MRI: Acquisition of Thermal Scanning Probe Lithography in a Glovebox for Research and Training in Materials and Devices

MRI：在手套箱中采集热扫描探针光刻，用于材料和设备的研究和培训

• 批准号: 2117711
• 负责人: Kenneth Burch
• 金额: $ 26.74万
• 依托单位: Boston College
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2021
• 资助国家: 美国
• 起止时间: 2021-10-01 至 2024-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2117711&HistoricalAwards=false
• 关键词: MRI; Acquisition; Thermal; Scanning; Probe

This Major Research Infrastructure (MRI) award supports the acquisition of a thermal Scanning Probe Lithography (t-SPL) system in a glovebox to be housed in the Boston College (BC) Cleanroom and Nanofabrication Facility (CNRF). Combined with the Boston College “cleanroom in a glovebox”, this system allows true nanoscale fabrication entirely in inert atmosphere. This setup is relatively easy to use, has superior capabilities that come without needing to gown up, and does not demand expensive infrastructure, training, and staff required by other cutting-edge nanofabrication tools. Thus, the project allows rapid and low-cost prototyping by researchers and local companies, cutting-edge research and training of undergraduate and graduate students in nanofabrication, and will be incorporated into summer programs and classes. The system is employed for an array of basic, applied, and interdisciplinary research at BC and the region including quantum materials, catalysis, microbial interactions, biological and chemical sensors. The Nanofrazor, thermal Scanning Probe Lithography system inside a glovebox uses a thermal tip to both characterize the surface and remove the resist. As such the Nanofrazor minimizes the need for developer, produces superior surfaces to e-beam lithography (EBL) with competitive feature sizes (≈15nm), operates in a glovebox, and 3D writing (≈1nm height resolution). The minimal fabrication impact on the sample and operation in a glovebox provide new capabilities in cutting-edge 2D heterostructures and quantum materials that are often highly air sensitive. The t-SPL also provides novel device architectures requiring excellent contacts, 3D plasmonic structures, and small scales. These efforts together with the ability to rapidly fabricate new heterostructures (MBE/2D materials) and compounds with transfer via vacuum suitcase and a suite of characterization capabilities (diamond Nitrogen-Vacancy (NV) center, photocurrent, STM, TEM, Raman, magneto-transport) will amplify the impact of the t-SPL system.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

这项主要的研究基础设施（MRI）奖支持在波士顿学院（BC）洁净室（BC）洁净室和纳米制造设施（CNRF）中收购的手套箱中的热扫描探针光刻（T-SPL）系统。结合波士顿学院的“杂物箱中的洁净室”，该系统完全可以在惰性气氛中进行真正的纳米级制造。这种设置相对易于使用，具有卓越的功能，无需参加礼服，并且不需要其他尖端的纳米制造工具所需的昂贵基础设施，培训和员工。这样一来，该项目允许研究人员和本地公司的快速和低成本原型制作，对纳米制作的本科生和研究生的尖端研究和培训，并将纳入夏季计划和课程中。该系统用于卑诗省和该地区的一系列基本，应用和跨学科研究，包括量子材料，催化，微生物相互作用，生物学和化学传感器。手套箱内的纳米闪索热扫描探针光刻系统使用热尖来表征表面并去除抗性。因此，纳米闪子可以最大程度地减少开发人员的需求，产生具有竞争性特征大小（≈15nm），在杂物箱中运行的电子束光刻（EBL）的优越表面，并且3D写入（≈1nm的高度分辨率）。对样品的最小制造影响和手套箱中的操作提供了新的功能，可在尖端的2D异质结构和通常非常敏感的量子材料方面。 T-SPL还提供了需要出色的接触，3D塑料结构和小尺度的新型设备体系结构。这些努力以及能够快速制造新的异质结构（MBE/2D材料）以及通过真空手提箱转移的化合物和一套表征能力（钻石氮 - 中心（NV）中心，Photocurrent，STM，STM，TEM，TEM，TEM，RAMAN，RAMAN，RAMAN，RAMAN，MAGNETO-TRANSOTORP）的统计数据，并将其统计。使用基金会的智力优点和更广泛的影响审查标准通过评估来支持。