的低电压改进的图像计算，用于低压TEM，并在标准软件中实现图像计算和分析，包括弹性，非弹性和剂量依赖性计算。进一步发展了对与CC-Corrator的对比，并定义了低压高分辨率TEM的最佳对比度条件。 4。在低压下进行原位显微镜和样品制备，对二维材料中缺陷之间的关系及其电性能之间的关系依赖于加速电压。低噪声底物制备和清洁性的方法论发展。